Patents by Inventor Martinus Agnes Willem Cuijpers
Martinus Agnes Willem Cuijpers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230075162Abstract: Embodiments herein describe methods, devices, and systems for a reticle gripper damper and isolation system for handling reticles and reducing vibrations in a reticle handler for lithography apparatuses and systems. A reticle handler apparatus includes a reticle handler arm, a reticle baseplate configured to hold the reticle, and a gripper arranged to connect the reticle baseplate to the reticle handler arm. The gripper includes a static structure that is coupled to the reticle handler arm, an isolation structure that is coupled to the static structure, and one or more damping elements. The gripper is configured to reduce vibrations of the reticle in the reticle handler apparatus using the one or more damping elements.Type: ApplicationFiled: January 26, 2021Publication date: March 9, 2023Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Roberto B. WIENER, Peter Conrad KOCHERSPERGER, Boris KOGAN, Martinus Agnes Willem CUIJPERS, Robert Jeffrey WADE, Shaun EVANS
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Patent number: 10747127Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.Type: GrantFiled: August 11, 2017Date of Patent: August 18, 2020Assignee: ASML Netherlands B.V.Inventors: Frits Van Der Meulen, Erik Johan Arlemark, Hendrikus Herman Marie Cox, Martinus Agnes Willem Cuijpers, Joost De Hoogh, Gosse Charles De Vries, Paul Comé Henri De Wit, Sander Catharina Reinier Derks, Ronald Cornelis Gerardus Gijzen, Dries Vaast Paul Hemschoote, Christiaan Alexander Hoogendam, Adrianus Hendrik Koevoets, Raymond Wilhelmus Louis Lafarre, Alain Louis Claude Leroux, Patrick Willem Paul Limpens, Jim Vincent Overkamp, Christiaan Louis Valentin, Koos Van Berkel, Stan Henricus Van Der Meulen, Jacobus Cornelis Gerardus Van Der Sanden, Harmen Klaas Van Der Schoot, David Ferdinand Vles, Evert Auke Rinze Westerhuis
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Publication number: 20190227445Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.Type: ApplicationFiled: August 11, 2017Publication date: July 25, 2019Applicant: ASML Netherlands B.V.Inventors: Frits VAN DER MEULEN, Erik Johan ARLEMARK, Hendrikus Herman Marie COX, Martinus Agnes Willem CUIJPERS, Joost DE HOOGH, Gosse Charles DE VRIES, Paul Comé Henri DE WIT, Sander Catharina Reinier DERKS, Ronald Comelis Gerardus GIJZEN, Dries Vaast Paul HEMSCHOOTE, Christiaan Alexander HOOGENDAM, Adrianus Hendrik KOEVOETS, Raymond Wilhelmus Louis LAFARRE, Alain Louis Claude LEROUX, Patrick Willem Paul LIMPENS, Jim Vincent OVERKAMP, Christiaan Louis VALENTIN, Koos VAN BERKEL, Stan Henricus VAN DER MEULEN, Jacobus Comelis Gerardus VAN DER SANDEN, Harmen Klaas VAN DER SCHOOT, David Ferdinand VLES, Evert Auke Rinze WESTERHUIS
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Patent number: 9575416Abstract: A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.Type: GrantFiled: August 2, 2013Date of Patent: February 21, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Martinus Agnes Willem Cuijpers, Christiaan Alexander Hoogendam, Fransiscus Mathijs Jacobs, Willem Herman Gertruda Anna Koenen, Erik Roelof Loopstra
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Patent number: 9122173Abstract: A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.Type: GrantFiled: February 17, 2012Date of Patent: September 1, 2015Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Martinus Agnes Willem Cuijpers, Christiaan Alexander Hoogendam, Robertus Johannes Marinus De Jongh, Michael Jozef Mathijs Renkens, Marc Wilhelmus Maria Van Der Wijst, Maurice Willem Jozef Etiënne Wijckmans, Robertus Leonardus Tousain, Ronald Petrus Hendricus Faassen, Adrianus Hendrik Koevoets
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Publication number: 20150212428Abstract: A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.Type: ApplicationFiled: August 2, 2013Publication date: July 30, 2015Applicant: ASML Netherlands B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Martinus Agnes Willem Cuijpers, Christiaan Alexander Hoogendam, Fransiscus Mathijs Jacobs, Willem Herman Gertruda Anna Koenen, Erik Roelof Loopstra
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Patent number: 8913228Abstract: A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.Type: GrantFiled: April 3, 2007Date of Patent: December 16, 2014Assignee: ASML Netherlands B.V.Inventors: Maurice Wijckmans, Martinus Agnes Willem Cuijpers, Martinus Hendrikus Antonius Leenders, Frits Van Der Meulen, Joost Jeroen Ottens, Theodorus Petrus Maria Cadee, Frederik Eduard De Jong, Wilhelmus Franciscus Johannes Simons, Edwin Augustinus Matheus Van Gompel, Martin Frans Pierre Smeets, Rob Jansen, Gerardus Adrianus Antonius Maria Kusters, Martijn Van Baren
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Patent number: 8797504Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.Type: GrantFiled: February 29, 2012Date of Patent: August 5, 2014Assignee: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Martinus Agnes Willem Cuijpers, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Oleksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
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Patent number: 8773641Abstract: A leaf spring to be mounted between two objects, the leaf spring configured to have a high stiffness in two orthogonal directions, and a relative low stiffness in other degrees of freedom, wherein the leaf spring has a substantially panel-shaped body, the leaf spring including a first mounting location at or near the center of the panel-shaped body to mount the leaf spring to a first of the two objects, wherein the leaf spring includes one or more second mounting locations at or near the circumference of the panel-shaped body to mount the leaf spring to the second of the two objects, and elongate grooves and/or slits in the panel shaped body between the first mounting location and the second mounting location, the grooves and/or slits running in at least two non-orthogonal directions in the plane of the two orthogonal directions.Type: GrantFiled: October 25, 2011Date of Patent: July 8, 2014Assignee: ASML Netherlands B.V.Inventors: Christiaan Alexander Hoogendam, Martinus Agnes Willem Cuijpers, Bart Friso Riedstra, Ronald Cornelis Gerardus Gijzen, Maikel Cornelis Andreas Bruin
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Patent number: 8730448Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.Type: GrantFiled: March 1, 2012Date of Patent: May 20, 2014Assignee: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Martinus Agnes Willem Cuijpers, Nicolaas Ten Kate, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Oleksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Laurentius Johannes Adrianus Van Bokhoven, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
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Publication number: 20130146785Abstract: A support for an object having a support surface configured to support the object; wherein the support surface includes a main part and a moveable part, the moveable part of the support surface being moveable between a retracted position in which the moveable part of the support surface is adapted to be substantially in the same plane as the main part of the support surface and an extended position in which the moveable part of the support surface protrudes from the plane of the main part of the support surface.Type: ApplicationFiled: November 26, 2012Publication date: June 13, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Noud Jan GILISSEN, Martinus Agnes Willem CUIJPERS, Menno FIEN, Anko Jozef Cornelus SIJBEN, Martin Frans Pierre SMEETS
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Publication number: 20120229783Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.Type: ApplicationFiled: March 1, 2012Publication date: September 13, 2012Applicant: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Martinus Agnes Willem Cuijpers, Nicolaas Ten Kate, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Oleksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Laurentius Johannes Adrianus Van Bokhoven, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
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Publication number: 20120147355Abstract: A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.Type: ApplicationFiled: February 17, 2012Publication date: June 14, 2012Applicant: ASML Netherlands B.V.Inventors: Hans BUTLER, Martinus Agnes Willem CUIJPERS, Christiaan Alexander HOOGENDAM, Robertus Johannes Marinus DE JONGH, Michael Jozef Mathijs RENKENS, Marc Wilhelmus Maria VAN DER WIJST, Maurice Willem Jozef Etiënne WIJCKMANS, Robertus Leonardus TOUSAIN, Ronald Petrus Hendricus FAASSEN, Adrianus Hendrik KOEVOETS
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Publication number: 20120105817Abstract: A leaf spring to be mounted between two objects, the leaf spring configured to have a high stiffness in two orthogonal directions, and a relative low stiffness in other degrees of freedom, wherein the leaf spring has a substantially panel-shaped body, the leaf spring including a first mounting location at or near the center of the panel-shaped body to mount the leaf spring to a first of the two objects, wherein the leaf spring includes one or more second mounting locations at or near the circumference of the panel-shaped body to mount the leaf spring to the second of the two objects, and elongate grooves and/or slits in the panel shaped body between the first mounting location and the second mounting location, the grooves and/or slits running in at least two non-orthogonal directions in the plane of the two orthogonal directions.Type: ApplicationFiled: October 25, 2011Publication date: May 3, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Christiaan Alexander HOOGENDAM, Martinus Agnes Willem Cuijpers, Bart Friso Riedstra, Ronald Cornelis Gerardus Gijzen, Maikel Cornelis Andreas Bruin
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Publication number: 20120078561Abstract: A method is used to calibrate a target surface of a position measurement system configured to measure a position of a movable object. The position measurement system includes the target surface mounted on the movable object, a stationary sensor system, and a processing device to calculate a position of the movable object on the basis of at least one measurement signal of the sensor system. The processing device includes a correction map of the target surface to correct for irregularities of the target surface. The method includes recalibrating the correction map of the target surface by measuring the target surface and determining a recalibrated correction map of the complete target surface on the basis of the measured target surface and one or more deformation modes of the target surface and/or physical objects affecting the target surface.Type: ApplicationFiled: August 23, 2011Publication date: March 29, 2012Applicant: ASML Netherlands B.V.Inventors: Paulus Johannes KNIJN, Christiaan Alexander HOOGENDAM, Leon Martin LEVASIER, Roland BLOK, Martinus Agnes Willem CUIJPERS, Martin Frans Pierre SMEETS
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Patent number: 8144310Abstract: A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.Type: GrantFiled: March 24, 2009Date of Patent: March 27, 2012Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Martinus Agnes Willem Cuijpers, Christiaan Alexander Hoogendam, Robertus Johannes Marinus De Jongh, Michael Jozef Mathijs Renkens, Marc Wilhelmus Maria Van Der Wijst, Maurice Willem Jozef Etiënne Wijckmans, Robertus Leonardus Tousain, Ronald Petrus Hendricus Faassen, Adrianus Hendrik Koevoets
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Patent number: 7755742Abstract: A lithographic apparatus is disclosed in which a circular sensor is mounted to a substrate table with three leaf springs that are evenly spaced around a thermal axis of the sensor. The leaf springs are provided in two parts that are releasably attachable to each other. The leaf springs are elastic and allow some movement of the sensor relative to the substrate table on thermal expansion and contraction but ensure that the thermal center of the sensor does not move relative to the substrate table.Type: GrantFiled: October 11, 2005Date of Patent: July 13, 2010Assignee: ASML Netherlands B.V.Inventors: Sebastiaan Maria Johannes Cornelissen, Martinus Agnes Willem Cuijpers, Cornelis Christiaan Ottens, Peter Smits, Johannes Antonius Maria Van De Wal
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Publication number: 20090262325Abstract: A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.Type: ApplicationFiled: March 24, 2009Publication date: October 22, 2009Applicant: ASML Netherlands B.V.Inventors: Hans Butler, Martinus Agnes Willem Cuijpers, Christiaan Alexander Hoogendam, Robertus Johannes Marinus De Jongh, Michael Jozef Mathijs Renkens, Marc Wilhelmus Maria Van Der Wijst, Maurice Willem Jozef Etienne Wijckmans, Robertus Leonardus Tousain, Ronald Petrus Hendricus Faassen, Adrianus Hendrik Koevoets
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Patent number: 7456527Abstract: A moveable object carrier is moveable in a first direction and in a second direction to be positioned in a plane. The object carrier may be moved in the first direction by a first and a second linear actuator. The first and second linear actuators are adapted to support the object carrier. Thereto the linear actuators may comprise additional bearing and the linear actuators are positioned relative to the object carrier such that no other bearing is required to prevent the object carrier from falling or tilting. The object carrier may be moved in the second direction by a third and a fourth linear actuator, which linear actuators may be adapted to support the first and the second linear actuators.Type: GrantFiled: March 4, 2004Date of Patent: November 25, 2008Assignee: ASML Netherlands B.V.Inventor: Martinus Agnes Willem Cuijpers
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Patent number: 7193722Abstract: A lithographic projection apparatus is presented, which includes a housing, which comprises therein a first exposure system that has at least one movable part (e.g. a movable first substrate holder or a movable second substrate holder in a twin stage apparatus). The apparatus also includes a position disturbance correction system for correcting a position of the first substrate holder with respect to the patterned projection beam due to the influence of gas pressure differences or gas movements, caused by movements of the movable part. A related device manufacturing method is also presented in which, during the exposure of a first substrate, the position thereof is corrected by means of position disturbance correction system.Type: GrantFiled: December 30, 2003Date of Patent: March 20, 2007Assignee: ASML Netherlands B.V.Inventors: Martinus Godefridus Helena Boogaarts, Hans Butler, Henrikus Herman Marie Cox, Martinus Agnes Willem Cuijpers, Jan Jaap Kuit