Patents by Inventor Margaret Wang Johnston

Margaret Wang Johnston has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10573998
    Abstract: Methods and systems described include a first dielectric material having a plurality of embedded conductors of a multi-wire channel, the plurality of embedded conductors comprising at least a first, second and third conductor, wherein a first distance between the first and second conductors is less than a second distance between the first and third conductors, wherein the first dielectric material has a first dielectric constant ?1 and a second dielectric material embedded in the first dielectric material, the second dielectric material embedded in between the first and third conductors, the second dielectric material having a second dielectric constant ?2, wherein ?2>?1.
    Type: Grant
    Filed: December 11, 2018
    Date of Patent: February 25, 2020
    Assignee: KANDOU LABS, S.A.
    Inventors: Amin Shokrollahi, Margaret Wang Johnston
  • Publication number: 20190123489
    Abstract: Methods and systems described include a first dielectric material having a plurality of embedded conductors of a multi-wire channel, the plurality of embedded conductors comprising at least a first, second and third conductor, wherein a first distance between the first and second conductors is less than a second distance between the first and third conductors, wherein the first dielectric material has a first dielectric constant ?1 and a second dielectric material embedded in the first dielectric material, the second dielectric material embedded in between the first and third conductors, the second dielectric material having a second dielectric constant ?2, wherein ?2>?1.
    Type: Application
    Filed: December 11, 2018
    Publication date: April 25, 2019
    Inventors: Amin Shokrollahi, Margaret Wang Johnston
  • Patent number: 10153591
    Abstract: Methods and systems described include a first dielectric material having a plurality of embedded conductors of a multi-wire channel, the plurality of embedded conductors comprising at least a first, second and third conductor, wherein a first distance between the first and second conductors is less than a second distance between the first and third conductors, wherein the first dielectric material has a first dielectric constant ?1 and a second dielectric material embedded in the first dielectric material, the second dielectric material embedded in between the first and third conductors, the second dielectric material having a second dielectric constant ?2, wherein ?2>?1.
    Type: Grant
    Filed: April 27, 2017
    Date of Patent: December 11, 2018
    Assignee: KANDOU LABS, S.A.
    Inventors: Amin Shokrollahi, Margaret Wang Johnston
  • Publication number: 20170317449
    Abstract: Methods and systems described include a first dielectric material having a plurality of embedded conductors of a multi-wire channel, the plurality of embedded conductors comprising at least a first, second and third conductor, wherein a first distance between the first and second conductors is less than a second distance between the first and third conductors, wherein the first dielectric material has a first dielectric constant ?1 and a second dielectric material embedded in the first dielectric material, the second dielectric material embedded in between the first and third conductors, the second dielectric material having a second dielectric constant ?2, wherein ?2>?1.
    Type: Application
    Filed: April 27, 2017
    Publication date: November 2, 2017
    Inventors: Amin Shokrollahi, Margaret Wang Johnston