Patents by Inventor Mark Alan Gesley

Mark Alan Gesley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Retarding electron beams in multiple electron beam pattern generation
    Patent number: 6936981
    Abstract: A multiple electron beam pattern generator includes a multiple electron beam source to generate a plurality of electron beams that are modulated according to a pattern. An anode accelerates the electron beams, and then a beam retarding system generates a retarding electric potential about the electron beams to decrease the kinetic energy of the electron beams substantially near a substrate. A beam scanner scans the electron beams across the substrate. A substrate support supports the substrate, and a pattern is generated on the substrate.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: August 30, 2005
    Assignee: Applied Materials, Inc.
    Inventor: Mark Alan Gesley
  • Retarding electron beams in multiple electron beam pattern generation
    Publication number: 20040090194
    Abstract: A multiple electron beam pattern generator includes a multiple electron beam source to generate a plurality of electron beams that are modulated according to pattern. An anode accelerates the electron beams, and then a beam retarding system generates a retarding electric potential about the electron beams to decrease the kinetic energy of the electron beams substantially near a substrate. A beam scanner scans the electron beams across the substrate. A substrate support supports the substrate, and a pattern is generated on the substrate.
    Type: Application
    Filed: November 8, 2002
    Publication date: May 13, 2004
    Applicant: Applied Materials, Inc.
    Inventor: Mark Alan Gesley