Patents by Inventor Mario J. Meissl
Mario J. Meissl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10553501Abstract: An apparatus can include a logic element configured to generate information corresponding to an adaptive layer to be formed over a current substrate based at least in part on a difference in flatness profiles associated with a first substrate chuck and a second substrate chuck. In another aspect, a method can include obtaining a difference in thickness profiles for the first and second chucks using a prior substrate, and forming an adaptive layer over a previously formed patterned layer of a current substrate and before forming a patterned resist layer aligned to the previously formed patterned layer. In an embodiment, the thickness profile of the adaptive layer is a function of the inverse of the difference in flatness profiles of the substrate chucks. The adaptive layer can help to reduce overlay error associated with different flatness profiles of substrate chucks.Type: GrantFiled: March 28, 2018Date of Patent: February 4, 2020Assignee: CANON KABUSHIKI KAISHAInventors: Anshuman Cherala, Mario J. Meissl
-
Publication number: 20190304850Abstract: An apparatus can include a logic element configured to generate information corresponding to an adaptive layer to be formed over a current substrate based at least in part on a difference in flatness profiles associated with a first substrate chuck and a second substrate chuck. In another aspect, a method can include obtaining a difference in thickness profiles for the first and second chucks using a prior substrate, and forming an adaptive layer over a previously formed patterned layer of a current substrate and before forming a patterned resist layer aligned to the previously formed patterned layer. In an embodiment, the thickness profile of the adaptive layer is a function of the inverse of the difference in flatness profiles of the substrate chucks. The adaptive layer can help to reduce overlay error associated with different flatness profiles of substrate chucks.Type: ApplicationFiled: March 28, 2018Publication date: October 3, 2019Inventors: Anshuman CHERALA, Mario J. MEISSL
-
Publication number: 20110221095Abstract: The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.Type: ApplicationFiled: May 16, 2011Publication date: September 15, 2011Applicant: MOLECULAR IMPRINTS, INC.Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario J. Meissl
-
Publication number: 20110171340Abstract: A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.Type: ApplicationFiled: March 28, 2011Publication date: July 14, 2011Applicant: MOLECULAR IMPRINTS, INC.Inventors: Douglas J. Resnick, Mario J. Meissl, Byung-Jin Choi, Sidlgata V. Sreenivasan
-
Publication number: 20100291257Abstract: A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.Type: ApplicationFiled: July 19, 2010Publication date: November 18, 2010Applicant: MOLECULAR IMPRINTS, INC.Inventors: Douglas J. Resnick, Mario J. Meissl, Byung-Jin Choi, Sidlgata V. Sreenivasan
-
Publication number: 20100201042Abstract: Methods of forming continuous layers on regions of a substrate are described. Generally, an imprint lithography template may contact liquid positioned on the substrate. The liquid may be cured forming a masking layer, and the imprint lithography template separated from the masking layer. Prior to separation, pressurized gas and/or vacuum may be applied between the template and the substrate. Additionally, during separation, pressurized gas and/or vacuum may be applied between the template and the substrate.Type: ApplicationFiled: April 19, 2010Publication date: August 12, 2010Applicant: MOLECULAR IMPRINTS, INC.Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P.C. Watts, Mario J. Meissl
-
Patent number: 7727453Abstract: The present invention is directed to a method of forming a layer on a region of a substrate, the method including, inter alia, positioning a liquid on the substrate; and contacting the liquid with the mold, defining a gap between the mold and the substrate, with the gap enabling positioning of the liquid by capillary forces to generate the layer over the region.Type: GrantFiled: May 11, 2005Date of Patent: June 1, 2010Assignee: Molecular Imprints, Inc.Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario J. Meissl
-
Publication number: 20100040718Abstract: An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith.Type: ApplicationFiled: October 26, 2009Publication date: February 18, 2010Applicant: MOLECULAR IMPRINTS, INC.Inventors: Douglas J. Resnick, Mario J. Meissl, Kosta S. Selinidis, Frank Y. Xu
-
Patent number: 7641840Abstract: The present invention is directed towards a method of expelling a gas positioned between a substrate and a mold, the substrate and the mold further having a liquid positioned therebetween.Type: GrantFiled: May 17, 2007Date of Patent: January 5, 2010Assignee: Molecular Imprints, Inc.Inventors: Byung-Jin Choi, Mahadevan GanapathiSubramanian, Yeong-jun Choi, Mario J. Meissl
-
Patent number: 7635445Abstract: The present invention is directed towards a method of separating a mold, included in a template, from a layer disposed on a substrate, the method including, inter alia, applying a separation force to the template to separate the template from the layer; and facilitating localized deformation in the substrate to reduce the separation force required to achieve separation.Type: GrantFiled: April 18, 2005Date of Patent: December 22, 2009Assignee: Molecular Imprints, Inc.Inventors: Byung-Jin Choi, Anshuman Cherala, Yeong-jun Choi, Mario J. Meissl, Sidlgata V. Sreenivasan, Norman E. Schumaker, Xiaoming Lu, Ian M. McMackin, Daniel A. Babbs
-
Publication number: 20090004319Abstract: An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith, wherein said second thickness is defined by: c1×d<t<a/c2; wherein d is said first thickness, t is said second thickness, a is said third thickness, c1 has a value greater than 20, and c2 has a value greater than 350.Type: ApplicationFiled: May 30, 2008Publication date: January 1, 2009Applicant: Molecular Imprints, Inc.Inventors: Douglas J. Resnick, Mario J. Meissl, Kosta S. Selinidis, Frank Y. Xu
-
Patent number: 7420654Abstract: The present invention is directed toward a method to vary dimensions of a substrate supported by a chuck. The method includes applying compressive forces to the substrate with the actuator assembly while facilitating movement of the actuator assembly with respect to the substrate to minimize reactive forces generated in response to the compressive forces being sensed by the chuck.Type: GrantFiled: June 1, 2005Date of Patent: September 2, 2008Assignee: Molecular Imprints, Inc.Inventors: Anshuman Cherala, Byung-Jin Choi, Pawan K. Nimmakayala, Mario J. Meissl, Sidlgata V. Sreenivasan
-
Publication number: 20080160129Abstract: A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.Type: ApplicationFiled: May 4, 2007Publication date: July 3, 2008Applicant: MOLECULAR IMPRINTS, INC.Inventors: Douglas J. Resnick, Mario J. Meissl, Byung-Jin Choi, Sidlgata V. Sreenivasan
-
Patent number: 7338275Abstract: The present invention is directed to a template having a body including a surface with first and second regions. The first region has first wetting characteristics for a given material and the second region has second wetting characteristics for the given material. The first wetting characteristics differ from the second wetting characteristics. Specifically, the first region is formed from a surface treatment layer with a first surface energy to provide the first wetting characteristics. The second region is exposed portions of the body, typically quartz of fused silica, having a second surface energy associated therewith. The second surface energy is greater than the first surface energy to provide the second region with the second wetting characteristics.Type: GrantFiled: May 11, 2005Date of Patent: March 4, 2008Assignee: Molecular Imprints, Inc.Inventors: Byung Jin Choi, Mario J. Meissl, Sidlagata V. Sreenivasan, Michael P. C. Watts
-
Patent number: 7298456Abstract: The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting Forces sensed by the substrate chuck generated in response to the compressive forces.Type: GrantFiled: June 1, 2005Date of Patent: November 20, 2007Assignee: Molecular Imprints, Inc.Inventors: Anshuman Cherala, Byung-Jin Choi, Pawan K. Nimmakayala, Mario J. Meissl, Sidlgata V. Sreenivasan
-
Patent number: 7224443Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.Type: GrantFiled: March 27, 2006Date of Patent: May 29, 2007Assignee: Molecular Imprints, Inc.Inventors: Byung-Jin Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P. C. Watts, Daniel A. Babbs, Mario J. Meissl, Hillman L. Bailey, Norman E. Schumaker
-
Patent number: 7170589Abstract: The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting forces sensed by the substrate chuck generated in response to the compressive forces.Type: GrantFiled: June 1, 2005Date of Patent: January 30, 2007Assignee: Molecular Imprints, Inc.Inventors: Anshuman Cherala, Byung-Jin Choi, Pawan K Nimmakayala, Mario J. Meissl, Sidlgata V. Sreenivasan
-
Patent number: 7150622Abstract: The present invention is directed toward a system to vary dimensions of a template in order to attenuate if not prevent distortions in an underlying pattern formed by the template. To that end, the system features a compression device that includes a pair of spaced-apart contact members to compress a perimeter surface of the template between the pair of spaced-apart contact members. The compression device includes first and second bodies, each has a contact member and an actuator arm. One of the actuator arms is coupled to the first body to reciprocate about an axis in response to variations of a volume of a bladder disposed adjacent to the actuator arm. In this manner, the distance between the two contact members may be varied.Type: GrantFiled: July 9, 2003Date of Patent: December 19, 2006Assignee: Molecular Imprints, Inc.Inventors: Byung-Jin Choi, Sidlgata V. Sreenivasan, Mario J. Meissl
-
Patent number: 7077992Abstract: The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.Type: GrantFiled: July 11, 2002Date of Patent: July 18, 2006Assignee: Molecular Imprints, Inc.Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario J. Meissl
-
Patent number: 7019819Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.Type: GrantFiled: November 13, 2002Date of Patent: March 28, 2006Assignee: Molecular Imprints, Inc.Inventors: Byung J. Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P. C. Watts, Daniel Babbs, Mario J. Meissl, Hillman Bailey, Norman E. Schumaker