Abstract: Provided is a composition that is sensitive to radiation in electromagnetic spectrum ranges for printing purposes, and includes (a) one or more binder polymers; (b) an ethylenically unsaturated compound; (c) one or more compounds that absorbs radiations in the selected region of the spectrum; (d) a sensitizer; (e) optionally a photoaccelarator; (f) an adhesion promoter; (g) a dye; and (h) optionally thermal polymerization inhibitors. Also provided is a printing plate including the radiation sensitive composition, as well as the use of the composition and an image developing process.

Abstract: Provided is a composition that is sensitive to radiation in electromagnetic spectrum ranges for printing purposes, and includes (a) one or more binder polymers; (b) an ethylenically unsaturated compound; (c) one or more compounds that absorbs radiations in the selected region of the spectrum; (d) a sensitizer; (e) optionally a photoaccelarator; (f) an adhesion promoter; (g) a dye; and (h) optionally thermal polymerization inhibitors. Also provided is a printing plate including the radiation sensitive composition, as well as the use of the composition and an image developing process.

Abstract: A radiation sensitive composition which is primarily sensitive in the near UV and visible region of the electromagnetic spectrum is composed of a polymeric binder, an ethylenically unsaturated monomer, a radiation absorbing compound, a photoaccelerator, an onium compound, and an adhesion promoter, which are overcoated with an oxygen barrier layer. When applied to the proper support and processed, the composition is useful as an offset lithographic printing plate, color proofing film or image resist.

Abstract: The present invention refers to lithographic printing and, in particular, to highly solvent-resistant thermally imaging elements and to methods for using the same as well as to corresponding lithographic printing plates comprising said thermally imageable elements. It also refers to processes for making plates and assemblies for use in lithography.

Abstract: A positive working thermal imaging assembly comprising: A) a substrate; and B) a thermally sensitive imaging element of a composite layer structure comprising: (I) a first layer on the substrate of a polymeric material soluble in aqueous alkali solution, optionally containing compounds that absorb and convert light to heat and/or a coloured dye or pigment; said first layer being converted at its surface by treatment with solutions at elevated temperatures that contain an active compound or compounds capable of rendering said first polymeric material less soluble in an aqueous alkali developer at the point of contact; the first layer being oleophilic; (ii) optionally, a first intermediate layer between the substrate and the said first layer with a second polymeric material which is soluble or dispersible in aqueous solution optionally containing compounds that absorb and convert light or radiation to heat and/or a coloured dye or pigment coated from a solvent that does not substantially dissolve the first laye

Abstract: The invention relates to a composition, which is primarily energy sensitive in the near infrared and infrared region, and which comprises a dual polymer system, an infrared absorbing material that absorbs at the desired wavelength, an acid generating compound, and, optionally, an acid stabilizing compound. The composition may be applied to the proper substrate and is useful to provide offset lithographic printing plates, color proofing film or photoresist.

Abstract: The invention relates to Positive working thermal imaging assembly comprising: A) a substrate; and B) a thermally sensitive imaging element of a composite layer structure comprising: (i) a first layer on the substrate of a polymeric material soluble in aqueous alkali solution, optionally containing compounds that absorb and convert light to heat and/or a coloured dye or pigment; said first layer being converted at its surface by treatment with solutions at elevated temperatures that contain an active compound or compounds capable of rendering said first polymeric material insoluble to aqueous alkali developer at the point of contact ; the first layer being oleophilic; (ii) optionally, a first intermediate layer between the substrate and the said first layer with a second polymeric material which is soluble or dispersible in aqueous solution optionally containing compounds that absorb and convert light or radiation to heat and/or a coloured dye or pigment coated from a solvent that does not substantially disso

Abstract: The invention relates to new radiation sensitive coating compositions and coating product which are radiation sensitive in the infrared region closed to the infrared, comprising two layers, the first layer comprising a hiding polymer and one or more infrared absorbing material which absorbs in the desired wavelength and a second layer coated on the first layer comprising one or more copolymer which is able to coat and make the polymer of the first layer insoluble in the conventional developer of positive plates, and when applied to an appropriate substrate is useful as off-set lithographic printing plates, for color proofing films and photoresist. The invention also refers to a printing or imaging process.