Abstract: A longitudinally adjustable connecting rod with a hydraulic control device for effecting a change in the effective length of the connecting rod is provided. The hydraulic control device comprises a hydraulic control valve which comprises a hydraulically actuatable control slide that is preloaded by way of a control slide spring, and two outlet valves which can be actuated by the control slide by way of two control contours arranged at a distance from one another. The control slide comprises a low-pressure section with a low-pressure piston for hydraulically actuating the control slide. For optimizing the control slide for such a longitudinally adjustable connecting rod, the two control contours are arranged together in a high-pressure section of the control slide which is arranged on one side of the low-pressure section and separated therefrom by way of a sealing section disposed therebetween.

Abstract: The invention relates to an adjustable-length connecting rod for a reciprocating piston engine, to a reciprocating piston engine, and to a vehicle, where an effective connecting rod length of the connecting rod can be changed, and the connecting rod has a hydraulic length adjustment device which has a hydraulic working chamber, a hydraulic duct, a valve recess with a valve recess longitudinal axis, and a valve device which is arranged in the valve recess and has a valve chamber, where the valve device is configured for opening and/or shutting of a hydraulic medium outflow from the hydraulic working chamber, and the hydraulic duct opens into the valve recess at an orifice opening in an inner wall section of the valve recess.

Abstract: A longitudinally adjustable connecting rod with a hydraulic control device for effecting a change in the effective length of the connecting rod is provided. The hydraulic control device comprises a hydraulic control valve which comprises a hydraulically actuatable control slide that is preloaded by way of a control slide spring, and two outlet valves which can be actuated by the control slide by way of two control contours arranged at a distance from one another. The control slide comprises a low-pressure section with a low-pressure piston for hydraulically actuating the control slide. For optimizing the control slide for such a longitudinally adjustable connecting rod, the two control contours are arranged together in a high-pressure section of the control slide which is arranged on one side of the low-pressure section and separated therefrom by way of a sealing section disposed therebetween.

Abstract: The invention relates to an adjustable-length connecting rod for a reciprocating piston engine, to a reciprocating piston engine, and to a vehicle, where an effective connecting rod length of the connecting rod can be changed, and the connecting rod has a hydraulic length adjustment device which has a hydraulic working chamber, a hydraulic duct, a valve recess with a valve recess longitudinal axis, and a valve device which is arranged in the valve recess and has a valve chamber, where the valve device is configured for opening and/or shutting of a hydraulic medium outflow from the hydraulic working chamber, and the hydraulic duct opens into the valve recess at an orifice opening in an inner wall section of the valve recess.

Abstract: An optical membrane element for an optical device in lithography, especially EUV (extreme ultraviolet) lithography, includes at least one membrane layer and a frame, which at least partially surrounds the membrane layer and at which at least part of the rim of the membrane layer is mounted. At least one tautening element is provided, which facilitates tautening of the membrane layer and wherein the optical membrane element can be used in a projection exposure system, especially for EUV lithography, such that the membrane layer of the membrane element can be adjustably tautened, such that the membrane layer is flat. A method for manufacturing a corresponding optical membrane element includes generating a tautening element lithographically together with the membrane layer.

Abstract: An optical membrane element for an optical device in lithography, especially EUV (extreme ultraviolet) lithography, includes at least one membrane layer and a frame, which at least partially surrounds the membrane layer and at which at least part of the rim of the membrane layer is mounted. At least one tautening element is provided, which facilitates tautening of the membrane layer and wherein the optical membrane element can be used in a projection exposure system, especially for EUV lithography, such that the membrane layer of the membrane element can be adjustably tautened, such that the membrane layer is flat. A method for manufacturing a corresponding optical membrane element includes generating a tautening element lithographically together with the membrane layer.

Abstract: An optical membrane element for an optical device in lithography, especially EUV (extreme ultraviolet) lithography, includes at least one membrane layer and a frame, which at least partially surrounds the membrane layer and at which at least part of the rim of the membrane layer is mounted. At least one tautening element is provided, which facilitates tautening of the membrane layer and wherein the optical membrane element can be used in a projection exposure system, especially for EUV lithography, such that the membrane layer of the membrane element can be adjustably tautened, such that the membrane layer is flat. A method for manufacturing a corresponding optical membrane element includes generating a tautening element lithographically together with the membrane layer.

Abstract: A method for arranging an optical module in a measuring apparatus includes: providing the measuring apparatus with an irradiation system for irradiating the optical module with electromagnetic radiation, a reference component, and a detection element defining a detection surface, the detection element being disposed in a defined position in relation to the reference component, disposing the optical module in the measuring apparatus such that the radiation emitted by the irradiation system passes through the optical module and impinges onto the detection surface as an exit beam, measuring a position of the exit beam in relation to the detection surface, adjusting the position of the optical module within the measuring apparatus such that the position of the exit beam in relation to the detection surface is brought to correspond to a predetermined position, and establishing position parameters defining the position of the optical module in relation to the reference component.

Abstract: A shutter device for a lithography apparatus includes a housing for maintaining an ultrahigh vacuum. A disk within the housing is rotatable about a rotation axis. The disk has at least one opening arranged on a circumferential line around the rotation axis and serving for transmitting ultraviolet light. A lithography apparatus includes such a shutter device, as well as a light source for ultraviolet light, an optical unit for imaging a pattern onto a target surface, and a camera device for detecting the imaged pattern.

Abstract: A method for arranging an optical module in a measuring apparatus includes: providing the measuring apparatus with an irradiation system for irradiating the optical module with electromagnetic radiation, a reference component, and a detection element defining a detection surface, the detection element being disposed in a defined position in relation to the reference component, disposing the optical module in the measuring apparatus such that the radiation emitted by the irradiation system passes through the optical module and impinges onto the detection surface as an exit beam, measuring a position of the exit beam in relation to the detection surface, adjusting the position of the optical module within the measuring apparatus such that the position of the exit beam in relation to the detection surface is brought to correspond to a predetermined position, and establishing position parameters defining the position of the optical module in relation to the reference component.

Abstract: An optical membrane element for an optical device in lithography, especially EUV (extreme ultraviolet) lithography, includes at least one membrane layer and a frame, which at least partially surrounds the membrane layer and at which at least part of the rim of the membrane layer is mounted. At least one tautening element is provided, which facilitates tautening of the membrane layer and wherein the optical membrane element can be used in a projection exposure system, especially for EUV lithography, such that the membrane layer of the membrane element can be adjustably tautened, such that the membrane layer is flat. A method for manufacturing a corresponding optical membrane element includes generating a tautening element lithographically together with the membrane layer.