Abstract: The present invention provides a solution for coating substrates which are moved on a carrier that can move from painting, coating or treatment modules in a continuous inline production facility having a system which allows to easily switch between a back and forth limited rotational movement, called rocking mode, for critical processes such as physical vapor deposition (PVD) coating, UV hardening and IR flashing, and a continuous rotational movement of the substrates when the substrates are in a painting or drying process module.

Abstract: The present invention discloses a target assembly which allows safe, fracture-free and economic operation of target materials with low fracture toughness and/or bending strength during arc evaporation processes as well as in sputtering processes. The present invention discloses a target assembly for PVD processes, comprising a target, and a target holding device (20), characterized in that the target (10) comprises a first bayonet lock and the target holding device (20) comprises a counterbody for the first bayonet lock of the target and a second bayonet lock for engaging the target assembly in the cooling means of the deposition chamber.

Abstract: The present invention discloses a target assembly which allows safe, fracture-free and economic operation of target materials with low fracture toughness and/or bending strength during arc evaporation processes as well as in sputtering processes. The present invention discloses a target assembly for PVD processes, comprising a target, and a target holding device (20), characterized in that the target (10) comprises a first bayonet lock and the target holding device (20) comprises a counterbody for the first bayonet lock of the target and a second bayonet lock for engaging the target assembly in the cooling means of the deposition chamber.

Abstract: The invention relates to a coating chamber (1) for performing a vacuum-assisted coating process, in particular PVD or CVD or electric arc coating chamber or hybrid coating chamber. The coating chamber (1) comprises a heat shield (3, 31, 32, 33), which is arranged on a temperature-controllable chamber wall (2) of the coating chamber (1) and is intended for adjusting an exchange of a predeterminable amount of thermal radiation between the heat shield (3, 31, 32, 33) and the temperature-controllable chamber wall (2).

Abstract: The invention relates to a vacuum chamber for the treatment of substances, comprising at least the following elements: heat supply elements for the heat supply into a treatment area of the vacuum chamber, in which at least one substrate (10) can be treated, a chamber wall (20), through which heat can be removed from the treatment area, comprising an inner and an outer chamber wall side, and a shielding wall (30), which is arranged between the chamber wall (20) and the treatment area, such that an averted shielding wall side regarding to the treatment area is placed opposite the inner chamber wall side, and characterized in, that the shielding wall side placed opposite the inner chamber wall side is at least partially, preferred largely applied with a first coating (31), which has an emission coefficient ??0.65.

Abstract: The present invention relates to a temperature-measuring system, comprising a temperature sensor and a reference body, wherein means for determining temperature changes of the reference body and/or for control of the temperature of the reference body are provided. When the temperature measuring-system is used in a vacuum, the reference body forms no substantial material thermal bridges to the temperature sensor and the reference body shields the temperature sensor with respect to the environment in such a way that only radiation that comes from the surfaces of the reference and from surfaces of which the temperature is to be determined reaches the surface of the temperature sensor.

Abstract: Planetary carriers (22) for workpieces mounted on a carousel (19) are provided within a vacuum chamber. A source (24) for a cloud comprising ions (CL) is provided so that a central axis (ACL) of the cloud intercepts the rotary axis (A20) of the carousel (19). The cloud (CL) has an ion density profile at the moving path (T) of planetary axes (A22) which drops to 50% of the maximum ion density at a distance from the addressed center axis (ACL) which is at most half the diameter of the planetary carriers (22). When workpieces upon the planetary carriers (22) are etched by the cloud comprising ions material which is etched off is substantially not redeposited on neighboring planetary carriers but rather ejected towards the wall of the vacuum chamber.

Abstract: A vacuum chamber (1) for coating installations is provided, wherein the vacuum chamber (1) has a bottom plate (6) and a top plate (2), which are connected to each other by struts (4) running substantially perpendicularly to the bottom plate (6) and the top plate (2), wherein a plurality of openings (9) are defined by the bottom plate (6), the top plate (2) and the struts (4), and wherein at least a portion of a front edge (15?) of the bottom plate (6) and a portion of the front edge (15) of the top plate (2) form together with two struts (4) a sealing area, running around one opening (9) of the multiplicity of openings (9), for an insert plate (8) that can be inserted into the opening (9).

Abstract: A vacuum treatment system (1) for treating workpieces has a treatment chamber (10) that can be evacuated and in which a low-volt arc-discharge device is placed, with at least one locking loading/unloading aperture and at least one coating source placed on one side wall of the treatment chamber. It also has a device for producing a magnetic field to create a remote magnetic field and at least one workpiece holder to hold workpieces. A target-shutter arrangement (8, 8?) is designed so that when uncovered, the distance between the shutter (8) and the target (12) is less than 35 mm, thus allowing ignition and operation of a magnetron or cathode spark discharge behind the target, but preventing ignition of auxiliary plasma when the target (8) is turned off.

Abstract: Planetary carriers (22) for workpieces mounted on a carousel (19) are provided within a vacuum chamber. A source (24) for a cloud comprising ions (CL) is provided so that a central axis (ACL) of the cloud intercepts the rotary axis (A20) of the carousel (19). The cloud (CL) has an ion density profile at the moving path (T) of planetary axes (A22) which drops to 50% of the maximum ion density at a distance from the addressed center axis (ACL) which is at most half the diameter of the planetary carriers (22). When workpieces upon the planetary carriers (22) are etched by the cloud comprising ions material which is etched off is substantially not redeposited on neighboring planetary carriers but rather ejected towards the wall of the vacuum chamber.

Abstract: A vacuum treatment system (1) for treating workpieces has a treatment chamber (10) that can be evacuated and in which a low-volt arc-discharge device is placed, with at least one locking loading/unloading aperture and at least one coating source placed on one side wall of the treatment chamber. It also has a device for producing a magnetic field to create a remote magnetic field and at least one workpiece holder to hold workpieces. A target-shutter arrangement (8, 8?) is designed so that when uncovered, the distance between the shutter (8) and the target (12) is less than 35 mm, thus allowing ignition and operation of a magnetron or cathode spark discharge behind the target, but preventing ignition of auxiliary plasma when the target (8) is turned off.