Patents by Inventor Markus Van Kraaij

Markus Van Kraaij has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for angular-resolved spectroscopic lithography characterization
    Publication number: 20060066855
    Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
    Type: Application
    Filed: August 15, 2005
    Publication date: March 30, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arie Boef, Arno Bleeker, Youri Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Kiers, Paul Luehrmann, Henricus Pellemans, Maurits Schaar, Cedric Grouwstra, Markus Van Kraaij