Abstract: Analysis of microRNA (miRNA) signatures to determine or predict stages of cognitive impairment and likelihood of Alzheimer's disease in an individual.

Abstract: Photostructurable glass and ceramic materials in slabs are processed into pixelized screens having opaque baffles therein for defining therebetween light pipes in the material through which pixel light is passed and directed with limited fields of view and for stereoscopic viewing, the screens being made using various manufacturing processes included focused UV light exposure and baking of the photostructurable material.

Abstract: Photostructurable glass and ceramic materials in slabs are processed into pixelized screens having opaque baffles therein for defining therebetween light pipes in the material through which pixel light is passed and directed with limited fields of view and for stereoscopic viewing, the screens being made using various manufacturing processes included focused UV light exposure and baking of the photostructurable material.

Abstract: A method is used for producing nanoscale and microscale devices in a variety of materials, such as silicon dioxide patterned buried films. The method is inexpensive and reliable for making small scale mechanical, optical, or electrical devices and relies upon the implantation of ions into a substrate and subsequent annealing to form a stoichiometric film with the device geometry is defined by the implant energy and dose and so is not limited by the usual process parameters.

Abstract: A method using an etchant and a laser for localized precise heating enables precise etching and release of MEMS devices with improved process control while expanding the number of materials used to make MEMS, including silicon-dioxide patterned films buried in and subsequently released from bulk silicon, as a direct write method of release of patterned structures that enables removal of only that material needed to allow the device to perform to be precisely released, after which, the bulk material can be further processed for additional electrical or packaging functions.

Abstract: A method is used for producing nanoscale and microscale devices in a variety of materials, such as silicon dioxide patterned buried films. The method is inexpensive and reliable for making small scale mechanical, optical, or electrical devices and relies upon the implantation of ions into a substrate and subsequent annealing to form a stoichiometric film with the device geometry is defined by the implant energy and dose and so is not limited by the usual process parameters.