Patents by Inventor Masaaki Miyaji
Masaaki Miyaji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220380503Abstract: Provided are an additive and a surface treatment agent capable of suppressing agglutination of latex particles contained in a reagent for a latex agglutination reaction during storage of the reagent although a synthetic polymer is contained as an active component. An additive is to be added to latex particles used in a reagent for a latex agglutination reaction. The latex particles have not been subjected to blocking treatment. The additive includes a polymer containing more than 60% by mass and 99% by mass or less of hydrophilic repeating units (A) relative to all repeating units and 1% by mass or more and less than 40% by mass of hydrophobic repeating units (B) relative to all repeating units, and having a weight average molecular weight of 3,000 or more.Type: ApplicationFiled: August 5, 2022Publication date: December 1, 2022Applicants: JSR CORPORATION, JSR LIFE SCIENCES CORPORATIONInventors: Yingjia XU, Masaaki MIYAJI, Kouji TAMORI, Tokio SAWAI, Hiroyuki HONMA, Naoki HAYASHI, Shin-ya OMOTE
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Patent number: 11493506Abstract: Provided are an additive and a surface treatment agent capable of suppressing agglutination of latex particles contained in a reagent for a latex agglutination reaction during storage of the reagent although a synthetic polymer is contained as an active component. An additive is to be added to latex particles used in a reagent for a latex agglutination reaction. The latex particles have not been subjected to blocking treatment. The additive includes a polymer containing more than 60% by mass and 99% by mass or less of hydrophilic repeating units (A) relative to all repeating units and 1% by mass or more and less than 40% by mass of hydrophobic repeating units (B) relative to all repeating units, and having a weight average molecular weight of 3,000 or more.Type: GrantFiled: February 9, 2017Date of Patent: November 8, 2022Assignees: JSR CORPORATION, JSR LIFE SCIENCES CORPORATIONInventors: Yingjia Xu, Masaaki Miyaji, Kouji Tamori, Tokio Sawai, Hiroyuki Honma, Naoki Hayashi, Shin-ya Omote
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Publication number: 20220226512Abstract: Composite particles, each of which is obtained by forming, on the surface of a gadolinium oxide-containing particle, a cover film that contains a polymer obtained by polymerizing a monomer component containing a monomer having an ethylenically unsaturated bond; a macrophage imaging agent which contains the composite particles; and a method for producing composite particles, wherein a monomer component containing a monomer having an ethylenically unsaturated bond and gadolinium oxide-containing particles are mixed with each other, and after emulsifying the thus-obtained monomer component-containing mixture in water in the presence of a surfactant and a polymerization initiator in water, the monomer component is polymerized, thereby forming cover films on the surfaces of the gadolinium oxide-containing particles.Type: ApplicationFiled: May 27, 2020Publication date: July 21, 2022Applicants: KYOTO UNIVERSITY, NATIONAL CEREBRAL AND CARDIOVASCULAR CENTER, JSR CORPORATIONInventors: Teruyuki KONDO, Yu KIMURA, Aoi SON, Tetsuya MATSUDA, Hirohiko IMAI, Hirokazu KOSEKI, Tomohiro AOKI, Katsuyuki TAKASE, Masaaki MIYAJI, Koji TAMORI, Takeaki MASUDA, Hirokazu KAI
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Publication number: 20200300847Abstract: Provided are an additive and a surface treatment agent capable of suppressing agglutination of latex particles contained in a reagent for a latex agglutination reaction during storage of the reagent although a synthetic polymer is contained as an active component. An additive is to be added to latex particles used in a reagent for a latex agglutination reaction. The latex particles have not been subjected to blocking treatment. The additive includes a polymer containing more than 60% by mass and 99% by mass or less of hydrophilic repeating units (A) relative to all repeating units and 1% by mass or more and less than 40% by mass of hydrophobic repeating units (B) relative to all repeating units, and having a weight average molecular weight of 3,000 or more.Type: ApplicationFiled: February 9, 2017Publication date: September 24, 2020Inventors: Yingjia XU, Masaaki MIYAJI, Kouji TAMORI, TOKIO SAWAI, HIROYUKI HONMA, NAOKI HAYASHI, SHIN-YA OMOTE
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Patent number: 9051355Abstract: Provided are a filler for affinity chromatography which has excellent alkali resistance, and a method for isolating immunoglobulin. The filler for affinity chromatography is a filler in which a protein represented by the following formula (1) is immobilized on a carrier. R—R2??(1) wherein R represents an amino acid sequence consisting of 4 to 300 amino acid residues containing a region consisting of 4 to 20 contiguous histidine residues; and R2 represents an amino acid sequence capable of binding to immunoglobulin, the amino acid sequence consisting of 50 to 500 amino acid residues containing Z domain of Protein A or a fragment thereof, or a variant thereof, provided that the R binds to C-terminus or N-terminus of the R2.Type: GrantFiled: March 23, 2011Date of Patent: June 9, 2015Assignee: JSR CORPORATIONInventors: Kouji Tamori, Tetsuo Fukuta, Masaaki Miyaji, Yong Wang, Takayoshi Abe, Yusuke Okano, Masaki Momiyama, Takahiro Kawai
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Patent number: 8846877Abstract: An affinity chromatography packing material includes porous mother particles that include a copolymer of a monomer mixture including a crosslinkable vinyl monomer and an epoxy group-containing vinyl monomer, a ligand being bound to the porous mother particles, and the porous mother particles including a ring-opening epoxy group produced by ring-opening of the epoxy group included in the porous mother particles.Type: GrantFiled: September 24, 2009Date of Patent: September 30, 2014Assignee: JSR CorporationInventors: Kouji Tamori, Tetsuo Fukuta, Masaaki Miyaji, Yong Wang, Takayoshi Abe, Yuusuke Okano, Masaki Momiyama, Takahiro Kawai
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Publication number: 20130041135Abstract: Provided are a filler for affinity chromatography which has excellent alkali resistance, and a method for isolating immunoglobulin. The filler for affinity chromatography is a filler in which a protein represented by the following formula (1) is immobilized on a carrier. R—R2 ??(1) wherein R represents an amino acid sequence consisting of 4 to 300 amino acid residues containing a region consisting of 4 to 20 contiguous histidine residues; and R2 represents an amino acid sequence capable of binding to immunoglobulin, the amino acid sequence consisting of 50 to 500 amino acid residues containing Z domain of Protein A or a fragment thereof, or a variant thereof, provided that the R binds to C-terminus or N-terminus of the R2.Type: ApplicationFiled: March 23, 2011Publication date: February 14, 2013Applicant: JSR CORPORATIONInventors: Kouji Tamori, Tetsuo Fukuta, Masaaki Miyaji, Yong Wang, Takayoshi Abe, Yusuke Okano, Masaki Momiyama, Takahiro Kawai
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Publication number: 20120115130Abstract: A target cell detection method includes performing a test measurement on a dispersion to obtain a measurement result 1, the test measurement being an optical or electromagnetic measurement, and the dispersion including labeled particles and target cells, the labeled particles being particles on each of which a substance that specifically binds to a specific molecule present on a surface of each of the target cells is immobilized, performing measurement that is identical with the test measurement on a dispersion that includes the target cells, but does not include the labeled particles to obtain a measurement result 2, and comparing the measurement result 1 with the measurement result 2.Type: ApplicationFiled: June 16, 2010Publication date: May 10, 2012Applicant: JSR CORPORATIONInventors: Toshihiko Imai, Masaaki Miyaji
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Publication number: 20110262748Abstract: An affinity chromatography packing material includes porous mother particles that include a copolymer of a monomer mixture including a crosslinkable vinyl monomer and an epoxy group-containing vinyl monomer, a ligand being bound to the porous mother particles, and the porous mother particles including a ring-opening epoxy group produced by ring-opening of the epoxy group included in the porous mother particles.Type: ApplicationFiled: September 24, 2009Publication date: October 27, 2011Applicant: JSR CorporationInventors: Kouji Tamori, Tetsuo Fukuta, Masaaki Miyaji, Yong Wang, Takayoshi Abe, Yuusuke Okano, Masaki Momiyama, Takahiro Kawai
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Patent number: 7202016Abstract: A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.Type: GrantFiled: April 28, 2005Date of Patent: April 10, 2007Assignee: JSR CorporationInventors: Masaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Yukio Nishimura, Masafumi Yamamoto, Hiroyuki Ishii, Toru Kajita, Tsutomu Shimokawa
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Patent number: 7105269Abstract: 1. A copolymer having recurring units of the following formulas (1), (2), and (3), wherein R1, R4, R5, and R6 are a hydrogen atom or a methyl group, R2, R3, and R7 represent a monovalent organic group, k is 1 or 2, 1 is 0–4, n is 1–3, m is 0–3, R8 is a substituted methyl group, 1-substituted ethyl group, 1-branched alkyl group, triorganosilyl group, triorganogermyl group, alkoxycarbonyl group, acyl group, or cyclic acid-dissociable group, with two or more R8 groups being the same or different, q is 1–3, and p is 0–3, the copolymer having a GPC average molecular weight of 3,000–100,000. The composition is useful as a polymer component for a radiation-sensitive resin composition suitable as a chemically-amplified resist.Type: GrantFiled: December 18, 2002Date of Patent: September 12, 2006Assignee: JSR CorporationInventors: Tomoki Nagai, Daisuke Shimizu, Tsutomu Shimokawa, Fumihisa Miyajima, Masaaki Miyaji
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Publication number: 20050214680Abstract: A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.Type: ApplicationFiled: April 28, 2005Publication date: September 29, 2005Inventors: Masaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Yukio Nishimura, Masafumi Yamamoto, Hiroyuki Ishii, Toru Kajita, Tsutomu Shimokawa
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Patent number: 6933094Abstract: A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.Type: GrantFiled: September 18, 2001Date of Patent: August 23, 2005Assignee: JSR CorporationInventors: Masaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Yukio Nishimura, Masafumi Yamamoto, Hiroyuki Ishii, Toru Kajita, Tsutomu Shimokawa
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Publication number: 20030157423Abstract: 1.Type: ApplicationFiled: December 18, 2002Publication date: August 21, 2003Inventors: Tomoki Nagai, Daisuke Shimizu, Tsutomu Shimokawa, Fumihisa Miyajima, Masaaki Miyaji
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Patent number: 6517992Abstract: An N-sulfonyloxyimide compound having the formula (1): wherein X represents a single bond or a double bond, Y and Z represent a hydrogen atom or others and may combine to form a cyclic structure; and R is a group having the formula (2): wherein X1 represents an organic group having an ester linkage, R1 represents an alkyl group or an alkoxyl group; and m is an integer of 1 to 11 and n is an integer of 0 to 10, satisfying m+n≦11; and chemically amplified positive and negative radiation-sensitive resin compositions using the compound are provided. The N-sulfonyloxyimide compound is a good radiation-sensitive acid-generating agent, has no problem of volatilization or side reaction, can keep dark reaction from taking place during the storage. The compound is useful as a component of radiation-sensitive chemically amplified resists.Type: GrantFiled: November 8, 2000Date of Patent: February 11, 2003Assignee: JSR CorporationInventors: Yong Wang, Eiichi Kobayashi, Masaaki Miyaji, Jun Numata, Tsutomu Shimokawa
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Publication number: 20020058201Abstract: A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), 1Type: ApplicationFiled: September 18, 2001Publication date: May 16, 2002Inventors: Masaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Yukio Nishimura, Masafumi Yamamoto, Hiroyuki Ishii, Toru Kajita, Tsutomu Shimokawa