Abstract: Methods and apparatus for efficiently compensating for pressure changes in a active vibration isolation system are disclosed. According to one aspect of the present system, system that reduces the vibrations experienced by a mass includes a chamber that supports the mass, a control device, a valve mechanism, and a bypass mechanism. The control device monitors a pressure level within the chamber. The valve mechanism includes a first flow path that is in fluid communication with the chamber. The valve mechanism also alters a capacity of the first flow path in response to a control signal generated by the controller. Finally, the bypass mechanism defines a second flow path that enables fluid to flows through the second flow path into the chamber. The second flow path is parallel to the first flow path to enable parallel fluid flow to occur.

Abstract: A flexural joint, in particular a flexural thrust joint suitable for precision stages and application requiring vacuum is disclosed herein. A two degree of freedom joint comprises: two joint elements, each with a load bearing surface; two flexures attached between the elements, such that the flexures are under tension when the joint is subject to a compressive load. The flexures are long and thin, such that they can twist and bend, giving the joint two degrees of freedom. A three degree of freedom joint comprises: a first joint element with a load bearing surface; a second joint element with a second load bearing surface; a third joint element; two first flexures attached between the second and third elements; two second flexures attached between the third and first elements, such that both the first and second flexures are under tension when the joint is subject to a compressive load.

Abstract: A device stage assembly (10) for positioning a device (26) is provided herein. The device stage assembly (10) includes a mover housing (44), a device stage (14), a support assembly (18), and a control system (22). The support assembly (18) moves the device stage (14) relative to the mover housing (44) under the control of the control system (22). Uniquely, the support assembly (18) includes at least four, spaced apart Z device stage movers (84), (86), (88), (90) that move the device stage (14) relative to the mover housing (44). Further, the control system (22) controls the Z device stage movers (84), (86), (88), (90) to inhibit dynamic and static deformation of the device stage (14) during movement of the device stage (14). Further, the four Z device stage movers (84), (86), (88), (90) distribute forces on the device stage (14) in a way that more closely matches the gravitational and inertial loads on the device stage (14).

Abstract: A system for precisely positioning and moving a platform, with at least four and preferably six degrees of freedom, relative to a frame is disclosed herein. The platform is particularly suitable for carrying wafers. Charged particle optics can be attached to the frame, in which case any point on the wafer can be positioned to within at least one micron relative to the charged particle optics. The charged particle optics may comprise multiple columns, each column generating at least one charged particle beam. The platform positioning system comprises a base; a frame attached to the base; a stage, comprising a platform and stage actuators, coupled to the base and the frame; stage sensors, for sensing the position of the stage relative to the frame, rigidly coupled to the frame; and a current control system coupled to the stage sensors and the stage actuators.

Abstract: A wafer stage assembly is provided to be used in combination with a projection lens assembly, such as in a semiconductor wafer manufacturing process. The wafer stage assembly includes a wafer table supported and positioned by a wafer stage and a wafer stage base for carrying a semiconductor wafer. The wafer stage assembly also includes a plurality of sets of sensors to determine a position and a rotation of the wafer table in six degrees of freedom relative to the projection lens assembly. A first set of sensors determines a position and a rotation of the wafer table relative to the projection lens assembly in at least one of the six degrees of freedom, while a second set of sensors determines a position and a rotation of the wafer table relative to the wafer stage base in the remaining of the six degrees of freedom.

Abstract: A support assembly (12) for an exposure apparatus (10) is provided herein. The support assembly (12) supports the components of the exposure apparatus (10) above a mounting base (32). The exposure apparatus (10) includes noisy components (42) and quiet components (44). The support assembly (12) includes an outer frame (34) and an inner frame (36). As provided herein, the outer frame (34) supports some of the components of the exposure apparatus (10) and the inner frame (36) supports some of the components of the exposure apparatus (10). Preferably, the outer frame (34) is used to support the quiet components (44) while the inner frame (36) is used to support the noisy components (42). Uniquely, a portion of the inner frame (36) is positioned within a portion of the outer frame (34). As a result of this design, both frames (34) (36) can effectively be mounted at the same mounting locations 37 of the mounting base (32). Further, the overall space taken up by the frames (34) (36) is minimized.

Abstract: An ultra-high precision stage incorporating a novel, legged design suitable for applications requiring high voltage and vacuum is disclosed herein. The stage comprises: a base; a frame attached to the base; a platform with a bottom platform surface; at least three adjustable limbs coupled to the base and the bottom platform surface, each limb comprising a raising member attached to the base, a first attachment member attached to the raising member, a leg, a bottom end of the leg attached to the first attachment member, a second attachment member attached to a top end of the leg and the second attachment member attached to the bottom platform surface; and platform movement members coupled to the platform and the frame, providing precise positioning and movement of the platform. The attachment members can be flexure joints; further, they can be flexural thrust joints. The platform can have six degrees of freedom of movement and accommodate wafers with diameters of 300 mm. The stage can weigh less than 100 lbs.

Abstract: A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine.

Abstract: A transducer includes a pneumatic actuator in combination with a stepper motor lifter mechanism to which is opposed an attractive E-I core actuator for precise vertical positioning of a load with minimal transmission of vibration. A typical application is for vertical positioning of a stage in a lithography machine. The use of a stepper motor driving a lead screw and pneumatic actuator together with an attractive E-I core actuator provides a large dynamic range force actuator. The transducer has a sensor which is located spaced away from the E-I core actuator gap and which operates inductively to measure the gap. A compliant diaphragm for the pneumatic actuation allows the load to move a small amount in all six degrees of freedom.

Abstract: A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine.

Abstract: A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for movement in at least two directors and two separate and independently movable followers move and follow the object stage and cooperating linear force actuators are mounted on the object stage and the followers for positioning the object stage in the first and second directions. The reaction frame is mounted on a base structure independent of the base for the object stage so that the object stage is supported in space independent of the reaction frame. At least one follower is disclosed having a pair of arms which are respectively movable in a pair of parallel planes with the center of gravity of the object stage therebetween.

Abstract: A two-axis stage assembly includes a generally planar horizontally mounted base plate; a stage plate generally parallel to the base plate, the stage plate having a first axis and second orthogonal axis; a set of spaced bearings depending from a bottom surface of said stage plate, the bearings each having an arcuate bottom surface in rocking contact with a facing support surface of the base plate; a joint attached to the bottom surface of the stage plate and pivotably mounting each bearing, the joint being positioned at the center of curvature of the arcuate bottom surface of the associated bearing; and where an axial movement of the stage plate rocks the bearing arcuate bottom surfaces with respect to the facing support surface of the base plate.

Abstract: A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine.

Abstract: A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for movement in at least two directions and two separate and independently movable followers move and follow the object stage and cooperating linear force actuators are mounted on the object stage and the followers for positioning the object stage in the first and second directions. The reaction frame is mounted on a base structure independent of the base for the object stage so that the object stage is supported in space independent of the reaction frame. At least one follower is disclosed having a pair of arms which are respectively movable in a pair of parallel planes with the center of gravity of the object stage therebetween.

Abstract: A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for movement in at least two directions and two separate and independently movable followers move and follow the object stage and cooperating linear force actuators are mounted on the object stage and the followers for positioning the object stage in the first and second directions. The reaction frame is mounted on a base structure independent of the base for the object stage so that the object stage is supported in space independent of the reaction frame. At least one follower is disclosed having a pair of arms which are respectively movable in a pair of parallel planes with the center of gravity of the object stage therebetween.

Abstract: A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine.

Abstract: A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine.

Abstract: An exposure apparatus includes an exposure device disposed between a mask and an object. The exposure device exposes a pattern of the mask onto the object. The apparatus also includes a movable mask stage to hold the mask and a movable object stage to hold the object. The apparatus also includes a reaction frame that is dynamically isolated from the exposure device. A reaction force caused by movement of the mask stage and the object stage when the mask stage and the object stage are moved by a drive is transferred substantially to the reaction frame.

Abstract: An exposure apparatus includes an exposure device disposed between a mask and an object. The exposure device exposes a pattern of the mask onto the object. The apparatus also includes a mask stage associated with the exposure device to hold the mask, and a drive to move the mask stage. At least part of the drive is connected to a first support structure so that a reaction force exerted by movement of the mask stage by the drive is transferred to the first support structure. A second support structure is provided, which is dynamically isolated from the first support structure. A position detector is supported by the second support structure, and detects a position of the mask stage.

Abstract: A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine.