Patents by Inventor Martin Furfanger
Martin Furfanger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10163670Abstract: The present invention relates to a device for heat treating an object, in particular a coated substrate, with an in particular gas-tightly sealable housing that encloses a hollow space, wherein the hollow space has a separating wall, by which the hollow space is divided into a process space for accommodating the object and an intermediate space, wherein the separating wall has one or a plurality of openings, which are implemented such that the separating wall acts as a barrier for the diffusion out of the process space into the intermediate space of a gaseous substance generated in the process space by the heat treatment of the object. The housing has at least one housing section coupled to a cooling device for its active cooling, wherein the separating wall is arranged between the object and the coolable housing section. The invention further relates to the use of a separating wall as a diffusion barrier in a device for heat treating an object as well as a corresponding method for heat treating an object.Type: GrantFiled: July 9, 2013Date of Patent: December 25, 2018Assignee: Bengbu Design & Research Institute for Glass IndustryInventors: Martin Fürfanger, Stefan Jost, Jörg Palm
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Patent number: 9926626Abstract: The present invention relates to a system for processing coated substrates, having the following features: at least one evacuable process box for accommodating at least one substrate with a gas-tightly sealable housing, which forms a hollow space, wherein the housing comprises at least one housing section, which is implemented such that the substrate is thermally treatable by incident electromagnetic thermal radiation, wherein the housing has at least one housing section coupleable to a cooling device for its cooling and at least one housing section not coupled to the cooling device, wherein the hollow space is divided by at least one separating wall into a process space for accommodating the substrate and an intermediate space, wherein the separating wall has one or a plurality of openings and is arranged between the substrate and the housing section coupled to the cooling device, and wherein the housing is provided with at least one sealable gas passage that opens into the hollow space, for evacuating and iType: GrantFiled: July 9, 2013Date of Patent: March 27, 2018Assignee: Bengbu Design & Research Institute for Glass IndustryInventors: Stefan Jost, Martin Fürfanger, Jörg Palm
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Publication number: 20150206781Abstract: The present invention relates to a device for heat treating an object, in particular a coated substrate, with an in particular gas-tightly sealable housing that encloses a hollow space, wherein the hollow space has a separating wall, by which the hollow space is divided into a process space for accommodating the object and an intermediate space, wherein the separating wall has one or a plurality of openings, which are implemented such that the separating wall acts as a barrier for the diffusion out of the process space into the intermediate space of a gaseous substance generated in the process space by the heat treatment of the object. The housing has at least one housing section coupled to a cooling device for its active cooling, wherein the separating wall is arranged between the object and the coolable housing section. The invention further relates to the use of a separating wall as a diffusion barrier in a device for heat treating an object as well as a corresponding method for heat treating an object.Type: ApplicationFiled: July 9, 2013Publication date: July 23, 2015Inventors: Martin Fürfanger, Stefan Jost, Jörg Palm
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Publication number: 20150197850Abstract: The present invention relates to a system for processing coated substrates, having the following features: at least one evacuable process box for accommodating at least one substrate with a gas-tightly sealable housing, which forms a hollow space, wherein the housing comprises at least one housing section, which is implemented such that the substrate is thermally treatable by incident electromagnetic thermal radiation, wherein the housing has at least one housing section coupleable to a cooling device for its cooling and at least one housing section not coupled to the cooling device, wherein the hollow space is divided by at least one separating wall into a process space for accommodating the substrate and an intermediate space, wherein the separating wall has one or a plurality of openings and is arranged between the substrate and the housing section coupled to the cooling device, and wherein the housing is provided with at least one sealable gas passage that opens into the hollow space, for evacuating and iType: ApplicationFiled: July 9, 2013Publication date: July 16, 2015Inventors: Stefan Jost, Martin Fürfanger, Jörg Palm
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Publication number: 20150165475Abstract: The present invention relates to a process box for processing a coated substrate, with the following features: a gas-tightly sealable housing, which forms a hollow space; the housing comprises at least one housing section, which is implemented such that the substrate is heat treatable by electromagnetic thermal radiation incident on the housing section; the housing has at least one housing section coupleable to a cooling device for its cooling and at least one non-coolable housing section; the hollow space is divided by at least one separating wall into a process space for accommodating the substrate and an intermediate space, wherein the separating wall has one or a plurality of openings and is arranged between the substrate and the temperature-controlable housing section; the housing is provided with at least one sealable gas passage that opens into the hollow space, for evacuating and introducing process gas into the hollow space.Type: ApplicationFiled: July 9, 2013Publication date: June 18, 2015Inventors: Jörg Palm, Martin Fürfanger, Stefan Jost
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Publication number: 20130216967Abstract: A device for continuous heat-treating of at least two multilayer bodies on at least two process levels disposed one beneath another in at least one heating chamber and at least one cooling chamber, which are arranged one after another is described. The heating chamber of the device has a first process level and a second process level. The cooling chamber of the device has a cooling device, the first process level and the second process level.Type: ApplicationFiled: August 25, 2011Publication date: August 22, 2013Applicant: Saint-Gobain Glass FranceInventors: Martin Fürfanger, Stefan Jost
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Publication number: 20130129329Abstract: The invention relates to a heat treatment inner chamber (3) for thermally processing a substrate (20), having walls (10) which enclose an inner space (24) of the heat treatment inner chamber (3), having a mounting apparatus (8) for mounting the substrate (20) during the thermal processing and having an energy source (11) for introducing energy into the inner space (24) of the heat treatment inner chamber (3), at least one part of the inner sides of the walls (10) being formed in order to reflect power introduced by the energy source (11), wherein the at least one part of the inner sides of the walls (10) consists of a material which is highly reflective at least for infrared radiation.Type: ApplicationFiled: February 14, 2011Publication date: May 23, 2013Applicants: SAINT-GOBAIN GLASS FRANCE, LEYBOLD OPTICS GMBHInventors: Andreas Caspari, Stefan Henkel, Jutta Trube, Sven Stille, Martin Fürfanger
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Publication number: 20110117693Abstract: The invention relates to a device (1) and to a method for tempering objects (2, 15). According to the invention, a temporary process box (11) is used to overcome the disadvantages of tempering processes previously known, in particular to achieve a high level of reproducibility and a high throughput during the tempering process, at the same time reducing the investment costs such that overall, the entire tempering process is carried out in a highly economical manner.Type: ApplicationFiled: May 8, 2009Publication date: May 19, 2011Inventors: Jorg Palm, Jorg Baumbach, Franz Karg, Martin Furfanger
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Patent number: 6899762Abstract: A semiconductor wafer with a front surface and a back surface and an epitaxial layer of semiconducting material deposited on the front surface. In the semiconductor wafer, the epitaxial layer has a maximum local flatness value SFQRmax of less than or equal to 0.13 ?m and a maximum density of 0.14 scattered light centers per cm2. The front surface of the semiconductor wafer, prior to the deposition of the epitaxial layer, has a surface roughness of 0.05 to 0.29 nm RMS, measured by AFM on a 1 ?m×1 ?m reference area. Furthermore, there is a process for producing the semiconductor wafer.Type: GrantFiled: March 28, 2003Date of Patent: May 31, 2005Assignee: Siltronic AGInventors: Guido Wenski, Wolfgang Siebert, Klaus Messmann, Gerhard Heier, Thomas Altmann, Martin Fürfanger
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Publication number: 20030186028Abstract: A semiconductor wafer with a front surface and a back surface and an epitaxial layer of semiconducting material deposited on the front surface. In the semiconductor wafer, the epitaxial layer has a maximum local flatness value SFQRmax of less than or equal to 0.13 &mgr;m and a maximum density of 0.14 scattered light centers per cm2. The front surface of the semiconductor wafer, prior to the deposition of the epitaxial layer, has a surface roughness of 0.05 to 0.29 nm RMS, measured by AFM on a 1 &mgr;m×1 &mgr;m reference area. Furthermore, there is a process for producing the semiconductor wafer.Type: ApplicationFiled: March 28, 2003Publication date: October 2, 2003Applicant: WACKER SILTRONIC GESELLSCHAFT FUR HABLEITERMATERIALIEN AGInventors: Guido Wenski, Wolfgang Siebert, Klaus Messmann, Gerhard Heier, Thomas Altmann, Martin Furfanger
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Patent number: 6217212Abstract: A method and device for detecting an incorrect position of a semiconductor wafer during a high-temperature treatment of the semiconductor water in a quartz chamber which is heated by IR radiators, has the semiconductor wafer lying on a rotating support and being held at a specific temperature with the aid of a control system. Thermal radiation which is emitted by the semiconductor wafer and the IR radiators is recorded using a pyrometer. The radiation temperature of the recorded thermal radiation is determined. The semiconductor wafer is assumed to be in an incorrect position if the temperature of the recorded thermal radiation fluctuates to such an extent over the course of time that the fluctuation width lies outside a fluctuation range &Dgr;T which is regarded as permissible.Type: GrantFiled: October 28, 1998Date of Patent: April 17, 2001Assignee: Wacker Siltronic Gesellschaft für Halbleitermaterialien AGInventors: Georg Brenninger, Wolfgang Sedlmeier, Martin Fürfanger, Per-Ove Hansson