Abstract: A method for the continuous vacuum cleaning of a substrate, characterized in that: a species is chosen that has a low sputtering efficiency and is chemically active with regard to the soiling matter; using at least one linear ion source, a plasma is generated from a gas mixture comprising predominantly the species having a low sputtering efficiency, especially one based on oxygen; and at least one surface portion of the substrate is subjected to the plasma so that said ionized species at least partly eliminates, by chemical reaction, the soiling matter possibly adsorbed or located on the surface portion.

Abstract: The invention relates to a substrate (1), especially a glass substrate, coated with at least one dielectric thin-film layer deposited by sputtering, especially magnetically enhanced sputtering and preferably reactive sputtering in the presence of oxygen and/or nitrogen, with exposure to at least one ion beam (3) coming from an ion source (4), characterized in that said dielectric layer exposed to the ion beam is crystallized.

Abstract: The invention relates to a substrate (1), especially a glass substrate, coated with at least one dielectric thin-film layer deposited by sputtering, especially magnetically enhanced sputtering and preferably reactive sputtering in the presence of oxygen and/or nitrogen, with exposure to at least one ion beam (3) coming from an ion source (4), characterized in that said dielectric layer exposed to the ion beam has a refractive index that can be adjusted according to the parameters of the ion source, said ion source being a linear source.

Abstract: Method for the treatment of at least one surface portion of at least one layer A located between a substrate and a layer B of a thin-film multilayer, the layers of which are vacuum-deposited on the substrate having a glass function, according to the invention, is characterized in that: at least one thin layer A is deposited on a surface portion of said substrate, this deposition phase being carried out by a vacuum deposition process; using at least one linear ion source, a plasma of ionized species is generated from a gas or from a gas mixture; at least one surface portion of the layer A is subjected to said plasma so that said ionized species at least partly modifies the surface state of the layer A; and at least one layer B is deposited on a surface portion of the layer A, this deposition phase being carried out by a vacuum deposition process.

Abstract: The invention relates to laminated glazing intended to close a window opening and consisting of an external solid pane and an internal solid pane, which are joined together by means of an interlayer. A multilayer system partially transparent to visible radiation is placed on the inside of the laminated glazing. The laminated glazing according to the invention is characterized in that the panes are tinted and absorb some of the infrared radiation, and in that the multilayer system selectively reflects and/or absorbs the infrared radiation. The laminated glazing is particularly suitable for being used as side windows, tail gate or sunroof in vehicles or aircraft.

Abstract: Method for the continuous vacuum cleaning of a substrate, characterized in that: a species is chosen that has a low sputtering efficiency and is chemically active with regard to the soiling matter; using at least one linear ion source, a plasma is generated from a gas mixture comprising predominantly the species having a low sputtering efficiency, especially one based on oxygen; and at least one surface portion of said substrate is subjected to said plasma so that said ionized species at least partly eliminates, by chemical reaction, the soiling matter possibly adsorbed or located on said surface portion.

Abstract: The invention relates to a substrate (1), especially a glass substrate, coated with at least one dielectric thin-film layer deposited by sputtering, especially magnetically enhanced sputtering and preferably reactive sputtering in the presence of oxygen and/or nitrogen, with exposure to at least one ion beam (3) coming from an ion source (4), characterized in that said dielectric layer exposed to the ion beam is crystallized.

Abstract: The invention relates to a substrate (1), especially a glass substrate, coated with at least one dielectric thin-film layer deposited by sputtering, especially magnetically enhanced sputtering and preferably reactive sputtering in the presence of oxygen and/or nitrogen, with exposure to at least one ion beam (3) coming from an ion source (4), characterized in that said dielectric layer exposed to the ion beam has a refractive index that can be adjusted according to the parameters of the ion source, said ion source being a linear source.