Abstract: A mid-wave infrared (MWIR) discrete zoom lens for use with remote surveillance and identification having a dual focal length of 9 and 6.39 inches and F #2.8 and F #2, respectively. In one case, a full field of view is about 30.8 degrees for a 9 inch focal length configuration and about 43 degrees for a 6.39 inch focal length configuration. The lens is corrected for monochromatic and chromatic aberrations over the wavelength range 5100 nm-3300 nm. The focal plane may constitute a pixel array consisting of MWIR sensitive material (e.g. InSb, HgCdTe, nBn, SLS, etc.) for use in high-resolution, wide-area imaging applications.

Abstract: A mid-wave infrared (MWIR) discrete zoom lens for use with remote surveillance and identification having a dual focal length of 9 and 6.39 inches and F #2.8 and F #2, respectively. In one case, a full field of view is about 30.8 degrees for a 9 inch focal length configuration and about 43 degrees for a 6.39 inch focal length configuration. The lens is corrected for monochromatic and chromatic aberrations over the wavelength range 5100 nm-3300 nm. The focal plane may constitute a pixel array consisting of MWIR sensitive material (e.g. InSb, HgCdTe, nBn, SLS, etc.) for use in high-resolution, wide-area imaging applications.

Abstract: A wide field optically athermalized orthoscopic lens system includes, in order from object to image, a first lens having a negative power, a second lens having a positive power, a third lens group having a positive power, a fourth lens having a positive power and a fifth lens having a negative power. The third lens group includes two lenses having, in order, a first lens with positive power and a second lens with negative power. The powers, shapes, Abbe dispersion values and temperature coefficients of refractive indices of the lenses are selected such that the lens system is athermalized, orthoscopic and achromatized over a wide (e.g. >140° C.) temperature range.

Abstract: A wide field optically athermalized orthoscopic lens system includes, in order from object to image, a first lens having a negative power, a second lens having a positive power, a third lens group having a positive power, a fourth lens having a positive power and a fifth lens having a negative power. The third lens group includes two lenses having, in order, a first lens with positive power and a second lens with negative power. The powers, shapes, Abbe dispersion values and temperature coefficients of refractive indices of the lenses are selected such that the lens system is athermalized, orthoscopic and achromatized over a wide (e.g. >140° C.) temperature range.

Abstract: A wide field optically athermalized orthoscopic lens system includes, in order from object to image, a first lens having a negative power, a second lens having a positive power, a third lens group having a positive power, a fourth lens having a positive power and a fifth lens having a negative power. The third lens group includes two lenses having, in order, a first lens with positive power and a second lens with negative power. The powers, shapes, Abbe dispersion values and temperature coefficients of refractive indices of the lenses are selected such that the lens system is athermalized, orthoscopic and achromatized over a wide (e.g. >140° C.) temperature range.

Abstract: A wide field optically athermalized orthoscopic lens system includes, in order from object to image, a first lens having a negative power, a second lens having a positive power, a third lens group having a positive power, a fourth lens having a positive power and a fifth lens having a negative power. The third lens group includes two lenses having, in order, a first lens with positive power and a second lens with negative power. The powers, shapes, Abbe dispersion values and temperature coefficients of refractive indices of the lenses are selected such that the lens system is athermalized, orthoscopic and achromatized over a wide (e.g. >140° C.) temperature range.

Abstract: A hyperspectral imaging system has fore-optics including primary, secondary and tertiary fore-optics mirrors, and an imaging spectrometer including primary, secondary and tertiary spectrometer mirrors. Light from a distant object is collected by the primary fore-optics mirror, and the tertiary fore-optics mirror forms an intermediate object image at an entrance side of a spectrometer slit. The spectrometer mirrors are configured so that light from an exit side of the slit is diffracted by a grating on the secondary mirror, and an image representing spectral and spatial components of the object is formed by the tertiary spectrometer mirror on a focal plane array. The surface of each mirror of the fore-optics and the spectrometer has an associated axis of symmetry. The mirrors are aligned so that their associated axes coincide to define a common system axis, thus making the imaging system easier to assemble and align in relation to prior systems.

Abstract: An off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate is provided. The optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated light is transmitted through the system to form an image on a substrate. The projection system includes an off-axis mirror segment, an aperture stop and a refractive lens group. Alternatively, the projection system includes an off-axis mirror segment, a negative refractive lens group, a concave mirror, a relay, an aperture stop, and a refractive lens group.

Abstract: A hyperspectral imaging system has fore-optics including primary, secondary and tertiary fore-optics mirrors, and an imaging spectrometer including primary, secondary and tertiary spectrometer mirrors. Light from a distant object is collected by the primary fore-optics mirror, and the tertiary fore-optics mirror forms an intermediate object image at an entrance side of a spectrometer slit. The spectrometer mirrors are configured so that light from an exit side of the slit is diffracted by a grating on the secondary mirror, and an image representing spectral and spatial components of the object is formed by the tertiary spectrometer mirror on a focal plane array. The surface of each mirror of the fore-optics and the spectrometer has an associated axis of symmetry. The mirrors are aligned so that their associated axes coincide to define a common system axis, thus making the imaging system easier to assemble and align in relation to prior systems.

Abstract: An imaging catadioptric spectrometer using a Mangin type lens and pupil lens adjacent to a grating. Electromagnetic radiation received by aperture slits is directed to a reflective portion of a Mangin type lens and redirected to a pupil adjacent a diffraction grating. Diffracted light is transmitted through a refractive portion of the Mangin type lens and through a corrector lens to image the spectral components of electromagnetic radiation onto a detector. The detector may be an enhanced detector utilizing an array of smaller spaced detectors. By balancing the powers of the lens elements, a single optical material may be used. In one embodiment, multiple aperture slits are spaced apart and decentered with respect to the optical axis permitting collection of opposing diffraction orders on two detectors. A wide field of view having a low F number is obtained with an operating wavelength range in the infrared from approximately 7.5 to 13.5 microns.

Abstract: The present invention is directed to off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate, such as a semiconductor wafer or flat panel display. In one embodiment the optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated light is transmitted through the system to form an image on a substrate. In a second embodiment the projection system includes an off-axis mirror segment, an aperture stop and a refractive lens group. In a third embodiment the projection system includes an off-axis mirror segment, a negative refractive lens group, a concave mirror, a relay, an aperture stop, and a refractive lens group. A method to produce a device using a lithographic apparatus including a projection system with an off-axis mirror segment as the first element in a projection optics system is also provided.

Abstract: An off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate is provided. In one embodiment the optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated light is transmitted through the system to form an image on a substrate. In a second embodiment the projection system includes an off-axis mirror segment, an aperture stop and a refractive lens group. In a third embodiment the projection system includes an off-axis mirror segment, a negative refractive lens group, a concave mirror, a relay, an aperture stop, and a refractive lens group. A method to produce a device using a lithographic apparatus including a projection system with an off-axis mirror segment as the first element in a projection optics system is also provided.

Abstract: An imaging catadioptric spectrometer using a Mangin type lens and pupil lens adjacent to a grating. Electromagnetic radiation received by aperture slits is directed to a reflective portion of a Mangin type lens and redirected to a pupil adjacent a diffraction grating. Diffracted light is transmitted through a refractive portion of the Mangin type lens and through a corrector lens to image the spectral components of electromagnetic radiation onto a detector. The detector may be an enhanced detector utilizing an array of smaller spaced detectors. By balancing the powers of the lens elements, a single optical material may be used. In one embodiment, multiple aperture slits are spaced apart and decentered with respect to the optical axis permitting collection of opposing diffraction orders on two detectors. A wide field of view having a low F number is obtained with an operating wavelength range in the infrared from approximately 7.5 to 13.5 microns.

Abstract: A wideband, e.g., 550 nm to 940 nm, apochromatic lens system for use with an external aperture stop, includes first, second, and third optical groups having, in order, positive, negative, and positive powers. The first group includes four optical elements having, in order, negative, positive, negative, and positive powers. The second group includes one element of negative power; and the third group includes two elements each having positive power. In another embodiment for use with an internal stop, the system includes first, second, and third optical groups having, in order, positive, positive, and negative powers. The first group includes four optical elements having, in order, positive, negative, positive, and negative powers. The second group includes one element of positive power, and the third group includes one element of negative power. In either embodiment, all of the optical elements are formed from not more than three different types of glass material.

Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.

Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.

Abstract: A maskless lithography system including an illuminating system, a SLM having a non-linear shape (e.g., curved, concave, spherical, etc.), an exposure system, and a beam splitter that directs light from the illuminating system to the SLM and from the SLM to the exposure system. In some embodiments, an optical element can be located between the beam splitter and the SLM, possibly to correct for aberrations.

Abstract: An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.

Abstract: The present invention is directed to off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate, such as a semiconductor wafer or flat panel display. In one embodiment the optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated light is transmitted through the system to form an image on a substrate. In a second embodiment the projection system includes an off-axis mirror segment, an aperture stop and a refractive lens group. In a third embodiment the projection system includes an off-axis mirror segment, a negative refractive lens group, a concave mirror, a relay, an aperture stop, and a refractive lens group. A method to produce a device using a lithographic apparatus including a projection system with an off-axis mirror segment as the first element in a projection optics system is also provided.

Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.