Patents by Inventor Masaaki Kanayama

Masaaki Kanayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020080960
    Abstract: A predetermined initialization is made on a CD-R disc or a CD-RW disc using an existing formatting method to a specific disc on which recorded are a media number forming an encryption key based on a combination of a decimal six-digit disc ID, a decimal thirteen-digit MCN and a decimal five-digit ISRC serial number and encrypted data obtained by the encryption using this media number. This allows a user to make the copy of copyrighted data such as music, movie and computer program data only once, but inhibits the secondary copy from this copy disc to another disc, which achieves the protection of the copyrighted data.
    Type: Application
    Filed: December 14, 2001
    Publication date: June 27, 2002
    Inventors: Masaaki Kanayama, Tsuyoshi Fujiwara
  • Patent number: 4968642
    Abstract: An epitaxial wafer for producing arrays of GaAsP-LEDs comprises, in the GaAs.sub.1-x P.sub.x layer with varying X, a layer region(s) with a discontinuous variance of x along the thickness of the GaAs.sub.1-x P.sub.x layer. This layer region(s) contribute to a uniformity in the brightness of the light emission of LEDs formed in the epitaxial wafer.
    Type: Grant
    Filed: July 20, 1989
    Date of Patent: November 6, 1990
    Assignee: Mitsubishi Chemical Industries, Ltd.
    Inventors: Hisanori Fujita, Masaaki Kanayama, Takeshi Okano
  • Patent number: 4865655
    Abstract: An epitaxial wafer for producing arrays of GaAsP-LEDs comprises, in the GaAs.sub.1-x P.sub.x layer with varying X, a layer region(s) with a discontinuous variance of x along the thickness of the GaAs.sub.1-x P.sub.x layer. This layer region(s) contribute to a uniformity in the brightness of the light emission of LEDs formed in the epitaxial wafer.
    Type: Grant
    Filed: November 18, 1987
    Date of Patent: September 12, 1989
    Assignees: Mitsubishi Monsanto Chemical Co., Ltd., Mitsubishi Chemical Industries, Ltd.
    Inventors: Hisanori Fujita, Masaaki Kanayama, Takeshi Okano
  • Patent number: 4756792
    Abstract: In a GaAs epitaxial wafer including, for example, two epitaxial layers having high and low carrier concentrations, the carrier concentration of the low carrier concentration layer is liable to greatly vary, so that wafers suitable for FETs and Schottky barrier diodes operated at UHF and SHF are produced at only a low yield. This drawback is eliminated by adjusting the heating temperature of GaAs substrate to 690.degree. to 730.degree. C. during the growth of the low carrier concentration layer.
    Type: Grant
    Filed: September 5, 1986
    Date of Patent: July 12, 1988
    Assignees: Mitsubishi Monsanto Chemical Co., Ltd., Mitsubishi Chemical Inds. Ltd.
    Inventors: Hisanori Fujita, Masaaki Kanayama