Patents by Inventor Masaaki Sakaguchi

Masaaki Sakaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090241838
    Abstract: A polycrystalline silicon manufacturing apparatus is provided which supplies raw gas to the inside of a reaction furnace and supplies a current from an electrode to a silicon seed rod in a state where the vertically extending silicon seed rod is uprightly stood on each of the plural electrodes disposed in a bottom plate portion of the reaction furnace so as to heat the silicon seed rod and thus to deposit polycrystalline silicon on a surface of the silicon seed rod by means of the reaction of the raw gas.
    Type: Application
    Filed: March 20, 2009
    Publication date: October 1, 2009
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Toshihide Endoh, Masayuki Tebakari, Toshiyuki Ishii, Masaaki Sakaguchi
  • Publication number: 20090246113
    Abstract: A polymer inactivation method for a polycrystalline silicon manufacturing device, wherein humidified gas such as water vapor and humidified nitrogen gas is supplied into a reacting furnace for manufacturing polycrystalline silicon to hydrolyze polymers adhered to an inner surface of the reacting furnace. It is preferable that a furnace wall of the reacting furnace is heated when the humidified gas is supplied.
    Type: Application
    Filed: March 26, 2009
    Publication date: October 1, 2009
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Toshihide Endoh, Masayuki Tebakari, Toshiyuki Ishii, Masaaki Sakaguchi
  • Publication number: 20090238992
    Abstract: A polycrystalline silicon reactor 1 which can prevent polycrystalline silicon which deposits on the surface of an electrode 5 holding a silicon seed rod 4 from being peeled off is provided. In a polycrystalline silicon reactor 1 which applies an electric current to a silicon seed rod 4 provided within a furnace, thereby heating the silicon seed rod 4, brings a source gas supplied into the furnace into reaction, and deposits polycrystalline silicon on the surface of the silicon seed rod 4, the reactor includes, at a bottom plate 2 (furnace bottom) of the furnace, an electrode holder 10 provided so as to be electrically insulated from the bottom plate 2 (furnace bottom), and a seed rod holding electrode 15 connected to the electrode holder 10, and holding the silicon seed rod 4 toward the upside. Concavo-convex portions (male thread portion) 15B exposed to a furnace atmosphere is provided at an outer peripheral surface of the seed rod holding electrode 15.
    Type: Application
    Filed: March 18, 2009
    Publication date: September 24, 2009
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Toshihide ENDOH, Masayuki TEBAKARI, Toshiyuki ISHII, Masaaki SAKAGUCHI
  • Publication number: 20090188532
    Abstract: In a reactor cleaning apparatus 1 which cleans an inner wall surface 72 of a reactor 70 which generates polycrystalline silicon, a bell jar of the reactor 70 has a dual structure, a through hole 11 is formed along a vertical direction at a central portion of a substantially disc-like tray 10 placed in a horizontal state, a flange portion 13 in which an opening edge of the reactor 70 is placed is formed at an outer peripheral portion of the tray 10, a shaft 20 is provided through the through hole 11 of the tray 10 so as to be rotatable and movable in the vertical direction, a nozzle device 50 which sprays a cleaning water at high pressure in three-dimensional directions is provided at an upper end of the shaft 20, a drive mechanism 30 which rotates the shaft 20 and moves the shaft in the vertical direction is provided at a base end of the shaft 20, and steam piping 62 capable of supplying the steam within the bell jar of the reactor 70 is provided.
    Type: Application
    Filed: January 22, 2009
    Publication date: July 30, 2009
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Toshihide Endoh, Masayuki Tebakari, Toshiyuki Ishii, Masaaki Sakaguchi
  • Publication number: 20090136666
    Abstract: A method for manufacturing polycrystalline silicon with high quality by effectively preventing undesired shape such as giving an rough surface to silicon rods or an irregularity in diameter of the silicon rods. The method for manufacturing polycrystalline silicon includes: an initial stabilizing step of deposition wherein a velocity of ejecting the raw material gas from the gas ejection ports is gradually increased; the shaping step wherein first the ejection velocity is increased at a rate higher than that in the stabilizing step and then the ejection velocity is gradually increased at a rate lower than the previous increasing rate; and a growing step wherein, after the shaping step, the ejection velocity is made slower than that at the end of the shaping step until the end of the deposition.
    Type: Application
    Filed: November 26, 2008
    Publication date: May 28, 2009
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Toshihide Endoh, Masayuki Tebakari, Toshiyuki Ishii, Masaaki Sakaguchi, Naoki Hatakeyama
  • Publication number: 20090136408
    Abstract: A polycrystalline silicon manufacturing apparatus efficiently produces high-quality polycrystalline silicon. There is provided a polycrystalline silicon manufacturing apparatus, in which a plurality of gas supplying ports 6A for ejecting raw gas upward in a reactor 1 and gas exhausting ports 7 for exhausting exhaust gas after a reaction are provided on an inner bottom of the reactor 1 in which a plurality of silicon seed rods 4 are stood, the silicon seed rods 4 are heated and the polycrystalline silicon is deposited from the raw gas on the surfaces.
    Type: Application
    Filed: November 21, 2008
    Publication date: May 28, 2009
    Applicant: Mitsubishi Materials Corporation
    Inventors: Toshihide Endoh, Masayuki Tebakari, Toshiyuki Ishii, Masaaki Sakaguchi, Naoki Hatakeyama
  • Publication number: 20090081380
    Abstract: The reactor for polycrystalline silicon is a reactor for polycrystalline silicon in which a silicon seed rod installed inside the reactor is heated by supplying electricity, a raw material gas supplied inside the reactor is allowed to react, thereby producing polycrystalline silicon on the surface of the silicon seed rod, and specifically, the reactor for polycrystalline silicon is provided with a raw material gas supply port installed on the bottom of the reactor and a raw material gas supply nozzle attached to the raw material gas supply port so as to be communicatively connected and extending upward, in which the upper end of the raw material gas supply nozzle is set to a height in a range from ?10 cm to +5 cm on the basis of the upper end of the electrode which retains the silicon seed rod.
    Type: Application
    Filed: September 19, 2008
    Publication date: March 26, 2009
    Applicant: Mitsubishi Materials Corporation
    Inventors: Toshihide Endoh, Toshiyuki Ishii, Masaaki Sakaguchi, Naoki Hatakeyama
  • Patent number: 6723480
    Abstract: The object of the present invention is to provide an electrophotography photosensitive body substrate, photosensitive body, and electrophotography device used in a contact charging process that can prevent the occurrence of minor insulation damage of around diameter 0.1-0.5 mm. In an electrophotography photosensitive body substrate having a sealed aluminum anodic oxidation film on its surface, the anodic oxidation film is sealed by a sealing agent in which an anion surface active agent is beneficially added.
    Type: Grant
    Filed: March 5, 2002
    Date of Patent: April 20, 2004
    Assignee: Fuji Electric Imaging Device Co., Ltd.
    Inventors: Hidetaka Yahagi, Naoyuki Senba, Masaru Kobashi, Mikio Yamazaki, Shinichiro Nishimaki, Yutaka Nakagishi, Masaaki Sakaguchi
  • Patent number: 6705979
    Abstract: An apparatus for machining a web-shaped workpiece includes a workpiece supply for supplying workpiece rolls each of an elongate thin metal sheet, a processing machine for machining the elongate thin metal sheet into caps, a workpiece feeder for feeding the elongate thin metal sheet to the processing machine, and a product feeder for automatically separating the caps from scrap and feeding the caps to a product collecting mechanism. The apparatus is capable of efficiently and quickly producing various products from the elongate thin metal sheet.
    Type: Grant
    Filed: December 15, 1999
    Date of Patent: March 16, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masaaki Sakaguchi, Kazumasa Harada, Shuji Nakata, Masayoshi Sekino
  • Publication number: 20030013030
    Abstract: The object of the present invention is to provide an electrophotography photosensitive body substrate, photosensitive body, and electrophotography device used in a contact charging process that can prevent the occurrence of minor insulation damage of around diameter 0.1-0.5 mm.
    Type: Application
    Filed: March 5, 2002
    Publication date: January 16, 2003
    Inventors: Hidetaka Yahagi, Naoyuki Senba, Masaru Kobashi, Mikio Yamazaki, Shinichiro Nishimaki, Yutaka Nakagishi, Masaaki Sakaguchi
  • Patent number: 6408133
    Abstract: A focusing position selecting mechanism for determining focusing positions of a taking lens is provided with a selector member for selecting among a plurality of focusing positions including a focusing position for close-up photographing. In the front portion of the photographing unit a mirror is provided fixedly beside a finder window, and the photographer can take a picture of an object from the front with himself included in the composition by watching the mirror. On the front portion of the apparatus is indicated a focusing state of normal photographing so that the photographer may not make a mistake in photographing from the front at the normal focusing position.
    Type: Grant
    Filed: May 3, 2000
    Date of Patent: June 18, 2002
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fuminori Kawamura, Masaaki Sakaguchi, Hiroshi Sakata
  • Patent number: 6286356
    Abstract: An apparatus for machining a web-shaped workpiece includes a workpiece supply for supplying workpiece rolls each of an elongate thin metal sheet, a processing machine for machining the elongate thin metal sheet into caps, a workpiece feeder for feeding the elongate thin metal sheet to the processing machine, and a product feeder for automatically separating the caps from scrap and feeding the caps to a product collecting mechanism. The apparatus is capable of efficiently and quickly producing various products from the elongate thin metal sheet.
    Type: Grant
    Filed: December 15, 1999
    Date of Patent: September 11, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masaaki Sakaguchi, Kazumasa Harada, Shuji Nakata, Masayoshi Sekino
  • Patent number: 6080491
    Abstract: A substrate for an electrophotographic photoconductor having an anodic oxidation film on the surface is subjected to two-step sealing treatment in which the substrate is sealing treated with nickel fluoride as a sealing agent, and then with nickel acetate as a sealing agent. Therefore, an electrophotographic photoconductor using the substrate for an electrophotographic photoconductor is small in charge potential difference between the first turn and the second turn and after, and does not generate a fogged image defect or the like even without preliminary charging before printing.
    Type: Grant
    Filed: July 9, 1998
    Date of Patent: June 27, 2000
    Assignee: Fuji Electric Co., Ltd.
    Inventors: Ikuo Takaki, Hidetaka Yahagi, Masaaki Sakaguchi, Yutaka Nakagishi, Osamu Kimura
  • Patent number: 6037089
    Abstract: An electrophotographic photoconductor and method for producing same, the electrophotographic photoconductor including an electroconductive substrate; and a photosensitive film laminated on said electroconductive substrate, wherein the electroconductive substrate comprises an aluminum substrate which has an anodic oxidation film on at least one surface thereof and which has been treated with a sealing agent mixture including an additive selected from the group consisting of a phosphate ester surfactant, a naphthalene sulfonate formaldehyde condensate, and a bisphenol A sulfonate formaldehyde condensate and a sealing agent.
    Type: Grant
    Filed: July 8, 1998
    Date of Patent: March 14, 2000
    Assignee: Fuji Electric Co., Ltd.
    Inventors: Hidetaka Yahagi, Yukihisa Tamura, Masaaki Sakaguchi, Yutaka Nakagishi
  • Patent number: 6027436
    Abstract: An apparatus for machining a web-shaped workpiece includes a workpiece supply for supplying workpiece rolls each of an elongate thin metal sheet, a processing machine for machining the elongate thin metal sheet into caps, a workpiece feeder for feeding the elongate thin metal sheet to the processing machine, and a product feeder for automatically separating the caps from scrap and feeding the caps to a product collecting mechanism. The apparatus is capable of efficiently and quickly producing various products from the elongate thin metal sheet.
    Type: Grant
    Filed: February 11, 1998
    Date of Patent: February 22, 2000
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masaaki Sakaguchi, Kazumasa Harada, Shuji Nakata, Masayoshi Sekino
  • Patent number: 5754892
    Abstract: A lens-fitted photo film unit containing photo film having a pair of perforations per frame along through a limited length of frame recording portion available for photographing frames. The photo film is previously drawn from a cassette shell, its trailing end secured to a spool of the cassette shell, so as to be wound into the cassette shell one frame after each exposure. According to the invention, the photo film is drawn from the cassette shell as far as a frame of the frame recording portion that is the nearest to the trailing end, and is set in a position one frame or more farther than an exposure position of the film unit, when loading the photo film in the film unit. A slot is formed through the film unit, for permitting insertion of a tool to set a shutter device to its charged position, without the need for winding the photo film. Alternatively, the shutter device is designed to be charged by use of rotation of a film winding wheel, independently of the perforations.
    Type: Grant
    Filed: March 21, 1996
    Date of Patent: May 19, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fumio Yuito, Shinsuke Aoshima, Masaaki Sakaguchi
  • Patent number: 5439712
    Abstract: A method for making a composite aluminum article comprises the steps of electrochemically or chemically adsorbing fine particles of a polytetrafluoroethylene to the surface of a hard anodic oxide film of an aluminum material or an aluminum alloy material, and drying the aluminum material or the aluminum alloy material. Thereafter, the aluminum material or the aluminum alloy material and an opposite member which slides along the aluminum material or the aluminum alloy material are rubbed together, and a lubricating film is thereby formed.
    Type: Grant
    Filed: March 1, 1994
    Date of Patent: August 8, 1995
    Assignees: Mitsubishi Jukogyo Kabushiki Kaisha, Okuno Chemical Industries Co., Ltd.
    Inventors: Takeshi Hattori, Kazuhiko Inogutt, Yukio Ohyama, Yutaka Nakagishi, Masaaki Sakaguchi
  • Patent number: 5419970
    Abstract: A method for making a composite aluminum article comprises the steps of electrochemically or chemically adsorbing fine particles of a polytetrafluoroethylene to the surface of a hard anodic oxide film of an aluminum material or an aluminum alloy material, and drying the aluminum material or the aluminum alloy material. Thereafter, the aluminum material or the aluminum alloy material and an opposite member which slides along the aluminum material or the aluminum alloy material are rubbed together, and a lubricating film is thereby formed.
    Type: Grant
    Filed: July 30, 1992
    Date of Patent: May 30, 1995
    Assignees: Mitsubishi Jukogyo Kabushiki Kaisha, Okuno Chemical Industries Co., Ltd.
    Inventors: Takeshi Hattori, Kazuhiko Inoguti, Yukio Ohyama, Yutaka Nakagishi, Masaaki Sakaguchi
  • Patent number: 5261621
    Abstract: A method and apparatus for winding a magnetic tape in which a magnetic field is applied to the magnetic tape in its width direction as it is being wound on a reel in order to even the edges of the wound tape.
    Type: Grant
    Filed: September 21, 1989
    Date of Patent: November 16, 1993
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masaaki Sakaguchi, Mitsunobu Usui
  • Patent number: 5038030
    Abstract: When a light beam is applied to a surface of a back-coated magnetic recording medium such as a long magnetic tape, the light reflected by the recording medium surface is polarized. The angle of rotation of the plane of polarization of light reflected by the magnetic layer of the recording medium is different from the angle of rotation of the plane of polarization of light reflected by the back coating layer of the recording medium. The light reflected from the surface of the recording medium is applied to a polarizer which allows only linearly polarized light that vibrates in a predetermined direction to pass through itself. Then, the intensity level of the linearly polarized light is detected to determine whether the light was reflected from the magnetic layer or the back coating layer.
    Type: Grant
    Filed: June 2, 1989
    Date of Patent: August 6, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Youichi Hayashi, Kazuo Kubota, Masaaki Sakaguchi