Patents by Inventor Maria Johanna Hendrika Aben

Maria Johanna Hendrika Aben has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9977340
    Abstract: Diffraction models and scatterometry are used to reconstruct a model of a microscopic structure on a substrate. A plurality of candidate structures are defined, each represented by a plurality of parameters (p1, p2, etc.)). A plurality of model diffraction signals are calculated by simulating illumination of each of the candidate structures. The structure is reconstructed by fitting one or more of the model diffraction signals to a signal detected from the structure. In the generation of the candidate structures, a model recipe is used in which parameters are designated as either fixed or variable. Among the variable parameters, certain parameters are constrained to vary together in accordance with certain constraints, such as linear constraints. An optimized set of constraints, and therefore an optimized model recipe, is determined by reference to a user input designating one or more parameters of interest for a measurement, and by simulating the reconstruction process reconstruction.
    Type: Grant
    Filed: May 5, 2011
    Date of Patent: May 22, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Maria Johanna Hendrika Aben, Hugo Augustinus Joseph Cramer, Noelle Martina Wright, Ruben Alvarez Sanchez, Martijn Jaap Daniel Slob
  • Publication number: 20120123748
    Abstract: Diffraction models and scatterometry are used to reconstruct a model of a microscopic structure on a substrate. A plurality of candidate structures are defined, each represented by a plurality of parameters (p1, p2, etc.)). A plurality of model diffraction signals are calculated by simulating illumination of each of the candidate structures. The structure is reconstructed by fitting one or more of the model diffraction signals to a signal detected from the structure. In the generation of the candidate structures, a model recipe is used in which parameters are designated as either fixed or variable. Among the variable parameters, certain parameters are constrained to vary together in accordance with certain constraints, such as linear constraints. An optimized set of constraints, and therefore an optimized model recipe, is determined by reference to a user input designating one or more parameters of interest for a measurement, and by simulating the reconstruction process reconstruction.
    Type: Application
    Filed: May 5, 2011
    Publication date: May 17, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Maria Johanna Hendrika Aben, Hugo Augustinus Joseph Cramer, Noelle Martina Wright, Ruben Alvarez Sanchez, Martijn Jaap Daniel Slob