Patents by Inventor Mario Johannes Meissl

Mario Johannes Meissl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CHUCKING SYSTEM WITH RECESSED SUPPORT FEATURE
    Publication number: 20110001954
    Abstract: In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.
    Type: Application
    Filed: July 1, 2010
    Publication date: January 6, 2011
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Mahadevan GanapathiSubramanian, Mario Johannes Meissl, Avinash Panga, Byung-Jin Choi
  • Strain and Kinetics Control During Separation Phase of Imprint Process
    Publication number: 20100102469
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Application
    Filed: October 23, 2009
    Publication date: April 29, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • IMPRINT LITHOGRAPHY SYSTEM AND METHOD
    Publication number: 20100072652
    Abstract: System, method and process for imprinting a substrate using controlled deformation of a substrate and/or a template. The substrate and/or template may be positioned in single wave formation or double wave formation during an imprint lithography process.
    Type: Application
    Filed: October 20, 2009
    Publication date: March 25, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Mahadevan GanapathiSubramanian, Byung-Jin Choi, Mario Johannes Meissl