Abstract: A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.

Abstract: A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.

Abstract: A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.

Abstract: The invention relates to a locking device for a lock opening which is arranged in a wall between a first and a second recipient, said lock opening comprising a blocking element, which is arranged in the inner chamber of the first recipient, and a counter-plate which is associated with the blocking element. A first magnet device is provided in an area of the counter-plate and a second magnet device, which is associated with the first magnet device, is provided in the region of the blocking element. In order to close and/or open the locking device by means of the first and second magnet device, a positive and/or negative contact pressure can be produced between the blocking element and the counter-plate.

Abstract: A reactor for the treatment of flat substrates includes a vacuum chamber with a process space arranged therein. A first electrode and a counterelectrode generate a plasma for the treatment of a surface to be treated and form two opposite walls of the process space. The reactor further includes means for introducing and means for removing gaseous material into and out from the process space. At least one substrate is accommodated by a front side of the counterelectrode. The vacuum chamber includes an opening having a closure device. The reactor includes a device for varying the relative distance between the first electrode and the counterelectrode and a device assigned to the counterelectrode for accommodating substrates. At least one substrate is arranged at an angle alpha in a range of between 0° and 90° relative to a perpendicular direction at least during the performance of the treatment.

Abstract: The invention relates to a locking device for a lock opening which is arranged in a wall between a first and a second recipient, said lock opening comprising a blocking element, which is arranged in the inner chamber of the first recipient, and a counter-plate which is associated with the blocking element. A first magnet device is provided in an area of the counter-plate and a second magnet device, which is associated with the first magnet device, is provided in the region of the blocking element. In order to close and/or open the locking device by means of the first and second magnet device, a positive and/or negative contact pressure can be produced between the blocking element and the counter-plate.

Abstract: A process system contains a device for transporting substrates along a transport path. The device contains a bearing module and a drive module. The bearing module has a bearing stator with actuators embodied in the form of electromagnets and a bearing rotor with a ferromagnetic component. At least two of the actuators are disposed at a distance from each other and define at least one pair of actuators with an associated gap area formed therebetween. An active magnetic bearing of the bearing rotor is provided in the gap area.

Abstract: A process system contains a device for transporting substrates along a transport path. The device contains a bearing module and a drive module. The bearing module has a bearing stator with actuators embodied in the form of electromagnets and a bearing rotor with a ferromagnetic component. At least two of the actuators are disposed at a distance from each other and define at least one pair of actuators with an associated gap area formed therebetween. An active magnetic bearing of the bearing rotor is provided in the gap area.

Abstract: A method for producing one or more coating on a displaccable substrate in a vacuum chamber with the aid of a residual gas, by means of a sputtering device said coating being formed from at least two constituents, whereby a sputtering material of the sputtering device constitutes at least one first constituent and a reactive component of the residual gas constitutes a second constituent.

Abstract: Bearing assemblies for supporting opposite stub shafts of an upper drawing roll of a textile sliver drawing frame. Each bearing assembly includes a bearing sleeve having an inner cylindrical surface and an open end through which a respective stub shaft projects into the bearing sleeve; rolling bodies disposed circumferentially between the stub shaft and the inner cylindrical surface of the bearing sleeve; a spring supporting member disposed in the bearing sleeve and being affixed to the inner cylindrical surface thereof; and a holding element disposed in the bearing sleeve between the spring supporting member and the end face of the stub shaft. The holding element is axially displaceable relative to the bearing sleeve. A spring is disposed in the bearing sleeve between and in contact with, the spring supporting member and the end face of the stub shaft.

Abstract: A textile sliver drawing unit includes a roller assembly for advancing and drawing a sliver running therethrough. The roller assembly includes an upper roll and a lower roll cooperating with the upper roll. The drawing unit further has a pressing device for pressing the upper roll against the lower roll during operation. The pressing device includes a pivotally supported pressing arm having an inwardly pivoted operational position and an outwardly pivoted inoperative position; a force-generating device carried by the pressing arm; a movable member coupled to the force-generating device and engageable at least indirectly with the upper roll for transmitting a force from the force-generating device to the upper roll for pressing on the lower roll; and a carrier element mounted on the pressing arm and being settable into locking and unlocking positions.