Abstract: The systems and methods described herein relate to solid-state light sources capable of generating radiation beams for, but not limited to, the treatment of surfaces, bulk materials, films, and coatings. The solid-state ultraviolet source optically combines the light output of at least two and preferably as many four independently controllable discrete solid-state light emitters to produce a light beam that has a controllable multi-wavelength spectrum over a wide range of wavelengths (i.e. deep UV to near-IR). Specific features of this light source permit changes in the spectral, spatial and temporal distribution of light for use in curing, surface modification and other applications.

Abstract: The systems and methods described herein relate to solid-state light sources capable of generating radiation beams for, but not limited to, the treatment of surfaces, bulk materials, films, and coatings. The solid-state ultraviolet source optically combines the light output of at least two and preferably as many four independently controllable discrete solid-state light emitters to produce a light beam that has a controllable multi-wavelength spectrum over a wide range of wavelengths (i.e. deep UV to near-IR). Specific features of this light source permit changes in the spectral, spatial and temporal distribution of light for use in curing, surface modification and other applications.

Abstract: The systems and methods described herein relate to solid-state light sources capable of generating radiation beams for, but not limited to, the treatment of surfaces, bulk materials, films, and coatings. The solid-state ultraviolet source optically combines the light output of at least two and preferably as many four independently controllable discrete solid-state light emitters to produce a light beam that has a controllable multi-wavelength spectrum over a wide range of wavelengths (i.e. deep UV to near-IR). Specific features of this light source permit changes in the spectral, spatial and temporal distribution of light for use in curing, surface modification and other applications.

Abstract: The invention is a method of irradiating at least one surface of a three-dimensional object (36, 114) with a desired ultraviolet light irradiance flux produced by an ultraviolet light source (22, 102).

Abstract: The invention is a microwave excited light source. A microwave excited light source in accordance with the invention includes a microwave source (100) which produces microwaves; a microwave excited light bulb (106), coupled to the microwave source, which produces an output spectrum 108 and operates within a first temperature range when producing the output spectrum with at least one frequency range of the output spectrum having a power level below a desired level; and an optical component (20, 40, 60, 70, 110, 116 and 118), spaced from the light bulb which operates in a second temperature range below the first temperature range, having at least one phosphor (112) which is excited by another frequency range of the output spectrum, the at least one phosphor in response to the another frequency range outputs light in the at least one portion which increases the power level to the desired level.

Abstract: The invention is a microwave excited light source. A microwave excited light source in accordance with the invention includes a microwave source (100) which produces microwaves; a microwave excited light bulb (106), coupled to the microwave source, which produces an output spectrum 108 and operates within a first temperature range when producing the output spectrum with at least one frequency range of the output spectrum having a power level below a desired level; and an optical component (20, 40, 60, 70, 110, 116 and 118), spaced from the light bulb which operates in a second temperature range below the first temperature range, having at least one phosphor (112) which is excited by another frequency range of the output spectrum, the at least one phosphor in response to the another frequency range outputs light in the at least one portion which increases the power level to the desired level.

Abstract: A method for providing an oxide film of a material on the surface of a substrate using a reactive deposition of the material onto the substrate surface in the presence of a solid or liquid layer of an oxidizing gas. The oxidizing gas is provided on the substrate surface in an amount sufficient to dissipate the latent heat of condensation occurring during deposition as well as creating a favorable oxidizing environment for the material.

Abstract: A method for providing an oxide film of a material on the surface of a substrate using a reactive deposition of the material onto the substrate surface in the presence of a solid or liquid layer of an oxidizing gas. The oxidizing gas is provided on the substrate surface in an amount sufficient to dissipate the latent heat of condensation occurring during deposition as well as creating a favorable oxidizing environment for the material.