Patents by Inventor Mark Zellenrath

Mark Zellenrath has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • EUV lithography system and operating method
    Patent number: 10073361
    Abstract: An EUV lithography system (1) includes: at least one optical element (13, 14) having an optical surface (13a, 14a) arranged in a vacuum environment (17) of the EUV lithography system (1), and a feed device (27) for feeding hydrogen into the vacuum environment (17), in which at least one silicon-containing surface (29a) is arranged. The feed device (27) additionally feeds an oxygen-containing gas into the vacuum environment (17) and has a metering device (28) that sets an oxygen partial pressure (pO2) at the at least one silicon-containing surface (29a) and/or at the optical surface (13a, 14a).
    Type: Grant
    Filed: April 10, 2017
    Date of Patent: September 11, 2018
    Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.
    Inventors: Dirk Heinrich Ehm, Stefan-Wolfgang Schmidt, Edgar Osorio, Edwin Te Sligte, Mark Zellenrath, Hella Logtenberg
  • EUV Lithography System And Operating Method
    Publication number: 20170212433
    Abstract: An EUV lithography system (1) includes: at least one optical element (13, 14) having an optical surface (13a, 14a) arranged in a vacuum environment (17) of the EUV lithography system (1), and a feed device (27) for feeding hydrogen into the vacuum environment (17), in which at least one silicon-containing surface (29a) is arranged. The feed device (27) additionally feeds an oxygen-containing gas into the vacuum environment (17) and has a metering device (28) that sets an oxygen partial pressure (pO2) at the at least one silicon-containing surface (29a) and/or at the optical surface (13a, 14a).
    Type: Application
    Filed: April 10, 2017
    Publication date: July 27, 2017
    Inventors: Dirk Heinrich EHM, Stefan-Wolfgang SCHMIDT, Edgar OSORIO, Edwin TE SLIGTE, Mark ZELLENRATH, Hella LOGTENBERG
  • Method of measuring focus of a lithographic projection apparatus
    Patent number: 8436998
    Abstract: A method of measuring focus of a lithographic projection apparatus includes exposure of a photoresist covered test substrate with a plurality of verification fields. Each of the verification fields includes a plurality of verification markers, and the verification fields are exposed using a predetermined focus offset. After developing, an alignment offset for each of the verification markers is measured and translated into defocus data using a transposed focal curve.
    Type: Grant
    Filed: September 4, 2012
    Date of Patent: May 7, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Gerardus Carolus Johannus Hofmans, Hubertus Antonius Geraets, Mark Zellenrath, Sven Gunnar Krister Magnusson
  • METHOD OF MEASURING FOCUS OF A LITHOGRAPHIC PROJECTION APPARATUS
    Publication number: 20130003031
    Abstract: A method of measuring focus of a lithographic projection apparatus includes exposure of a photoresist covered test substrate with a plurality of verification fields. Each of the verification fields includes a plurality of verification markers, and the verification fields are exposed using a predetermined focus offset. After developing, an alignment offset for each of the verification markers is measured and translated into defocus data using a transposed focal curve.
    Type: Application
    Filed: September 4, 2012
    Publication date: January 3, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Gerardus Carolus Johannus Hofmans, Hubertus Antonius Geraets, Mark Zellenrath, Sven Gunnar Krister Magnusson
  • Method of measuring focus of a lithographic projection apparatus
    Patent number: 8289516
    Abstract: A method of measuring focus of a lithographic projection apparatus includes exposure of a photoresist covered test substrate with a plurality of verification fields. Each of the verification fields includes a plurality of verification markers, and the verification fields are exposed using a predetermined focus offset FO. After developing, an alignment offset for each of the verification markers is measured and translated into defocus data using a transposed focal curve. The method according to an embodiment of the invention may result in a focus-versus alignment shift sensitivity up to 50 times higher (typically dX,Y/dZ=20) than conventional approaches.
    Type: Grant
    Filed: November 19, 2008
    Date of Patent: October 16, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Gerardus Carolus Johannus Hofmans, Hubertus Antonius Geraets, Mark Zellenrath, Sven Gunnar Krister Magnusson
  • METHOD OF MEASURING FOCUS OF A LITHOGRAPHIC PROJECTION APPARATUS
    Publication number: 20090135389
    Abstract: A method of measuring focus of a lithographic projection apparatus includes exposure of a photoresist covered test substrate with a plurality of verification fields. Each of the verification fields includes a plurality of verification markers, and the verification fields are exposed using a predetermined focus offset FO. After developing, an alignment offset for each of the verification markers is measured and translated into defocus data using a transposed focal curve. The method according to an embodiment of the invention may result in a focus-versus alignment shift sensitivity up to 50 times higher (typically dX,Y/dZ=20) than conventional approaches.
    Type: Application
    Filed: November 19, 2008
    Publication date: May 28, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Gerardus Carolus Johannus HOFMANS, Hubertus Antonius GERAETS, Mark ZELLENRATH, Sven Gunnar Krister MAGNUSSON