Patents by Inventor Marvin S. Pittler

Marvin S. Pittler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4824009
    Abstract: In the process of braze attachment of electronic package members, such as attaching metallic coated connector pins to a multilayer ceramic substrate, contact areas of the substrate are formed by sequential coatings of molybdenum and nickel, which are heated to diffuse the nickel. A pure gold paste is applied by screen printing, for example, followed by the step of firing to burn out the paste binder and to sinter the pure gold particles onto a dense low porosity structure. The sintering operation converts the Ni film into a continuous Au-Ni solid solution. During pin braze, Ni-Sn intermetallics are dispersed in a gold rich matrix of the Au-Ni solid solution.
    Type: Grant
    Filed: December 31, 1981
    Date of Patent: April 25, 1989
    Assignee: International Business Machines Corporation
    Inventors: Raj N. Master, Marvin S. Pittler, Paul A. Totta, Norman G. Ainslie, Paul H. Palmateer
  • Patent number: 4040891
    Abstract: In integrated circuit fabrication a method is provided involving the utilization of the same positive photoresist layer to form two different masks used in two separate etching steps. A positive photoresist layer is formed on a substrate, and portions of the positive photoresist layer are selectively exposed and developed to form the photoresist mask having a pattern of openings therethrough exposing the underlying substrate. Then, the substrate exposed in these openings is etched to form the pattern of recesses in the substrate corresponding to the openings. Next, portions of the remaining photoresist layer respectively adjacent to openings in the photoresist layer are exposed and developed to laterally expand such openings, after which the substrate exposed in these expanded openings is etched whereby the portions of the recesses underlying the original openings are etched deeper than the portions of the recesses underlying the expanded portions of said openings. The result is a two-level recess pattern.
    Type: Grant
    Filed: June 30, 1976
    Date of Patent: August 9, 1977
    Assignee: IBM Corporation
    Inventors: Kenneth Chang, Marvin S. Pittler