Patents by Inventor Mark Davis Smith

Mark Davis Smith has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Model for accurate photoresist profile prediction
    Patent number: 9733576
    Abstract: A photoresist modelling system includes a mathematical model for a photolithography process. The mathematical model may be executable using a computer processor. The mathematical model may be used to model a photoresist as formed on a semiconductor wafer surface. A blocked polymer concentration gradient equation may be implemented into the mathematical model. The blocked polymer concentration gradient equation may describe an initial concentration gradient of a blocked polymer in the photoresist being modelled by the mathematical model.
    Type: Grant
    Filed: March 20, 2014
    Date of Patent: August 15, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Mark Davis Smith, John Biafore
  • MODEL FOR ACCURATE PHOTORESIST PROFILE PREDICTION
    Publication number: 20150261896
    Abstract: A photoresist modelling system includes a mathematical model for a photolithography process. The mathematical model may be executable using a computer processor. The mathematical model may be used to model a photoresist as formed on a semiconductor wafer surface. A blocked polymer concentration gradient equation may be implemented into the mathematical model. The blocked polymer concentration gradient equation may describe an initial concentration gradient of a blocked polymer in the photoresist being modelled by the mathematical model.
    Type: Application
    Filed: March 20, 2014
    Publication date: September 17, 2015
    Applicant: KLA-Tencor Corporation
    Inventors: Mark Davis Smith, John Biafore