Patents by Inventor Marcus Vermeulen

Marcus Vermeulen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20080073602
    Abstract: An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
    Type: Application
    Filed: June 22, 2006
    Publication date: March 27, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hernes Jacobs, Noud Jan Gilissen, Hans Jansen, Nicolaas Ten Kate, Nicolaas Kemper, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Johannes Mulkens, Harmen Klaas Van Der Schoot, Marco Koert Stavenga, Bob Streefkerk, Peter-Paul Steijaert, Marcus Vermeulen, Jacco Van Der Hoeven