Patents by Inventor Martin Hausner

Martin Hausner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8652343
    Abstract: A method for the selective removal of material from a substrate surface for forming a deepening includes the steps of applying a mask onto the substrate surface in accordance with the desired selective removal and dry-etching the substrate, a metal, preferably aluminum, being used as the masking material. Power may be coupled inductively to a plasma.
    Type: Grant
    Filed: August 14, 2003
    Date of Patent: February 18, 2014
    Assignee: Excelitas Technologies Singapore Pte. Ltd.
    Inventor: Martin Hausner
  • Patent number: 8550419
    Abstract: The present invention is directed to an erection system for a photovoltaic open-space installation support stand and a method for assembling this type of erection system. The present erection systems provide a permanently settable inclination favorable for generating solar power for the photovoltaic equipment on open ground with linear bearings.
    Type: Grant
    Filed: June 13, 2008
    Date of Patent: October 8, 2013
    Assignee: Schletter GmbH
    Inventors: Martin Hausner, Ludwig Schletter
  • Patent number: 8366317
    Abstract: A sensor for detecting electromagnetic radiation comprises a sensor element, a housing in which the sensor element is disposed, and a radiation inlet window provided in the housing and closed by a material transmissible for the radiation to be detected. The transmissible material is fixed to the housing by fixation means not disposed in the field of view of the sensor element.
    Type: Grant
    Filed: June 8, 2005
    Date of Patent: February 5, 2013
    Assignee: Excelitas Technologies GmbH & Co. KG
    Inventors: Henrik Ernst, Hermann Karagözoglu, Martin Hausner, Guido Lauck, Jürgen Schilz, Fred Plotz
  • Patent number: 8215831
    Abstract: A sensor element for detecting electromagnetic radiation, particularly in the infrared range, comprises one or more heat-sensitive portions provided on a substrate and one or more influencing layers for influencing the absorption and/or reflection of the electromagnetic radiation to be detected. The heat-sensitive portion(s) and/or the influencing layers are arranged on the substrate in accordance with the thermal properties of the influencing layers, preferably asymmetrically.
    Type: Grant
    Filed: June 8, 2005
    Date of Patent: July 10, 2012
    Assignee: Excelitas Technologies GmbH & Co. KG
    Inventors: Henrik Ernst, Hermann Karagözoglu, Martin Hausner, Guido Lauck, Jürgen Schilz
  • Publication number: 20090256046
    Abstract: The present invention is directed to an erection system for a photovoltaic open-space installation support stand and a method for assembling this type of erection system. The present erection systems provide a permanently settable inclination favorable for generating solar power for the photovoltaic equipment on open ground with linear bearings.
    Type: Application
    Filed: June 13, 2008
    Publication date: October 15, 2009
    Applicant: Leichtmetallbau Schletter GmbH
    Inventors: Martin Hausner, Ludwig Schletter
  • Publication number: 20080291968
    Abstract: A sensor (30) for detecting electromagnetic radiation comprises a sensor element (10), a housing (31, 33) in which the sensor element is disposed, and a radiation inlet window (35) provided in the housing and closed by a material (32) transmissible for the radiation to be detected. The transmissible material (32) is fixed to the housing by fixation means (38) not disposed in the field of view of the sensor element.
    Type: Application
    Filed: June 8, 2005
    Publication date: November 27, 2008
    Applicant: PERKINELMER OPTOELECTRONICS GMBH & CO. KG
    Inventors: Henrik Ernst, Hermann Karagozoglu, Martin Hausner, Guido Lauck, Jurgen Schilz, Fred Plotz
  • Publication number: 20070297485
    Abstract: A sensor element (10) for detecting electromagnetic radiation, particularly in the infrared range, comprises one or more heat-sensitive portions (4a, 4b) provided on a substrate (1-3) and one or more influencing layers (5a, 5b) for influencing the absorption and/or reflection of the electromagnetic radiation to be detected. The heat-sensitive portion(s) and/or the influencing layers are arranged on the substrate in accordance with the thermal properties of the influencing layers, preferably asymmetrically.
    Type: Application
    Filed: June 8, 2005
    Publication date: December 27, 2007
    Applicant: PERKINELMER OPTOELECTRONICS GMBH & CO. KG
    Inventors: Henrik Ernst, Hermann Karagozoglu, Martin Hausner, Guido Lauck, Jurgen Schilz
  • Publication number: 20070029632
    Abstract: A radiation sensor (10) comprises a support (1), a cavity (2) which may be a recess or a through hole formed in one surface of the support (1), a sensor element (4, 4a, 4b) formed above the cavity (2), preferably on a membrane (3) covering the cavity (2), and electric terminals (5, 5a, 5b) for the sensor element (4, 4a, 4b). The cavity (2) in the surface of the support (1) has a fully or partly rounded contour (2a).
    Type: Application
    Filed: May 6, 2004
    Publication date: February 8, 2007
    Inventors: Martin Hausner, Jurgen Schilz, Fred Plotz, Hermann Karagozoglu
  • Publication number: 20060027532
    Abstract: A method for the selective removal of material from a substrate surface for forming a deepening comprises the steps of applying a mask onto the substrate surface in accordance with the desired selective removal and dry-etching the substrate, a metal, preferably aluminum, being used as the masking material. Power may be coupled inductively to a plasma.
    Type: Application
    Filed: August 14, 2003
    Publication date: February 9, 2006
    Inventor: Martin Hausner
  • Publication number: 20030118076
    Abstract: A sensor for measuring a temperature by means of a heat-sensitive area applied onto and/or underneath a membrane, the membrane being arranged above a recess. The recess is etched by a reactive ion etching method such that it is fully defined laterally by side walls arranged at an angle between 80° and 100° relative to the membrane, adjoining side walls being arranged at an angle of at least 40° relative to one another.
    Type: Application
    Filed: September 10, 2002
    Publication date: June 26, 2003
    Applicant: PerkinElmer Optoelectronics GmbH
    Inventors: Jorg Schieferdecker, Martin Hausner, Wilhelm Leneke, Marion Simon