Patents by Inventor Mark S. Korber
Mark S. Korber has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9799707Abstract: Some embodiments include memory structures having a diode over a memory cell. The memory cell can include programmable material between a pair of electrodes, with the programmable material containing a multivalent metal oxide directly against a high-k dielectric. The diode can include a first diode electrode directly over one of the memory cell electrodes and electrically coupled with the memory cell electrode, and can include a second diode electrode laterally outward of the first diode electrode and not directly over the memory cell. Some embodiments include memory arrays comprising the memory structures, and some embodiments include methods of making the memory structures.Type: GrantFiled: July 14, 2016Date of Patent: October 24, 2017Assignee: Micron Technology, Inc.Inventors: Durai Vishak Nirmal Ramaswamy, Mark S. Korber
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Publication number: 20160322426Abstract: Some embodiments include memory structures having a diode over a memory cell. The memory cell can include programmable material between a pair of electrodes, with the programmable material containing a multivalent metal oxide directly against a high-k dielectric. The diode can include a first diode electrode directly over one of the memory cell electrodes and electrically coupled with the memory cell electrode, and can include a second diode electrode laterally outward of the first diode electrode and not directly over the memory cell. Some embodiments include memory arrays comprising the memory structures, and some embodiments include methods of making the memory structures.Type: ApplicationFiled: July 14, 2016Publication date: November 3, 2016Applicant: Micron Technology, Inc.Inventors: Durai Vishak Nirmal Ramaswamy, Mark S. Korber
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Patent number: 9401476Abstract: Some embodiments include memory structures having a diode over a memory cell. The memory cell can include programmable material between a pair of electrodes, with the programmable material containing a multivalent metal oxide directly against a high-k dielectric. The diode can include a first diode electrode directly over one of the memory cell electrodes and electrically coupled with the memory cell electrode, and can include a second diode electrode laterally outward of the first diode electrode and not directly over the memory cell. Some embodiments include memory arrays comprising the memory structures, and some embodiments include methods of making the memory structures.Type: GrantFiled: September 14, 2015Date of Patent: July 26, 2016Assignee: Micron Technology, Inc.Inventors: Durai Vishak Nirmal Ramaswamy, Mark S. Korber
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Publication number: 20160005968Abstract: Some embodiments include memory structures having a diode over a memory cell. The memory cell can include programmable material between a pair of electrodes, with the programmable material containing a multivalent metal oxide directly against a high-k dielectric. The diode can include a first diode electrode directly over one of the memory cell electrodes and electrically coupled with the memory cell electrode, and can include a second diode electrode laterally outward of the first diode electrode and not directly over the memory cell. Some embodiments include memory arrays comprising the memory structures, and some embodiments include methods of making the memory structures.Type: ApplicationFiled: September 14, 2015Publication date: January 7, 2016Applicant: MICRON TECHNOLOGY, INC.Inventors: Durai Vishak Nirmal Ramaswamy, Mark S. Korber
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Patent number: 9136306Abstract: Some embodiments include memory structures having a diode over a memory cell. The memory cell can include programmable material between a pair of electrodes, with the programmable material containing a multivalent metal oxide directly against a high-k dielectric. The diode can include a first diode electrode directly over one of the memory cell electrodes and electrically coupled with the memory cell electrode, and can include a second diode electrode laterally outward of the first diode electrode and not directly over the memory cell. Some embodiments include memory arrays comprising the memory structures, and some embodiments include methods of making the memory structures.Type: GrantFiled: December 29, 2011Date of Patent: September 15, 2015Assignee: Micron Technology, Inc.Inventors: D. V. Nirmal Ramaswamy, Mark S. Korber
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Publication number: 20150056798Abstract: Some embodiments include methods of forming memory cells. Metal oxide may be deposited over a first electrode, with the deposited metal oxide having a relatively low degree of crystallinity. The degree of crystallinity within the metal oxide may be increased after the deposition of the metal oxide. A dielectric material may be formed over the metal oxide, and a second electrode may be formed over the dielectric material. The degree of crystallinity may be increased with a thermal treatment. The thermal treatment may be conducted before, during, and/or after formation of the dielectric material.Type: ApplicationFiled: October 3, 2014Publication date: February 26, 2015Inventors: Noel Rocklein, Durai Ramaswamy, Dale W. Collins, Swapnil Lengade, Srividya Krishnamurthy, Mark S. Korber
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Publication number: 20130168630Abstract: Some embodiments include memory structures having a diode over a memory cell. The memory cell can include programmable material between a pair of electrodes, with the programmable material containing a multivalent metal oxide directly against a high-k dielectric. The diode can include a first diode electrode directly over one of the memory cell electrodes and electrically coupled with the memory cell electrode, and can include a second diode electrode laterally outward of the first diode electrode and not directly over the memory cell. Some embodiments include memory arrays comprising the memory structures, and some embodiments include methods of making the memory structures.Type: ApplicationFiled: December 29, 2011Publication date: July 4, 2013Applicant: MICRON TECHNOLOGY, INC.Inventors: D. V. Nirmal Ramaswamy, Mark S. Korber
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Patent number: 7727840Abstract: Methods of forming integrated circuit devices are provided. A first mask layer is formed overlying a first portion of a semiconductor substrate. The first mask layer further overlies a second mask layer overlying a second portion of the semiconductor substrate. The first mask layer overlying the first portion of the semiconductor substrate is patterned to define areas for removal of one or more layers of material interposed between the semiconductor substrate and the first mask layer. Portions of the one or more layers of material exposed by the patterned first mask layer are removed to define elements of the integrated circuit device overlying the first portion of the semiconductor substrate.Type: GrantFiled: July 13, 2007Date of Patent: June 1, 2010Assignee: Micron Technology, Inc.Inventor: Mark S. Korber
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Patent number: 7670907Abstract: A hard mask layer is formed and patterned overlying a semiconductor substrate of a semiconductor device. The patterned hard mask layer exposes two or more areas of the substrate for future isolation regions of the semiconductor device. Portions of the substrate are removed in the areas for future isolation regions, thereby forming two or more trenches. A second mask layer is formed overlying a first portion of the hard mask layer and at least one first trench, and a second portion of the hard mask layer and at least one second trench are left uncovered. Additional substrate material is removed from the at least one second trench so that the at least one second trench is deeper than the at least one first trench. The hard mask layer and the second mask are removed substantially concurrently.Type: GrantFiled: March 18, 2008Date of Patent: March 2, 2010Assignee: Micron Technology, Inc.Inventor: Mark S. Korber
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Publication number: 20080166843Abstract: A hard mask layer is formed and patterned overlying a semiconductor substrate of a semiconductor device. The patterned hard mask layer exposes two or more areas of the substrate for future isolation regions of the semiconductor device. Portions of the substrate are removed in the areas for future isolation regions, thereby forming two or more trenches. A second mask layer is formed overlying a first portion of the hard mask layer and at least one first trench, and a second portion of the hard mask layer and at least one second trench are left uncovered. Additional substrate material is removed from the at least one second trench so that the at least one second trench is deeper than the at least one first trench. The hard mask layer and the second mask are removed substantially concurrently.Type: ApplicationFiled: March 18, 2008Publication date: July 10, 2008Inventor: Mark S. Korber
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Patent number: 7344942Abstract: A hard mask layer is formed and patterned overlying a semiconductor substrate of a semiconductor device. The patterned hard mask layer exposes two or more areas of the substrate for future isolation regions of the semiconductor device. Portions of the substrate are removed in the areas for future isolation regions, thereby forming two or more trenches. A second mask layer is formed overlying a first portion of the hard mask layer and at least one first trench, and a second portion of the hard mask layer and at least one second trench are left uncovered. Additional substrate material is removed from the at least one second trench so that the at least one second trench is deeper than the at least one first trench. The hard mask layer and the second mask are removed substantially concurrently.Type: GrantFiled: January 26, 2005Date of Patent: March 18, 2008Assignee: Micron Technology, Inc.Inventor: Mark S. Korber
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Patent number: 7259064Abstract: Methods of forming integrated circuit devices are provided. A first mask layer is formed overlying a first portion of a semiconductor substrate. The first mask layer further overlies a second mask layer overlying a second portion of the semiconductor substrate. The first mask layer overlying the first portion of the semiconductor substrate is patterned to define areas for removal of one or more layers of material interposed between the semiconductor substrate and the first mask layer. Portions of the one or more layers of material exposed by the patterned first mask layer are removed to define elements of the integrated circuit device overlying the first portion of the semiconductor substrate.Type: GrantFiled: January 26, 2005Date of Patent: August 21, 2007Assignee: Micron Technology, Inc.Inventor: Mark S. Korber