Abstract: Disclosed is a solution for an electrochemical process, the solution containing a sulfonic acid and having a low concentration of sulfur compounds, either low or high valence, that are susceptible to reduction and which is intended for use in electrodeposition, batteries, conductive polymers and descaling processes.

Abstract: Disclosed is a solution for an electrochemical process, the solution containing a sulfonic acid and having a low concentration of sulfur compounds, either low or high valence, that are susceptible to reduction and which is intended for use in electrodeposition, batteries, conductive polymers and descaling processes.

Abstract: Disclosed are aqueous solutions for use in high energy, highly efficient electrical energy storage devices. The solutions contain (a) a high purity sulfonic acid with a low concentration of low valent sulfur compounds or higher valent sulfur compounds susceptible to reduction, (b) a metal or metals in an oxidized state that are capable of being reduced to the zero valent oxidation state, (c) a metal that is in an oxidized state that is incapable of being reduced to its metallic state and (d) optionally, a buffering agent and/or conductivity salts.

Abstract: Disclosed are aqueous solutions for use in high energy, highly efficient electrical energy storage devices. The solutions contain (a) a high purity sulfonic acid with a low concentration of low valent sulfur compounds or higher valent sulfur compounds susceptible to reduction, (b) a metal or metals in an oxidized state that are capable of being reduced to the zero valent oxidation state, (c) a metal that is in an oxidized state that is incapable of being reduced to its metallic state and (d) optionally, a buffering agent and/or conductivity salts.

Abstract: Disclosed is a solution for an electrochemical process, the solution containing a sulfonic acid and having a low concentration of sulfur compounds, either low or high valence, that are susceptible to reduction and which is intended for use in electrodeposition, batteries, conductive polymers and descaling processes.

Abstract: A family of slurries are disclosed which are useful in modifying exposed surfaces of wafers for semiconductor fabrication are provided along with methods of modifying exposed surfaces of wafers for semiconductor fabrication utilizing such a family of working slurries, and semiconductor wafers. The slurries of the invention are comprised of a liquid carrier; a sulfur-bearing compounds capable of converting copper to copper sulfide; optionally, abrasive particles (polishing agent; optionally a chelating agent; optionally a buffering agent; optionally, a stopping compound; optionally, other additives; and optionally, a co-solvent.

Abstract: Vinyl monomers are stabilized by a composition which includes an alkyl hydroxyl amine and a sulfide compound or at least two alkyl hydroxyl amines and a phenolic compound.

Abstract: A family of slurries are disclosed which are useful in modifying exposed surfaces of wafers for semiconductor fabrication are provided along with methods of modifying exposed surfaces of wafers for semiconductor fabrication utilizing such a family of working slurries, and semiconductor wafers. The slurries of the invention are comprised of a liquid carrier; a sulfur-bearing compounds capable of converting copper to copper sulfide; optionally, abrasive particles (polishing agent; optionally a chelating agent; optionally a buffering agent; optionally, a stopping compound; optionally, other additives; and optionally, a co-solvent.

Abstract: Disclosed are compositions for shortstopping free radical emulsion polymerizations and stabilizing polymers produced from the corresponding emulsion processes. Such compositions include at least one hydrophillic radical scavenger (i.e, shortstopper) and at least one hydrophobic radical scavenger. The compositions are preferably targeted for applications in the emulsion processes of rubber latexes. These compositions exhibit excellent performance not only as shortstoppers of free radical emulsion polymerizations but also as stabilizers of the corresponding polymers. Thus, the compositions prevent additional polymerization in the particles without requiring additional stabilizer even after such polymers are steam stripped. They do so without the use of chemicals which carry a high safety, health, or environmental risk.

Abstract: Vinyl monomers are stabilized by a composition which includes an alkyl hydroxyl amine and a sulfide compound or at least two alkyl hydroxyl amines and a phenolic compound.

Abstract: In the process according to the invention for the aqueous suspension polymerization of vinyl chloride, alone or as a mixture with another vinyl monomer, the polymerization initiator comprises at least one compound chosen from dialkyl peroxydicarbonates, peroxy-tert-alkanoates and diacyl peroxides and use is made, as agent for halting the polymerization, of a mono- or disubstituted hydroxylamine. The resins thus obtained exhibit improved color and heat stability.

Abstract: Disclosed are compositions for shortstopping free radical emulsion polymerizations and stabilizing polymers produced from the corresponding emulsion processes. Such compositions include at least one hydrophillic radical scavenger (i.e, shortstopper) and at least one hydrophobic radical scavenger. The compositions are preferably targeted for applications in the emulsion processes of rubber latexes. These compositions exhibit excellent performance not only as shortstoppers of free radical emulsion polymerizations but also as stabilizers of the corresponding polymers. Thus, the compositions prevent additional polymerization in the particles without requiring additional stabilizer even after such polymers are steam stripped. They do so without the use of chemicals which carry a high safety, health, or environmental risk.

Abstract: A procedure for the generation of organosulfonic acids from solutions of corresponding metal organosulfonate compounds by electrowinning, electrolytically driven hydrolysis or chemically driven hydrolysis is described. Appropriate organosulfonate compounds include the water soluble salts of alkanesulfonic and aromatic sulfonic acids which incorporate metals from Group VIB, VIIB, VIIIB, IB, IIB or VA of the periodic table. The electrowinning and electrolytic techniques described can be applied in divided or undivided cells and can be operated in continuous fashion to provide the greatest efficiency. Hydrolysis based methods can employ either anodic oxidation or oxidation both of which function to oxidize the metal cation(s) present to hydrolytically unstable higher oxidation states.

Abstract: The removal of oxidizable organic impurities which include alkylthiolsulfonate from alkanesulfonic acids by treatment with an ozone containing gas is disclosed. The treated products have improved color and odor and exhibit improved long-term color stability.

Abstract: An ozone-containing gas is used for removing oxidizable odorous impurities and color from alkanesulfonyl chlorides.