Abstract: A reflector element and a method for manufacturing a reflector element are disclosed. In an embodiment the reflector element includes a plastic substrate and a silver layer arranged on the plastic substrate. The reflector element further includes a first barrier layer arranged on the silver layer, wherein the barrier layer has an at least 15 nm-thick oxide layer and a second barrier layer arranged on the first barrier layer, wherein the barrier layer includes siloxane, and wherein a thickness of the second barrier layer is at least 250 nm and at most 450 nm.

Abstract: A method for producing a reflector element and a reflector element are disclosed. In an embodiment the method includes depositing a layer sequence on a substrate, wherein the layer sequence includes at least one mirror layer and at least one reactive multilayer system and igniting the reactive multilayer system in order to activate heat input in the layer sequence.

Abstract: An optical element including a reflective coating is disclosed. In an embodiment the reflective coating includes an adhesion-promoting layer, an at least partially reflective silver layer disposed on the adhesion-promoting layer and a protective layer system disposed on the silver layer, wherein the protective layer system includes a plurality of dielectric layers, wherein the dielectric layers include at least one first layer and at least one second layer, wherein the first layer and the second layer have a different resistance to at least two different contamination substances, wherein the dielectric layers have a thickness of not more than 30 nm, and wherein a number of the dielectric layers amounts to at least five.

Abstract: The invention describes a light emitting device (100). The light emitting device (100) comprises at least one light emitting structure (110), at least one processing layer (120) and at least one optical structure (130). The optical structure (130) comprises at least one material processed by means of processing light (150). The at least one processing layer (120) is arranged to reduce reflection of the processing light (150) in a direction of the optical structure (130) at least by 50%, preferably at least by 80%, more preferably at least by 95% and most preferably at least by 99% during processing of the material by means of the processing light (150). It is a basic idea of the present invention to incorporate a non- or low-reflective processing layer (120) on top of a light emitting structure (110) like a VCSEL array in order to enable on wafer processing of light emitting structures (130) like microlens arrays. The invention further describes a method of manufacturing such a light emitting device (100).

Abstract: The invention describes a light emitting device (100). The light emitting device (100) comprises at least one light emitting structure (110), at least one processing layer (120) and at least one optical structure (130). The optical structure (130) comprises at least one material processed by means of processing light (150). The at least one processing layer (120) is arranged to reduce reflection of the processing light (150) in a direction of the optical structure (130) at least by 50%, preferably at least by 80%, more preferably at least by 95% and most preferably at least by 99% during processing of the material by means of the processing light (150). It is a basic idea of the present invention to incorporate a non- or low-reflective processing layer (120) on top of a light emitting structure (110) like a VCSEL array in order to enable on wafer processing of light emitting structures (130) like microlens arrays. The invention further describes a method of manufacturing such a light emitting device (100).

Abstract: A reflector element and a method for manufacturing a reflector element are disclosed. In an embodiment the reflector element includes a plastic substrate and a silver layer arranged on the plastic substrate. The reflector element further includes a first barrier layer arranged on the silver layer, wherein the barrier layer has an at least 15 nm-thick oxide layer and a second barrier layer arranged on the first barrier layer, wherein the barrier layer includes siloxane, and wherein a thickness of the second barrier layer is at least 250 nm and at most 450 nm.

Abstract: A method for producing a reflector element and a reflector element are disclosed. In an embodiment the method includes depositing a layer sequence on a substrate, wherein the layer sequence includes at least one mirror layer and at least one reactive multilayer system and igniting the reactive multilayer system in order to activate heat input in the layer sequence.

Abstract: An optical element including a reflective coating is disclosed. In an embodiment the reflective coating includes an adhesion-promoting layer, an at least partially reflective silver layer disposed on the adhesion-promoting layer and a protective layer system disposed on the silver layer, wherein the protective layer system includes a plurality of dielectric layers, wherein the dielectric layers include at least one first layer and at least one second layer, wherein the first layer and the second layer have a different resistance to at least two different contamination substances, wherein the dielectric layers have a thickness of not more than 30 nm, and wherein a number of the dielectric layers amounts to at least five.

Abstract: The present invention pertains to a process for the silicate bonding of joined surfaces, facing one another, of two components by means of an aqueous, alkaline, silicon-cation-containing joining solution for the purpose of producing an optical element, characterized in that one or both of said joined surfaces (1; 2b; 10) are covered with a layer of an oxide (3), which has a higher refractive index than SiO2 and is selected from among oxides of the third and fourth main group elements, of the second and third group of the transition elements as well as zirconium and from among mixed oxides of the said elements, whereupon the joining solution is applied to at least one of the surfaces to be joined and the surfaces are bonded to one another.

Abstract: The present invention pertains to a process for the silicate bonding of joined surfaces, facing one another, of two components by means of an aqueous, alkaline, silicon-cation-containing joining solution for the purpose of producing an optical element, characterized in that one or both of said joined surfaces (1; 2b; 10) are covered with a layer of an oxide (3), which has a higher refractive index than SiO2 and is selected from among oxides of the third and fourth main group elements, of the second and third group of the transition elements as well as zirconium and from among mixed oxides of the said elements, whereupon the joining solution is applied to at least one of the surfaces to be joined and the surfaces are bonded to one another.