Patents by Inventor Mark Anthony Mayse
Mark Anthony Mayse has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120112323Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: January 20, 2012Publication date: May 10, 2012Applicant: NEXGEN SEMI HOLDING, INC.Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
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Publication number: 20100098922Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: December 18, 2009Publication date: April 22, 2010Applicant: NEXGEN SEMI HOLDING, INC.Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
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Patent number: 7659526Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: GrantFiled: August 20, 2007Date of Patent: February 9, 2010Assignee: NexGen Semi Holding, Inc.Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
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Patent number: 7507960Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: GrantFiled: August 17, 2007Date of Patent: March 24, 2009Assignee: NexGen Semi Holding, Inc.Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
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Patent number: 7501644Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: GrantFiled: August 20, 2007Date of Patent: March 10, 2009Assignee: NexGen Semi Holding, Inc.Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
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Patent number: 7495242Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: GrantFiled: August 20, 2007Date of Patent: February 24, 2009Assignee: NexGen Semi Holding, Inc.Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
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Patent number: 7495244Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: GrantFiled: August 20, 2007Date of Patent: February 24, 2009Assignee: NexGen Semi Holding, Inc.Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
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Patent number: 7495245Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: GrantFiled: August 20, 2007Date of Patent: February 24, 2009Assignee: NexGen Semi Holding, Inc.Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
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Patent number: 7488960Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: GrantFiled: August 20, 2007Date of Patent: February 10, 2009Assignee: NexGen Semi Holding, Inc.Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
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Patent number: 7259373Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: GrantFiled: July 10, 2006Date of Patent: August 21, 2007Assignee: NexGenSemi Holdings CorporationInventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott