Patents by Inventor Martijn Wehrens

Martijn Wehrens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9497840
    Abstract: A method and apparatus for creating and utilizing dual laser curtains from a single laser source in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. A polarizing beam splitter creates two beams of orthogonal polarization from a single laser, and the beams are used to generate two laser curtains. Sensors detect flashes from droplets of target material as they pass through the curtains. One sensor may detect the position of the droplets relative to a desired trajectory to the irradiation site so that the orientation of a droplet generator may be adjusted to direct subsequent droplets to the irradiation site, as in the prior art. A second sensor may detect each droplet as it passes through a curtain to determine when a source laser should generate a pulse so that the pulse will arrive at the irradiation site at the same time as the droplet, so that a signal may be sent to the source laser to fire at the correct time.
    Type: Grant
    Filed: February 6, 2014
    Date of Patent: November 15, 2016
    Assignee: ASML Netherlands B.V.
    Inventor: Martijn Wehrens
  • Patent number: 9241395
    Abstract: A method and apparatus for improved control of the trajectory and timing of droplets of target material in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. A droplet illumination module generates two laser curtains for detecting the droplets. The first curtain is used for detecting the position of the droplets relative to a desired trajectory to the irradiation site so that the position of a droplet generator may be adjusted to direct the droplets to the irradiation site, as in the prior art. A droplet detection module detects each droplet as it passes through the second curtain, determines when the source laser should generate a pulse so that the pulse arrives at the irradiation site at the same time as the droplet, and sends a signal to the source laser to fire at the correct time.
    Type: Grant
    Filed: September 26, 2013
    Date of Patent: January 19, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Vahan Senekerimyan, Martijn Wehrens
  • Publication number: 20150083898
    Abstract: A method and apparatus for improved control of the trajectory and timing of droplets of target material in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. A droplet illumination module generates two laser curtains for detecting the droplets. The first curtain is used for detecting the position of the droplets relative to a desired trajectory to the irradiation site so that the position of a droplet generator may be adjusted to direct the droplets to the irradiation site, as in the prior art. A droplet detection module detects each droplet as it passes through the second curtain, determines when the source laser should generate a pulse so that the pulse arrives at the irradiation site at the same time as the droplet, and sends a signal to the source laser to fire at the correct time.
    Type: Application
    Filed: September 26, 2013
    Publication date: March 26, 2015
    Applicant: Cymer, Inc.
    Inventors: Vahan Senekerimyan, Martijn Wehrens
  • Publication number: 20150083936
    Abstract: A method and apparatus for creating and utilizing dual laser curtains from a single laser source in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. A polarizing beam splitter creates two beams of orthogonal polarization from a single laser, and the beams are used to generate two laser curtains. Sensors detect flashes from droplets of target material as they pass through the curtains. One sensor may detect the position of the droplets relative to a desired trajectory to the irradiation site so that the orientation of a droplet generator may be adjusted to direct subsequent droplets to the irradiation site, as in the prior art. A second sensor may detect each droplet as it passes through a curtain to determine when a source laser should generate a pulse so that the pulse will arrive at the irradiation site at the same time as the droplet, so that a signal may be sent to the source laser to fire at the correct time.
    Type: Application
    Filed: February 6, 2014
    Publication date: March 26, 2015
    Applicant: Cymer, LLC
    Inventor: Martijn Wehrens
  • Patent number: 8934083
    Abstract: An apparatus and method for detecting extreme ultraviolet (EUV) radiation is disclosed. The apparatus includes a detector having a top surface, a layer of scintillation material on the top surface of the detector, a layer of spacer material on the layer of scintillation material, and a spectral purity filter layer on the layer of spacer material. The method includes directing the EUV radiation through the spectral purity filter layer and through the spacer material layer. The spacer material layer may be disposed between the spectral purity filter layer and a layer of scintillation material. The method further includes detecting scintillation radiation emitted by the scintillation material using the detector.
    Type: Grant
    Filed: March 23, 2010
    Date of Patent: January 13, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Ivan Sergejevitsj Nikolaev, Martijn Wehrens
  • Patent number: 8809823
    Abstract: A method and apparatus for improved control of the trajectory and timing of droplets of target material in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. A droplet illumination module generates a laser curtain, and sensors detect the droplets as they pass through the curtain. One sensor in combination with a controller detects the position of the droplets relative to a desired trajectory to the irradiation site so that a signal can be sent to an actuator of a droplet generator to adjust orientation of the droplet generator and direct subsequent droplets to the irradiation site, as in the prior art. A second sensor, or droplet detection module, also detects each droplet as it passes through the curtain, and in combination with a controller determines when the source laser should generate a pulse so that the pulse will arrive at the irradiation site at the same time as the droplet, and sends a signal to the source laser to fire at the correct time.
    Type: Grant
    Filed: December 20, 2013
    Date of Patent: August 19, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Vahan Senekerimyan, Martijn Wehrens
  • Publication number: 20120081683
    Abstract: A detector including a layer of scintillation material, a layer of spacer material on the scintillation material, and a spectral purity filter layer on the spacer material.
    Type: Application
    Filed: March 23, 2010
    Publication date: April 5, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Ivan Sergejevitsj Nikolaev, Martijn Wehrens
  • Publication number: 20060203221
    Abstract: A method and apparatus are provided for measuring the apodization of projection optics for use in a lithographic apparatus, the projection optics having an object plane where, in use, a reticle is placed, a pupil plane, and an image plane where, in use, a wafer is placed. The method includes placing one or more Appropriate apertures in said object plane for creating a substantially uniform light distribution, illuminating the or each aperture and measuring the intensity distribution at a plane which is conjugate to the pupil plane in order to calculate the apodization of the projection optics.
    Type: Application
    Filed: February 24, 2006
    Publication date: September 14, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcus Van De Kerkhof, Wilhelmus Boeij, Hendrikus Van Greevenbroek, Michel Klaassen, Martijn Wehrens, Haico Kok, Wilhelmus Rooijakkers, Tammo Uitterdijk