Abstract: The invention provides a method for laser modification of a sample to form a modified region at a target location within the sample. The method comprises positioning a sample in a laser system for modification by a laser; measuring tilt of a surface of the sample through which the laser focusses; using at least the measured tilt to determine a correction to be applied to an active optical element of the laser system; applying the correction to the active optical element to modify wavefront properties of the laser to counteract an effect of coma on laser focus; and laser modifying the sample at the target location using the laser with the corrected wavefront properties to produce the modified region.

Abstract: The invention provides a method for laser modification of a sample to form a modified region at a target location within the sample. The method comprises positioning a sample in a laser system for modification by a laser; measuring tilt of a surface of the sample through which the laser focusses; using at least the measured tilt to determine a correction to be applied to an active optical element of the laser system; applying the correction to the active optical element to modify wavefront properties of the laser to counteract an effect of coma on laser focus; and laser modifying the sample at the target location using the laser with the corrected wavefront properties to produce the modified region.

Abstract: There is provided a method of fabricating a trapped vacancy in a crystal lattice of a target comprising: positioning the target in a laser system, the target containing vacancy trapping elements within the crystal lattice; modifying the crystal lattice within the target by using a laser to generate a lattice vacancy; and annealing the target to cause the lattice vacancy to migrate and be captured by a vacancy trapping element to form the trapped vacancy in the crystal lattice.

Abstract: The invention provides a method for laser modification of a sample to form a modified region at a target location within the sample. The method comprises positioning a sample in a laser system for modification by a laser; measuring tilt of a surface of the sample through which the laser focusses; using at least the measured tilt to determine a correction to be applied to an active optical element of the laser system; applying the correction to the active optical element to modify wavefront properties of the laser to counteract an effect of coma on laser focus; and laser modifying the sample at the target location using the laser with the corrected wavefront properties to produce the modified region.

Abstract: There is provided a method of fabricating a trapped vacancy in a crystal lattice of a target comprising: positioning the target in a laser system, the target containing vacancy trapping elements within the crystal lattice; modifying the crystal lattice within the target by using a laser to generate a lattice vacancy; and annealing the target to cause the lattice vacancy to migrate and be captured by a vacancy trapping element to form the trapped vacancy in the crystal lattice.

Abstract: A focusing apparatus for use with an optical system having a high NA objective lens includes an image forming and capturing mechanism for forming an image in an intermediate image zone and for capturing an image by receiving and refocusing light from a selected focal plane within the intermediate image zone, and a focus adjusting mechanism for adjusting the position of the selected focal plane within the intermediate image zone. The image forming and capturing mechanism includes at least one high NA lens. In use, spherical aberration introduced by the high NA objective lens is reduced.

Abstract: A focusing apparatus for use with an optical system having a high NA objective lens includes an image forming and capturing mechanism for forming an image in an intermediate image zone and for capturing an image by receiving and refocusing light from a selected focal plane within the intermediate image zone, and a focus adjusting mechanism for adjusting the position of the selected focal plane within the intermediate image zone. The image forming and capturing mechanism includes at least one high NA lens. In use, spherical aberration introduced by the high NA objective lens is reduced.

Abstract: A focusing apparatus for use with an optical system having a high NA objective lens includes an image forming and capturing apparatus for forming an image in an intermediate image zone, and for capturing an image by receiving and refocusing light from a selected focal plane within the intermediate image zone, and a focus adjusting apparatus for adjusting the position of the selected focal plane within the intermediate image zone. The image forming and capturing apparatus includes at least one high NA lens. In use, spherical aberration introduced by the high NA objective lens is reduced.

Abstract: A focusing apparatus for use with an optical system having a high NA objective lens includes an image forming and capturing mechanism for forming an image in an intermediate image zone and for capturing an image by receiving and refocusing light from a selected focal plane within the intermediate image zone, and a focus adjusting mechanism for adjusting the position of the selected focal plane within the intermediate image zone. The image forming and capturing mechanism includes at least one high NA lens. In use, spherical aberration introduced by the high NA objective lens is reduced.

Abstract: A focusing apparatus for use with an optical system having a high NA objective lens (20) includes an image forming and capturing means (26) for forming an image in an intermediate image zone (44), and for capturing an image by receiving and refocusing light from a selected focal plane within said intermediate image zone, and a focus adjusting means (28) for adjusting the position of the selected focal plane within the intermediate image zone. The image forming and capturing means (26) includes at least one high NA lens. In use, spherical aberration introduced by the high NA objective lens (20) is reduced.

Abstract: The wavefront sensing device consists of a light source, a binary phase mask (10), a fixed focus lens (11) and at least two finite sized spatially separated detectors (12) positioned in the plane of focus of the wavefront sensing device. The binary phase mask (10) simultaneously applies a positive bias and a negative bias to the wavefront of the incident light such that a pair of spatially separated light points are generated in the plane of focus and detected by the detectors (12). The difference in intensity between the pair of light points is representative of the aberration of the wavefront of the incident light from the ideal.