Patents by Inventor Margreet Albertine Anne-Marie Van Wijck

Margreet Albertine Anne-Marie Van Wijck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Atomic layer CVD
    Patent number: 7022184
    Abstract: Atomic layer deposition is used to provide a solid film on a plurality of disc shaped substrates. The substrates are entered spaced apart in a boat, in a furnace and heated to deposition temperature. In the furnace the substrate is exposed to alternating and sequential pulses of at least two mutually reactive reactants, in such way that the deposition temperature is high enough to prevent condensation of the at least two reactants on the surface but not high enough to result in significant thermal decomposition of each of the at least two reactants individually.
    Type: Grant
    Filed: June 12, 2003
    Date of Patent: April 4, 2006
    Assignee: ASM International N.V.
    Inventor: Margreet Albertine Anne-Marie Van Wijck
  • Atomic layer CVD
    Publication number: 20030209193
    Abstract: Atomic layer deposition is used to provide a solid film on a plurality of disc shaped substrates. The substrates are entered spaced apart in a boat, in a furnace and heated to deposition temperature. In the furnace the substrate is exposed to alternating and sequential pulses of at least two mutually reactive reactants, in such way that the deposition temperature is high enough to prevent condensation of the at least two reactants on the surface but not high enough to result in significant thermal decomposition of each of the at least two reactants individually.
    Type: Application
    Filed: June 12, 2003
    Publication date: November 13, 2003
    Inventor: Margreet Albertine Anne-Marie Van Wijck
  • Method for vapour deposition of a film onto a substrate
    Patent number: 6592942
    Abstract: Method for chemical vapor deposition of a film onto a substrate. Before bulk chemical vapor deposition the substrate is subjected to a nucleation treatment. The nucleation treatment comprises atomic layer deposition wherein the substrate is alternatingly and sequentially exposed to pulses of at least two mutually reactive gaseous reactants wherein the nucleation temperature is chosen to prevent condensation of either of the used reactants and to prevent substantial thermal decomposition of each of the reactants individually.
    Type: Grant
    Filed: July 7, 2000
    Date of Patent: July 15, 2003
    Assignee: ASM International N.V.
    Inventor: Margreet Albertine Anne-Marie Van Wijck
  • Atomic layer deposition
    Patent number: 6585823
    Abstract: Atomic layer deposition is used to provide a solid film on a plurality of disc shaped substrates. The substrates are entered spaced apart in a boat, in a furnace and heated to deposition temperature. In the furnace the substrate is exposed to alternating and sequential pulses of at least two mutually reactive reactants, in such way that the deposition temperature is high enough to prevent condensation of the at least two reactants on the surface but not high enough to result in significant thermal decomposition of each of the at least two reactants individually.
    Type: Grant
    Filed: July 7, 2000
    Date of Patent: July 1, 2003
    Assignee: ASM International, N.V.
    Inventor: Margreet Albertine Anne-Marie Van Wijck