Patents by Inventor Mark Bennahmias
Mark Bennahmias has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11991814Abstract: Systems and methods of charge-neutralizing charged particle beams are contemplated, wherein an originating beam is transited through a sequence of slow wave recombination chambers and exposed to neutralizing beams while transit therethrough in order to produce a neutral particle beam. These systems and methods may be seen to be especially suitable for use in spacecraft or other ungrounded environments where the removal of excess charge buildup represents a substantial barrier, and when utilized in a directed energy weapon, may greatly increase the rate at which successive beam pulses may be directed against a target or against multiple targets.Type: GrantFiled: May 21, 2020Date of Patent: May 21, 2024Assignee: NexGen Semi Holding, Inc.Inventors: Michael J. Zani, Mark Bennahmias
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Patent number: 9920447Abstract: A graphene composite coating on a metal surface with excellent corrosion resistance by electrophoretic or electrolytic deposition has been obtained. The composite coating was shown to significantly increase the resistance of the metal surface to electrochemical degradation. The graphene coating significantly reduces cathodic current, which is an indicator of the rate of corrosion at the interface between the cathodic material and the anodic material.Type: GrantFiled: August 20, 2015Date of Patent: March 20, 2018Assignee: LUMINIT LLCInventors: Russell Kurtz, Mark Bennahmias
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Patent number: 9658438Abstract: A compound polyhedral concentrator (CPOC) lens is disclosed with one smooth curved surface facing the sun and an inner surface comprised of a 3D pattern of interpenetrating minimum deviation prisms with a common origin facing the absorber. This new type of stationary solar concentrator is used to extend the acceptance angles by minimizing blocking and tip optical losses that are common with radial Fresnel design forms. Moreover, when considering the extended time period for non-tracking of the sun's movement commensurate with the increased acceptance angles the total energy collected using a combination of a CPOC lens and a photovoltaic device will be greater than the total energy collected using the photovoltaic device by itself.Type: GrantFiled: February 12, 2014Date of Patent: May 23, 2017Assignee: LITRICITY, LLC.Inventors: Thomas C. Forrester, Mark Bennahmias, Robert S. Block, Paul Sidlo, Rudolf A. Wiedemann
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Publication number: 20160053398Abstract: A graphene composite coating on a metal surface with excellent corrosion resistance by electrophoretic or electrolytic deposition has been obtained. The composite coating was shown to significantly increase the resistance of the metal surface to electrochemical degradation. The graphene coating significantly reduces cathodic current, which is an indicator of the rate of corrosion at the interface between the cathodic material and the anodic material.Type: ApplicationFiled: August 20, 2015Publication date: February 25, 2016Inventors: Russell Kurtz, Mark Bennahmias
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Publication number: 20150370055Abstract: A compound polyhedral concentrator (CPOC) lens is disclosed with one smooth curved surface facing the sun and an inner surface comprised of a 3D pattern of interpenetrating minimum deviation prisms with a common origin facing the absorber. This new type of stationary solar concentrator is used to extend the acceptance angles by minimizing blocking and tip optical losses that are common with radial Fresnel design forms. Moreover, when considering the extended time period for non-tracking of the sun's movement commensurate with the increased acceptance angles the total energy collected using a combination of a CPOC lens and a photovoltaic device will be greater than the total energy collected using the photovoltaic device by itself.Type: ApplicationFiled: February 12, 2014Publication date: December 24, 2015Applicant: LITRICITY, LLCInventors: Thomas C. FORRESTER, Rudolf A. WIEDEMANN, Mark BENNAHMIAS, Robert S. BLOCK, Paul SIDLO
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Publication number: 20150029749Abstract: A backlight apparatus comprised of a light pipe with one or more light input ends, a top surface, a bottom surface, opposing side, a non imaging optic collimator and scatter inducing elements. The non imaging optic collimator causes the light rays entering into the light pipe to be directed towards the far end relative to the light input end in a specified angular distribution. Pluralities of scatter induced elements (SIE) are introduced in the body of the light pipe between the applicable light input end and the corresponding far end. Individual scatter induced elements may be formed in any geometry, and may be grouped or separated such that there exists a variation of SIE each individually or as grouped, possessing discrete geometries.Type: ApplicationFiled: July 24, 2013Publication date: January 29, 2015Inventors: JEFFREY Alan LAINE, Mark Bennahmias
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Patent number: 8278027Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.Type: GrantFiled: July 21, 2011Date of Patent: October 2, 2012Assignee: Nexgen Semi Holding, Inc.Inventors: Jeffrey Scott, Michael Zani, Mark Bennahmias, Mark Mayse
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Publication number: 20120028464Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.Type: ApplicationFiled: July 21, 2011Publication date: February 2, 2012Applicant: NEXGEN SEMI HOLDING, INC.Inventors: Jeffrey Scott, Michael Zani, Mark Bennahmias, Mark Mayse
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Patent number: 7993813Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.Type: GrantFiled: November 21, 2007Date of Patent: August 9, 2011Assignee: NexGen Semi Holding, Inc.Inventors: Jeffrey Scott, Michael Zani, Mark Bennahmias, Mark Mayse
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Publication number: 20080160431Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.Type: ApplicationFiled: November 21, 2007Publication date: July 3, 2008Inventors: Jeffrey Scott, Michael Zani, Mark Bennahmias, Mark Mayse
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Patent number: 7336299Abstract: A panoramic annular lens system (PAL), a unitary video camera and a PC-based software system that unwraps a 360° video image into a seamless, distortion free horizontal image image in real time. The PAL system of the preferred embodiment has a 360° horizontal field of view and a 90° vertical field of view in a 40 mm diameter compact package. The invention is not limited to any particular type of lens system. In fact, there are numerous lens systems for providing a 360° panoramic view. The video camera may be a CCD or CMOS based device having a pixel resolution of either 1280×1024 (high resolution) or 720×480 (NTSC). The unwrapping system is a radiometric ray tracing program carried out using a computer's graphics card capabilities to produce highly efficient regional transformation while minimizing software overhead. The result is real time, high resolution 30 fps conversion from a spherical distorted image to a flat panoramic image in Cartesian coordinates.Type: GrantFiled: January 15, 2004Date of Patent: February 26, 2008Assignee: Physical Optics CorporationInventors: Andrew A Kostrzewski, Sookwang Ro, Il'ya Agurok, Mark Bennahmias
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Publication number: 20070284695Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 13, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070284537Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 13, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070284527Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 17, 2007Publication date: December 13, 2007Inventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070284538Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 13, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070278428Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 6, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070278419Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 6, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070278418Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 6, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070045534Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: July 10, 2006Publication date: March 1, 2007Inventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20060023105Abstract: A panoramic annular lens system (PAL), a unitary video camera and a PC-based software system that unwraps a 360° video image into a seamless, distortion free horizontal image image in real time. The PAL system of the preferred embodiment has a 360° horizontal field of view and a 90° vertical field of view in a 40 mm diameter compact package. The invention is not limited to any particular type of lens system. In fact, there are numerous lens systems for providing a 360° panoramic view. The video camera may be a CCD or CMOS based device having a pixel resolution of either 1280×1024 (high resolution) or 720×480 (NTSC). The unwrapping system is a radiometric ray tracing program carried out using a computer's graphics card capabilities to produce highly efficient regional transformation while minimizing software overhead. The result is real time, high resolution 30 fps conversion from a spherical distorted image to a flat panoramic image in Cartesian coordinates.Type: ApplicationFiled: January 15, 2004Publication date: February 2, 2006Inventors: Andrew Kostrzewski, Sookwang Ro, Il'ya Agurok, Mark Bennahmias