Patents by Inventor Marco Johannes Annemarie Pieters

Marco Johannes Annemarie Pieters has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Inspection method, lithographic apparatus, mask and substrate
    Patent number: 10394137
    Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.
    Type: Grant
    Filed: May 1, 2018
    Date of Patent: August 27, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Youri Johannes Laurentius Maria Van Dommelen, Peter David Engblom, Lambertus Gerardus Maria Kessels, Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Paul Christiaan Hinnen, Marco Johannes Annemarie Pieters
  • INSPECTION METHOD, LITHOGRAPHIC APPARATUS, MASK AND SUBSTRATE
    Publication number: 20180253018
    Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.
    Type: Application
    Filed: May 1, 2018
    Publication date: September 6, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Youri Johannes Laurentius Maria VAN DOMMELEN, Peter David Engblom, Lambertus Gerardus Maria Kessels, Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Paul Christiaan Hinnen, Marco Johannes Annemarie Pieters
  • Inspection method, lithographic apparatus, mask and substrate
    Patent number: 10001711
    Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.
    Type: Grant
    Filed: November 20, 2014
    Date of Patent: June 19, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Youri Johannes Laurentius Maria Van Dommelen, Peter David Engblom, Lambertus Gerardus Maria Kessels, Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Paul Christiaan Hinnen, Marco Johannes Annemarie Pieters
  • INSPECTION METHOD, LITHOGRAPHIC APPARATUS, MASK AND SUBSTRATE
    Publication number: 20160313656
    Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.
    Type: Application
    Filed: November 20, 2014
    Publication date: October 27, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Youri Johannes Laurentius Maria VAN DOMMELEN, Peter David ENGBLOM, Lambertus Gerardus Maria KESSELS, Arie Jeffrey DEN BOEF, Kaustuve BHATTACHARYYA, Paul Christiaan HINNEN, Marco Johannes Annemarie PIETERS
  • Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus
    Patent number: 7355675
    Abstract: A method for measuring information provided by a substrate. The substrate includes a feature that has been created by a lithographic apparatus. The method includes projecting a beam of light onto a marker disposed above and/or near the feature on the substrate, and detecting information provided by the marker with a sensor. A coating is disposed on the substrate so that the coating lies between the beam of light and the feature to substantially prevent the beam of light from being reflected by the feature and causing an inaccurate readout of the information provided by the marker.
    Type: Grant
    Filed: May 24, 2005
    Date of Patent: April 8, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Sanjay Lalbahadoersing, Marco Johannes Annemarie Pieters, Jan Hauschild, Coen Van De Vin