Abstract: A multi facet mirror of a microlithographic projection exposure apparatus includes a plurality of mirror facet units. Each unit includes a mirror member with a body, a reflective coating provided at one end of the body and an actuating surface provided at an opposite end. The unit further includes a rest member on which the actuating surface rests while the mirror member is not moving, and an actuator that tilts the mirror member about a tilting axis. The actuator has a contact surface and a lifting member which moves the actuating surface along a lifting direction. In a first operating state of the lifting member the actuating surface rests on the rest member and in a second operating state on the contact surface. A displacement member displaces the contact surface along a lateral direction only while the lifting member is in the second operating state.

Abstract: A device serves for controlling temperature of an optical element provided in vacuum atmosphere. The device has a cooling apparatus having a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer. A controller serves for controlling temperature of the radiational cooling part. Further, the device comprises a heating part for heating the optical element. The heating part is connected to the controller for controlling the temperature of the heating part. The resulting device for controlling temperature in particular can be used with an optical element in a EUV microlithography tool leading to a stable performance of its optics.

Abstract: The disclosure provides an arrangement for the thermal actuation of a mirror, in particular in a microlithographic projection exposure apparatus, as well as related methods and systems.

Abstract: The disclosure provides a method for determining an actual input value of an input variable for a control unit of an imaging device.

Abstract: The disclosure concerns an arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus. The mirror has an optical effective surface and at least one access passage extending from a surface of the mirror, that does not correspond to the optical effective surface, in the direction of the effective surface. The arrangement is designed for mirror temperature measurement and/or thermal actuation of the mirror via electromagnetic radiation which is propagated along the access passage. The electromagnetic radiation is reflected a plurality of times within the access passage.

Abstract: A device serves for controlling temperature of an optical element provided in vacuum atmosphere. The device has a cooling apparatus having a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer. A controller serves for controlling temperature of the radiational cooling part. Further, the device comprises a heating part for heating the optical element. The heating part is connected to the controller for controlling the temperature of the heating part. The resulting device for controlling temperature in particular can be used with an optical element in a EUV microlithography tool leading to a stable performance of its optics.

Abstract: The invention relates to a projection exposure apparatus for semiconductor lithography, comprising an illumination system for illuminating a mask arranged on a movable mask stage, and comprising a projection lens for imaging the mask onto a semiconductor substrate, wherein at least one means is present for at least partly decoupling at least parts of the illumination system and/or of the projection lens from the influence of pressure fluctuations in the medium surrounding the projection lens or the illuminated system, the pressure fluctuations being attributed to movements of the mask stage during the operation of the apparatus.

Abstract: An arrangement for the actuation of an element in an optical system. The arrangement includes first actuation and second actuation units for tilting the element about at least two different tilting axes. The first and second actuation units respectively include a flexure unit arranged outside an area defined by the element. Each flexure unit includes a first flexing element, rotatable with respect to a first axis of rotation, and a second flexing element, rotatable with respect to a second axis of rotation. For each flexure unit, the two associated axes of rotation intersect at a virtual connecting point of the flexure unit concerned to the optical element. The virtual connecting point is arranged in the area defined by the element and defines a rotating point for the element.

Abstract: A method is provided for producing a support structure including an at least partly reversibly deformable base body with a cut-out. A component can be held in the cut-out by friction. The method includes machining the base body in the braced state, wherein an opening is introduced into the base body and/or widened. The opening is deformed when the deformation force is removed such that the cut-out is formed. The opening is formed such that the application of a joining force makes it possible to deform the cut-out such that a component to be held can be introduced into the deformed cut-out with a clearance fit and an at least partial recovery of the deformed cut-out brings about a pressure contact between the held component and the cut-out in predefined circumferential regions.

Abstract: An optical module includes a chamber capable of being evacuated and a mirror in the chamber. The mirror includes a plurality of individual mirrors. Each individual mirror includes: a mirror body including a reflection face; a support structure; and a thermally conductive portion that mechanically connects the support structure to the mirror body. For at least one individual mirror, the thermally conductive portion includes a plurality of thermally conductive strips arranged radially, adjacent thermally conductive strips being separated from each other, and each of the plurality of thermally conductive strips connecting the mirror body to the support structure. For at least one individual mirror, an actuator is associated with the mirror body, the actuator being configured to displace the mirror body relative to the support structure in at least one degree of freedom.

Abstract: A multi facet mirror of a microlithographic projection exposure apparatus includes a plurality of mirror facet units. Each unit includes a mirror member with a body, a reflective coating provided at one end of the body and an actuating surface provided at an opposite end. The unit further includes a rest member on which the actuating surface rests while the mirror member is not moving, and an actuator that tilts the mirror member about a tilting axis. The actuator has a contact surface and a lifting member which moves the actuating surface along a lifting direction. In a first operating state of the lifting member the actuating surface rests on the rest member and in a second operating state on the contact surface. A displacement member displaces the contact surface along a lateral direction only while the lifting member is in the second operating state.

Abstract: The invention relates to an arrangement for actuating an element in an optical system, in particular an optical system of a projection exposure apparatus, wherein the optical element is tiltable about at least one tilting axis via at least one joint having a joint stiffness, comprising at least one actuator for exerting a force on the optical element, wherein the actuator has an actuator stiffness which at least partly compensates for the joint stiffness.

Abstract: The invention relates to an arrangement for actuating an element in an optical system of a projection exposure apparatus, wherein the projection exposure apparatus has a carrying frame, comprising at least one actuator for exerting controllable forces on the element, wherein the actuator has a first actuator part, which is coupled to the carrying frame via at least one mechanical filter, and a second actuator part, which is mechanically coupled directly to the carrying frame, and wherein the loading on the first actuator part is at least partly relieved by the second actuator part when forces are exerted on the element.

Abstract: A multi facet mirror of a microlithographic projection exposure apparatus includes a plurality of mirror facet units. Each unit includes a mirror member with a body, a reflective coating provided at one end of the body and an actuating surface provided at an opposite end. The unit further includes a rest member on which the actuating surface rests while the mirror member is not moving, and an actuator that tilts the mirror member about a tilting axis. The actuator has a contact surface and a lifting member which moves the actuating surface along a lifting direction. In a first operating state of the lifting member the actuating surface rests on the rest member and in a second operating state on the contact surface. A displacement member displaces the contact surface along a lateral direction only while the lifting member is in the second operating state.

Abstract: A device serves for controlling temperature of an optical element provided in vacuum atmosphere. The device has a cooling apparatus having a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer. A controller serves for controlling temperature of the radiational cooling part. Further, the device comprises a heating part for heating the optical element. The heating part is connected to the controller for controlling the temperature of the heating part. The resulting device for controlling temperature in particular can be used with an optical element in a EUV microlithography tool leading to a stable performance of its optics.

Abstract: A lithography device includes an eddy-current brake for damping the movement of a structural element of the lithography device. The eddy-current brake includes a plurality of magnets disposed in an arc-shaped arrangement, and a plurality of electrically conductive sheets arranged respectively between adjacent ones of the magnets. A relative movement between the magnets and the electrically conductive sheets in a direction to be damped inducing eddy currents in the electrically conductive sheets.

Abstract: A device serves for controlling temperature of an optical element provided in vacuum atmosphere. The device has a cooling apparatus having a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer. A controller serves for controlling temperature of the radiational cooling part. Further, the device comprises a heating part for heating the optical element. The heating part is connected to the controller for controlling the temperature of the heating part. The resulting device for controlling temperature in particular can be used with an optical element in a EUV microlithography tool leading to a stable performance of its optics.

Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

Abstract: A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired temperature profile of the thermal optical element by a set point signal; determining a feedforward control of the heater elements from the set point signal; and forwardly feeding an output of the feedforward control into the feedback loop.

Abstract: A method is provided for producing a support structure including an at least partly reversibly deformable base body with a cut-out. A component can be held in the cut-out by friction. The method includes machining the base body in the braced state, wherein an opening is introduced into the base body and/or widened. The opening is deformed when the deformation force is removed such that the cut-out is formed. The opening is formed such that the application of a joining force makes it possible to deform the cut-out such that a component to be held can be introduced into the deformed cut-out with a clearance fit and an at least partial recovery of the deformed cut-out brings about a pressure contact between the held component and the cut-out in predefined circumferential regions.