Patents by Inventor Mark S. Wang
Mark S. Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11923185Abstract: A method of forming a high-pressure plasma lamp includes providing a lamp bulb. The lamp bulb includes a top channel and a bottom channel. The method includes inserting a top electrode element into the top channel of the lamp bulb. The method includes providing a glass tubular structure attached to a bottom electrode element. The method includes filling the lamp bulb with a liquified gas through the bottom channel of the lamp bulb. The method includes inserting the bottom electrode element and the glass tubular structure into the bottom channel.Type: GrantFiled: June 10, 2022Date of Patent: March 5, 2024Assignee: KLA CorporationInventors: Mark S. Wang, Joshua Wittenberg
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Patent number: 11668655Abstract: A semiconductor-inspection tool scans a semiconductor die using a plurality of optical modes. A plurality of defects on the semiconductor die are identified based on results of the scanning. Respective defects of the plurality of defects correspond to respective pixel sets of the semiconductor-inspection tool. The scanning fails to resolve the respective defects. The results include multi-dimensional data based on pixel intensity for the respective pixel sets, wherein each dimension of the multi-dimensional data corresponds to a distinct mode of the plurality of optical modes. A discriminant function is applied to the results to transform the multi-dimensional data for the respective pixel sets into respective scores. Based at least in part on the respective scores, the respective defects are divided into distinct classes.Type: GrantFiled: February 11, 2019Date of Patent: June 6, 2023Assignee: KLA CorporationInventors: Vaibhav Gaind, Grace H. Chen, Amrit Poudel, Mark S. Wang
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Patent number: 11637008Abstract: A plasma lamp for use in a broadband plasma source of an inspection tool is disclosed. The plasma lamp includes a plasma bulb configured to contain a gas and generate a plasma within the plasma bulb. The plasma bulb is formed from a material at least partially transparent to illumination from a pump laser and at least a portion of broadband radiation emitted by the plasma. The plasma bulb includes a conical pocket. The conical pocket is configured to disrupt a plume rising from the plasma.Type: GrantFiled: August 18, 2022Date of Patent: April 25, 2023Assignees: KLA CORPORATION, USHIO, INC.Inventors: Sumeet Kumar, Joshua Wittenberg, Mark S. Wang, Rajkeshar Singh, Yoshio Kagebayashi, Shinichiro Nozaki
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Publication number: 20220406553Abstract: A method of forming a high-pressure plasma lamp includes providing a lamp bulb. The lamp bulb includes a top channel and a bottom channel. The method includes inserting a top electrode element into the top channel of the lamp bulb. The method includes providing a glass tubular structure attached to a bottom electrode element. The method includes filling the lamp bulb with a liquified gas through the bottom channel of the lamp bulb. The method includes inserting the bottom electrode element and the glass tubular structure into the bottom channel.Type: ApplicationFiled: June 10, 2022Publication date: December 22, 2022Inventors: Mark S. Wang, Joshua Wittenberg
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Publication number: 20220252512Abstract: An imaging system may include an imaging metrology tool with an illumination source, one or more illumination optics to direct illumination from the illumination source to a sample, a detector, one or more collection optics to image the sample onto the detector; and one or more aberration-controlling components. The one or more aberration-controlling components may provide aberration correction for imaging the sample onto the detector according to one or more degrees of freedom, where the one or more degrees of freedom include at least a defocus of the imaging system, and where the one or more aberration-controlling components are integrated with at least one of the one or more illumination optics, the one or more collection optics, or the detector.Type: ApplicationFiled: January 5, 2022Publication date: August 11, 2022Inventors: Xiumei Liu, Mark S. Wang
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Publication number: 20200025689Abstract: A semiconductor-inspection tool scans a semiconductor die using a plurality of optical modes. A plurality of defects on the semiconductor die are identified based on results of the scanning. Respective defects of the plurality of defects correspond to respective pixel sets of the semiconductor-inspection tool. The scanning fails to resolve the respective defects. The results include multi-dimensional data based on pixel intensity for the respective pixel sets, wherein each dimension of the multi-dimensional data corresponds to a distinct mode of the plurality of optical modes. A discriminant function is applied to the results to transform the multi-dimensional data for the respective pixel sets into respective scores. Based at least in part on the respective scores, the respective defects are divided into distinct classes.Type: ApplicationFiled: February 11, 2019Publication date: January 23, 2020Inventors: Vaibhav Gaind, Grace H. Chen, Amrit Poudel, Mark S. Wang
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Patent number: 9927371Abstract: A line scan wafer inspection system includes a confocal slit aperture filter to remove sidelobes and enhance resolution in the scanning direction. A position detector associated with the slit aperture filter monitors and corrects illumination line image positions relative to the slit aperture to keep image position variations within tolerable limits. Each detector measures a line position and then uses the line position signal to adjust optical, mechanical, and electronic components in the collection path in a feedback loop. The feedback loop may be employed in a runtime calibration process or during inspection to enhance stability.Type: GrantFiled: April 21, 2015Date of Patent: March 27, 2018Assignee: KLA-Tencor CorporationInventors: Mark S. Wang, Chris Kirk, Andrey Kharisov
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Patent number: 9423357Abstract: One embodiment relates to an oblique illuminator. The oblique illuminator includes a light source emitting a light beam, a first reflective surface, and a second reflective surface. The first reflective surface has a convex cylindrical shape with a projected parabolic profile along the non-powered direction which is configured to reflect the light beam from the light source and which defines a focal line. The second reflective surface has a concave cylindrical shape with a projected elliptical profile which is configured to reflect the light beam from the first reflective surface and which defines first and second focal lines. The focal line of the first reflective surface is coincident with the first focal line of the second reflective surface. The first and second focal lines of the second reflective surface may be a same line in which case the elliptical curvature is a projected spherical profile. Other embodiments, aspects and features are also disclosed.Type: GrantFiled: May 28, 2014Date of Patent: August 23, 2016Assignee: KLA-Tencor CorporationInventors: Shiyu Zhang, Charles N. Wang, Yevgeniy Churin, Yong-Mo Moon, Hyoseok Daniel Yang, Mark S. Wang
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Publication number: 20150369750Abstract: A line scan wafer inspection system includes a confocal slit aperture filter to remove sidelobes and enhance resolution in the scanning direction. A position detector associated with the slit aperture filter monitors and corrects illumination line image positions relative to the slit aperture to keep image position variations within tolerable limits. Each detector measures a line position and then uses the line position signal to adjust optical, mechanical, and electronic components in the collection path in a feedback loop. The feedback loop may be employed in a runtime calibration process or during inspection to enhance stability.Type: ApplicationFiled: April 21, 2015Publication date: December 24, 2015Inventors: Mark S. Wang, Chris Kirk, Andrey Kharisov
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Publication number: 20140299779Abstract: One embodiment relates to an oblique illuminator. The oblique illuminator includes a light source emitting a light beam, a first reflective surface, and a second reflective surface. The first reflective surface has a convex cylindrical shape with a projected parabolic profile along the non-powered direction which is configured to reflect the light beam from the light source and which defines a focal line. The second reflective surface has a concave cylindrical shape with a projected elliptical profile which is configured to reflect the light beam from the first reflective surface and which defines first and second focal lines. The focal line of the first reflective surface is coincident with the first focal line of the second reflective surface. The first and second focal lines of the second reflective surface may be a same line in which case the elliptical curvature is a projected spherical profile. Other embodiments, aspects and features are also disclosed.Type: ApplicationFiled: May 28, 2014Publication date: October 9, 2014Applicant: KLA-TENCOR CORPORATIONInventors: Shiyu ZHANG, Charles N. WANG, Yevgeniy CHURIN, Yong-Mo MOON, Hyoseok Daniel YANG, Mark S. WANG
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Patent number: 8794801Abstract: One embodiment relates to an oblique illuminator. The oblique illuminator includes a light source emitting a light beam, a first reflective surface, and a second reflective surface. The first reflective surface has a convex cylindrical shape with a projected parabolic profile along the non-powered direction which is configured to reflect the light beam from the light source and which defines a focal line. The second reflective surface has a concave cylindrical shape with a projected elliptical profile which is configured to reflect the light beam from the first reflective surface and which defines first and second focal lines. The focal line of the first reflective surface is coincident with the first focal line of the second reflective surface. The first and second focal lines of the second reflective surface may be a same line in which case the elliptical curvature is a projected spherical profile. Other embodiments, aspects and features are also disclosed.Type: GrantFiled: July 26, 2011Date of Patent: August 5, 2014Assignee: KLA-Tencor CorporationInventors: Shiyu Zhang, Charles N. Wang, Yevgeniy Churin, Yong-Mo Moon, Hyoseok Daniel Yang, Mark S. Wang
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Publication number: 20120218545Abstract: One embodiment relates to an oblique illuminator. The oblique illuminator includes a light source emitting a light beam, a first reflective surface, and a second reflective surface. The first reflective surface has a convex cylindrical shape with a projected parabolic profile along the non-powered direction which is configured to reflect the light beam from the light source and which defines a focal line. The second reflective surface has a concave cylindrical shape with a projected elliptical profile which is configured to reflect the light beam from the first reflective surface and which defines first and second focal lines. The focal line of the first reflective surface is coincident with the first focal line of the second reflective surface. The first and second focal lines of the second reflective surface may be a same line in which case the elliptical curvature is a projected spherical profile. Other embodiments, aspects and features are also disclosed.Type: ApplicationFiled: July 26, 2011Publication date: August 30, 2012Inventors: Shiyu Zhang, Charles N. Wang, Yevgeniy Churin, Yong-Mo Moon, Hyoseok Daniel Yang, Mark S. Wang
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Patent number: 7397557Abstract: Serrated Fourier filters and inspection systems are provided. One Fourier filter includes one or more blocking elements configured to block a portion of light from a wafer. The Fourier filter also includes periodic serrations formed on edges of the one or more blocking elements. The periodic serrations define a transition region of the one or more blocking elements. The periodic serrations are configured to vary transmission across the transition region such that variations in the transmission across the transition region are substantially smooth. One inspection system includes a Fourier filter configured as described above and a detector that is configured to detect light transmitted by the Fourier filter. Signals generated by the detector can be used to detect the defects on the wafer.Type: GrantFiled: June 6, 2005Date of Patent: July 8, 2008Assignee: KLA-Tencor Technologies Corp.Inventors: Hwan J. Jeong, Andrew V. Hill, Mark S. Wang
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Patent number: 6895129Abstract: An optical circulator has a first collimator; a first block of birefringent material; a first compound polarization rotator; a light angle deflector (e.g., Wollaston prism); a second compound polarization rotator; a second block of birefringent material; and a second collimator. Light from the first fiber exits the first collimator along a first path into a first collimated beam that first hits the central plane on a crossing line between the interface and the central plane such that the first collimated beam exits the light angle deflector along a second path substantially parallel to the longitudinal direction and is received by the second fiber. Light from the second fiber exits the second collimator along the second path into a second collimated beam that exits the light angle deflector along a third path and is received by the third fiber.Type: GrantFiled: April 29, 2002Date of Patent: May 17, 2005Assignee: Oplink Communications, Inc.Inventors: Zhimin Liu, Mark S. Wang, Shifang Li, Wenhui Wang, Yanbin Shao
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Patent number: 6747797Abstract: A four-port loop optical circulator includes a first, a second, a third and a fourth optical ports for receiving optical beam therein. The circulator further includes a plurality of optical components. The optical components include a walk-off crystal for generating a vertical optical path displacement for a vertical polarized optical beam and for passing a horizontally polarized optical beam therethrough maintaining a same optical path. The optical components also include a vertical displacement device for shifting an optical path along a vertical direction with a predefined vertical displacement for an optical beam transmitted with a particular polarization. The vertical displacement device is coupled to the walk-off crystal for guiding a beam received from the fourth port to project from the first port.Type: GrantFiled: July 5, 2001Date of Patent: June 8, 2004Assignee: Oplink Communications, Inc.Inventors: Zhimin Liu, Mark S. Wang, Jingyu Xu
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Publication number: 20030202729Abstract: An optical circulator has a first collimator; a first block of birefringent material; a first compound polarization rotator for rendering mutually parallel polarizations orthogonal and mutually orthogonal polarizations parallel; a light angle deflector (e.g., Wollaston prism); a second compound polarization rotator for rendering mutually parallel polarizations orthogonal and mutually orthogonal polarizations parallel; a second block of birefringent material; and a second collimator. Light from the first fiber exits the first collimator along a first path into a first collimated beam that first hits the central plane on a crossing line between the interface and the central plane such that the first collimated beam exits the light angle deflector along a second path substantially parallel to the longitudinal direction and is received by the second fiber.Type: ApplicationFiled: April 29, 2002Publication date: October 30, 2003Inventors: Zhimin Liu, Mark S. Wang, Shifang Li, Wenhui Wang, Yanbin Shao
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Publication number: 20030007244Abstract: This invention discloses a four-port loop optical circulator. The circulator includes a first, a second, a third and a fourth optical ports for receiving optical beam therein. The circulator further includes a plurality of optical components for guiding a beam received from the first port to project from the second port, for guiding a beam received from the second port to project from the third port. The optical components are further used for guiding a beam received from the third port to project from the fourth port, and for guiding a beam received from the fourth port to project from the first port. In a preferred embodiment, the plurality of optical components further include a walk-off crystal for generating a vertical optical path displacement for a vertical polarized optical beam and for passing a horizontally polarized optical beam therethrough maintaining a same optical path.Type: ApplicationFiled: July 5, 2001Publication date: January 9, 2003Applicant: Oplink Communications, Inc.Inventors: Zhimin Liu, Mark S. Wang, Jingyu Xu
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Patent number: 6441960Abstract: The present invention provides a line of optical interleavers in which a novel beam-swapping element is utilized. The beam-swapping element of the present invention provides an effective and inexpensive alternative to polarization rotators and birefrigent elements employed in the prior art optical interleavers, hence rendering a simple and low-cost assembly to the optical interleavers of the present invention. The optical interleavers of the present invention further advantageously exploit a combination of two wavelength filters to cancel out wavelength-filter-induced-dispersion. Efforts are also painstakingly made in the optical interleavers of the present invention to substantially minimize other dispersion effects. As such, the optical interleavers of the present invention constitute the first kind in the art in which various dispersion effects are substantially minimized. Such characteristics would be highly desirable in fiber-optic networks.Type: GrantFiled: September 1, 2000Date of Patent: August 27, 2002Assignee: Oplink Communications, Inc.Inventors: Mark S. Wang, Wei-Zhong Li
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Patent number: 5922617Abstract: Methods and apparatus are employed for determining interactions between different components, of the same or different type of composition. The apparatus provides for arrays of samples in tracks, where light emitting labels are excited and emitted light detected. Headers are provided for defining sites, so that particular interactions can be rapidly detected. Particularly, disks having circular tracks with headers defining sites on the tracks, so that positive signals can be interpreted in relation to the information provided by the header. Various modifications can be made, such as preprepared segments which may then be attached to the disk for assaying.Type: GrantFiled: November 12, 1997Date of Patent: July 13, 1999Assignee: Functional Genetics, Inc.Inventors: Mark S. Wang, Limin Li