Patents by Inventor Mark W. Hart
Mark W. Hart has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10770769Abstract: A method includes dispensing ion-conducting particles on a substrate comprising an adhesive to which the ion-conducting particles adhere; overcoating the ion conducting particles with a polymer; removing the substrate and the adhesive from the ion conducting particles; and removing a polymer overburden on the ion conducting particles to form a device that includes: (i) the polymer or a derivative thereof, and (ii) ion-conducting particles. At least a portion of the ion-conducting particles extend through the polymer or its derivative.Type: GrantFiled: December 4, 2018Date of Patent: September 8, 2020Assignees: International Business Machines Corporation, Asahi Kasei Kabushiki KaishaInventors: Naga Phani B. Aetukuri, Mark W. Hart, Ho-Cheol Kim, Shintaro Kitajima, Leslie E. Krupp, Bryan D. McCloskey, Robert D. Miller, John Campbell Scott, Winfried Wilcke
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Publication number: 20190109359Abstract: A method includes dispensing ion-conducting particles on a substrate comprising an adhesive to which the ion-conducting particles adhere; overcoating the ion conducting particles with a polymer; removing the substrate and the adhesive from the ion conducting particles; and removing a polymer overburden on the ion conducting particles to form a device that includes: (i) the polymer or a derivative thereof, and (ii) ion-conducting particles. At least a portion of the ion-conducting particles extend through the polymer or its derivative.Type: ApplicationFiled: December 4, 2018Publication date: April 11, 2019Inventors: Naga Phani B. Aetukuri, Mark W. Hart, Ho-Cheol Kim, Shintaro Kitajima, Leslie E. Krupp, Bryan D. McCloskey, Robert D. Miller, John Campbell Scott, Winfried Wilcke
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Patent number: 10170813Abstract: A method includes dispensing ion-conducting particles on a substrate comprising an adhesive to which the ion-conducting particles adhere; overcoating the ion conducting particles with a polymer; removing the substrate and the adhesive from the ion conducting particles; and removing a polymer overburden on the ion conducting particles to form a device that includes: (i) the polymer or a derivative thereof, and (ii) ion-conducting particles. At least a portion of the ion-conducting particles extend through the polymer or its derivative.Type: GrantFiled: May 6, 2016Date of Patent: January 1, 2019Assignees: International Business Machines Corporation, ASAHI KASEI KABUSHIKI KAISHAInventors: Naga Phani B. Aetukuri, Mark W. Hart, Ho-Cheol Kim, Shintaro Kitajima, Leslie E. Krupp, Bryan D. McCloskey, Robert D. Miller, John Campbell Scott, Winfried Wilcke
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Patent number: 9520627Abstract: A device includes a membrane that is: (i) impermeable to oxygen, and (ii) insoluble in at least one polar solvent; and ion conducting particles in the membrane. At least some of the particles extend from a first side of the membrane to an opposed second side of the membrane. The thickness of the membrane is 15 ?m to 100 ?m.Type: GrantFiled: March 6, 2014Date of Patent: December 13, 2016Assignees: International Business Machines Corporation, Asahi Kasei Kabushiki KaishaInventors: Naga Phani B. Aetukuri, Mark W. Hart, Ho-Cheol Kim, Shintaro Kitajima, Leslie E. Krupp, Bryan D. McCloskey, Robert D. Miller, John Campbell Scott, Winfried Wilcke
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Publication number: 20160254560Abstract: A method includes dispensing ion-conducting particles on a substrate comprising an adhesive to which the ion-conducting particles adhere; overcoating the ion conducting particles with a polymer; removing the substrate and the adhesive from the ion conducting particles; and removing a polymer overburden on the ion conducting particles to form a device that includes: (i) the polymer or a derivative thereof, and (ii) ion-conducting particles. At least a portion of the ion-conducting particles extend through the polymer or its derivative.Type: ApplicationFiled: May 6, 2016Publication date: September 1, 2016Inventors: Naga Phani B. Aetukuri, Mark W. Hart, Ho-Cheol Kim, Shintaro Kitajima, Leslie E. Krupp, Bryan D. McCloskey, Robert D. Miller, John Campbell Scott, Winfried Wilcke
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Patent number: 9235124Abstract: Molecular glass based planarizing compositions for lithographic processing are disclosed. The processes generally include casting the planarizing composition onto a surface comprised of lithographic features, the planarizing composition comprising at least one molecular glass and at least one solvent; and heating the planarizing composition to a temperature greater than a glass transition temperature of the at least one molecular glass. Exemplary molecular glasses include polyhedral oligomeric silsesquioxane derivatives, calixarenes, cyclodextrin derivatives, and other non-polymeric large molecules.Type: GrantFiled: January 8, 2013Date of Patent: January 12, 2016Assignee: GLOBALFOUNDRIES INC.Inventors: Robert D. Allen, Mark W. Hart, Ratnam Sooriyakumaran
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Publication number: 20150255767Abstract: A device includes a membrane that is: (i) impermeable to oxygen, and (ii) insoluble in at least one polar solvent; and ion conducting particles in the membrane. At least some of the particles extend from a first side of the membrane to an opposed second side of the membrane. The thickness of the membrane is 15 ?m to 100 ?m.Type: ApplicationFiled: March 6, 2014Publication date: September 10, 2015Applicants: ASAHI KASEI KABUSHIKI KAISHA, INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Naga Phani B. Aetukuri, Mark W. Hart, Ho-Cheol Kim, Shintaro Kitajima, Leslie E. Krupp, Bryan D. McCloskey, Robert D. Miller, John Campbell Scott, Winfried Wilcke
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Patent number: 8529779Abstract: A method for producing surface features and an etch masking method. A combination is provided of a block copolymer and additional material. The block copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. A film is formed of the combination directly onto a surface of a first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film of the combination and the first layer are etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. The film is removed and features remain on the surface of the first layer. Also included is an etch masking method where the nanostructures mask portions of the first layer from said etchant.Type: GrantFiled: March 28, 2008Date of Patent: September 10, 2013Assignee: International Business Machines CorporationInventors: Joy Cheng, Mark W. Hart, Hiroshi Ito, Ho-Cheol Kim, Robert Miller
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Patent number: 8377631Abstract: Molecular glass based planarizing compositions for lithographic processing are disclosed. The processes generally include casting the planarizing composition onto a surface comprised of lithographic features, the planarizing composition comprising at least one molecular glass and at least one solvent; and heating the planarizing composition to a temperature greater than a glass transition temperature of the at least one molecular glass. Exemplary molecular glasses include polyhedral oligomeric silsesquioxane derivatives, calixarenes, cyclodextrin derivatives, and other non-polymeric large molecules.Type: GrantFiled: October 6, 2009Date of Patent: February 19, 2013Assignee: International Business Machines CorporationInventors: Robert D. Allen, Mark W. Hart, Ratnam Sooriyakumaran
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Publication number: 20110079579Abstract: Molecular glass based planarizing compositions for lithographic processing are disclosed. The processes generally include casting the planarizing composition onto a surface comprised of lithographic features, the planarizing composition comprising at least one molecular glass and at least one solvent; and heating the planarizing composition to a temperature greater than a glass transition temperature of the at least one molecular glass. Exemplary molecular glasses include polyhedral oligomeric silsesquioxane derivatives, calixarenes, cyclodextrin derivatives, and other non-polymeric large molecules.Type: ApplicationFiled: October 6, 2009Publication date: April 7, 2011Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Robert D. Allen, Mark W. Hart, Ratnam Sooriyakumaran
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Patent number: 7828986Abstract: A method. A combination is provided of a block copolymer and additional material. The copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. The first polymer includes polystyrene and the second polymer includes poly(ethylene oxide). A first layer including polydimethylglutarimide is adhered onto a surface of a substrate including a dielectric coated silicon wafer. A film is formed of the combination directly onto a surface of the first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film and the first layer are simultaneously etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. Portions of the film are removed. Features remain on the surface of the first layer.Type: GrantFiled: October 29, 2007Date of Patent: November 9, 2010Assignee: International Business Machines CorporationInventors: Joy Cheng, Mark W. Hart, Hiroshi Ito, Ho-Cheol Kim, Robert Miller
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Patent number: 7749422Abstract: An imprint process comprising coating a selected surface of a micropatterned template with a release composition having a basic reactive moiety; wherein the template is transparent to UV radiation; imprinting the template onto a photocationically curable composition; curing the UV curable composition to form an imprinted composition, wherein the release composition having a basic reactive moiety is effective to locally inhibit curing of the composition at an interface between the template and the imprinted composition; and releasing the template from the imprinted composition.Type: GrantFiled: March 30, 2007Date of Patent: July 6, 2010Assignee: International Business Machines CorporationInventors: Robert D. Allen, Mark W. Hart, Frances Houle, Hiroshi Ito
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Patent number: 7682866Abstract: A method for fabrication and a structure of a self-aligned (crosspoint) memory device comprises lines (wires) in a first direction and in a second direction. The wires in the first direction are formed using a hard mask material that is resistant to the pre-selected etch processes used for creation of the lines in both the first and the second direction. Consequently, the hard mask material for the lines in the first direction form part of the memory stack.Type: GrantFiled: January 19, 2006Date of Patent: March 23, 2010Assignee: International Business Machines CorporationInventors: Mark W. Hart, Christie R. K. Marrian, Gary M. McClelland, Charles T. Rettner, Hemantha K. Wickramasinghe
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Publication number: 20090107953Abstract: A method for producing surface features and an etch masking method. A combination is provided of a block copolymer and additional material. The block copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. A film is formed of the combination directly onto a surface of a first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film of the combination and the first layer are etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. The film is removed and features remain on the surface of the first layer. Also included is an etch masking method where the nanostructures mask portions of the first layer from said etchant.Type: ApplicationFiled: March 28, 2008Publication date: April 30, 2009Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Joy Cheng, Mark W. Hart, Hiroshi Ito, Ho-Cheol Kim, Robert Miller
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Publication number: 20090107950Abstract: A method for producing surface features and an etch masking method. A combination is provided of a block copolymer and additional material. The block copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. A film is formed of the combination directly onto a surface of a first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film of the combination and the first layer are etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. The film is removed and features remain on the surface of the first layer. Also included is an etch masking method where the nanostructures mask portions of the first layer from said etchant.Type: ApplicationFiled: October 29, 2007Publication date: April 30, 2009Inventors: Joy Cheng, Mark W. Hart, Hiroshi Ito, Ho-Cheol Kim, Robert Miller
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Publication number: 20080248213Abstract: An imprint process comprising coating a selected surface of a micropatterned template with a release composition having a basic reactive moiety; wherein the template is transparent to UV radiation; imprinting the template onto a photocationically curable composition; curing the UV curable composition to form an imprinted composition, wherein the release composition having a basic reactive moiety is effective to locally inhibit curing of the composition at an interface between the template and the imprinted composition; and releasing the template from the imprinted composition.Type: ApplicationFiled: April 2, 2008Publication date: October 9, 2008Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Robert D. Allen, Mark W. Hart, Frances Houle, Hiroshi Ito
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Publication number: 20080241418Abstract: An imprint process comprising coating a selected surface of a micropatterned template with a release composition having a basic reactive moiety; wherein the template is transparent to UV radiation; imprinting the template onto a photocationically curable composition; curing the UV curable composition to form an imprinted composition, wherein the release composition having a basic reactive moiety is effective to locally inhibit curing of the composition at an interface between the template and the imprinted composition; and releasing the template from the imprinted composition.Type: ApplicationFiled: March 30, 2007Publication date: October 2, 2008Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Robert D. Allen, Mark W. Hart, Frances Houle, Hiroshi Ito
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Patent number: 7038231Abstract: A method for fabrication and a structure of a self-aligned (crosspoint) memory device comprises lines (wires) in a first direction and in a second direction. The wires in the first direction are formed using a hard mask material that is resistant to the pre-selected etch processes used for creation of the lines in both the first and the second direction. Consequently, the hard mask material for the lines in the first direction form part of the memory stack.Type: GrantFiled: April 30, 2004Date of Patent: May 2, 2006Assignee: International Business Machines CorporationInventors: Mark W. Hart, Christie R. K. Marrian, Gary M. McClelland, Charles T. Rettner, Hermantha K. Wickramasinghe
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Patent number: 7009694Abstract: A method and structure for a memory cell comprising a phase change material; a heating element in thermal contact with the phase change material, wherein the heating element is adapted to induce a phase change in the phase change material; and electrical lines configured to pass current through the heating element, wherein the phase change material and the heating element are arranged in a configuration other than being electrically connected in series. The memory cell further comprises a sensing element in thermal contact with the phase change material, wherein the sensing element is adapted to detect a change in at least one physical property of the phase change material, wherein the sensing element is adapted to detect a change in a thermal conductivity of the phase change material.Type: GrantFiled: May 28, 2004Date of Patent: March 7, 2006Assignee: International Business Machines CorporationInventors: Mark W. Hart, Chung H. Lam, Christie R. K. Marrian, Gary M. McClelland, Simone Raoux, Charles T. Rettner, Hemantha K. Wickramasinghe
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Patent number: 6727873Abstract: A reflective color electrophoretic display intended to be viewed while illuminated from the front window by ambient light and to operate without the need of a backlight has a plurality of laterally adjacent picture elements or pixels. Each pixel is comprised of two or more subpixels, or cells, which are vertically stacked, one directly above the other on the horizontal surface of a reflective panel located at the rear or bottom of the stacks. The cells contain a light-transmissive fluid and charged pigment particles that can absorb a portion of the visible spectrum, with each cell in a stack containing particles having a color different from the colors of the particles in the other cells in the stack.Type: GrantFiled: May 18, 2001Date of Patent: April 27, 2004Assignee: International Business Machines CorporationInventors: Joseph G. Gordon, II, Mark W. Hart, Anthony C. Lowe, Sally A. Swanson