Abstract: A resist composition that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid, the resist composition containing a base material component whose solubility in a developing solution is changed by action of an acid, and a compound represented by General Formula (e1) in which Rd01 represents a monovalent organic group and Rd02 represents a single bond or a divalent linking group

Abstract: A resist composition containing a resin component having a structural unit containing a group which is dissociated under the action of an acid and compound represented by the general formula (bd1). In the formula (bd1), Rx1 to Rx4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Ry1 to Ry2 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, and Rz1 to Rz4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure.

Abstract: A resist composition containing a resin component exhibiting changed solubility in a developing solution under action of acid, and a compound represented by General Formula (d0), the resin component containing a polymer compound having a constitutional unit having a monocyclic alicyclic hydrocarbon group, Rd0 represents a monovalent organic group; Xd0 represents —O—, —C(?O)—, —O—C(?O)—, —C(?O)—O—, —S—, or —SO2—; Ydx0 represents a single bond or the like; Rd001 to Rd004 represents a hydrogen atom or the like; and Mm+ represents an m-valent organic cation

Abstract: A resist composition containing a compound (D0) represented by General Formula (d0) and a polymer compound having a constitutional unit (a01) containing an acid-decomposable group having a polarity which is increased by action of an acid and a constitutional unit (a02) derived from a compound represented by General Formula (a02-1), and a solid content concentration is 5% by mass or less. In General Formula (d0), Rd0 represents a monovalent organic group, Xd0 represents —O— or the like, Yd0 represents a single bond, and Mm+ represents an m-valent organic cation.

Abstract: A resist composition is provided that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid, the resist composition containing a base material component whose solubility in a developing solution is changed by action of an acid, and a compound represented by General Formula (e1) in which Rd01 represents a monovalent organic group and Rd02 represents a single bond or a divalent linking group

Abstract: A resist composition containing: a base material component exhibiting changed solubility in a developing solution under action of acid; an acid generator component generating an acid upon exposure; and a photodegradable base controlling diffusion of the acid generated from the acid generator component upon exposure, in which the photodegradable base contains a compound represented by General Formula (d0), in which R011 represents an aryl group having an electron-withdrawing group, R021 and R022 each independently represent an aryl group which may have a substituent, Z represents a sulfur atom, an oxygen atom, a carbonyl group, or a single bond, and X? represents a counter anion

Abstract: A resist composition including a base material component (A), an acid-generator component (B) and a photodegradable base (D1), the base material component (A) including a resin component (A1) having a structural unit (a10), at least one of the acid-generator component (B) and the photodegradable base (D1) including a compound (BD1), and a total amount of the acid-generator component (B) and the photodegradable base (D1) being 25 parts by weight or more, relative to 100 parts by weight of the base material component (A) (in formula (a10-1), Wax1 represents an aromatic hydrocarbon group which may have a substituent; in formula (bd1), R001 to R003 represents a monovalent organic group, and at least one has an acid dissociable group)

Abstract: A resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), in which the cation moiety of the compound (D0) has a Log P value of less than 7.7. In the formula, Mm+ represents an m-valent organic cation, Rd0 represents a substituent, p represents an integer of 0 to 3, q represents an integer of 0 to 3, n represents an integer of 2 or greater, and a relationship of “n+p?(q×2)+5” is satisfied.

Abstract: A resist composition containing a resin component having a structural unit containing a group which is dissociated under the action of an acid and compound represented by the general formula (bd1). In the formula (bd1), Rx1 to Rx4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Ry1 to Ry2 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, and Rz1 to Rz4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure.