Patents by Inventor Masaaki SHUTO

Masaaki SHUTO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11437542
    Abstract: A method of manufacturing a light-emitting element includes condensing a laser beam inside a substrate provided with a semiconductor structure to form modified portions including first and second modified portions, including scanning the substrate along a predetermined planned cleavage line to form the first modified portions on the planned cleavage line inside the substrate and cracks generated from the first modified portions, and then scanning the substrate with a laser beam along a first predetermined imaginary line parallel to the planned cleavage line in a top view and is offset from the planned cleavage line in an in-plane direction of the substrate by a predetermined distance to perform second irradiation to form the second modified portions on the first predetermined imaginary line inside the substrate to facilitate development of the cracks generated from the first modified portions. The method then includes cleaving the substrate starting from the first modified portions.
    Type: Grant
    Filed: September 28, 2020
    Date of Patent: September 6, 2022
    Assignee: NICHIA CORPORATION
    Inventors: Kazuki Yamaguchi, Naoto Inoue, Masaaki Shuto
  • Publication number: 20210098647
    Abstract: A method of manufacturing a light-emitting element includes condensing a laser beam inside a substrate provided with a semiconductor structure to form modified portions including first and second modified portions, including scanning the substrate along a predetermined planned cleavage line to form the first modified portions on the planned cleavage line inside the substrate and cracks generated from the first modified portions, and then scanning the substrate with a laser beam along a first predetermined imaginary line parallel to the planned cleavage line in a top view and is offset from the planned cleavage line in an in-plane direction of the substrate by a predetermined distance to perform second irradiation to form the second modified portions on the first predetermined imaginary line inside the substrate to facilitate development of the cracks generated from the first modified portions. The method then includes cleaving the substrate starting from the first modified portions.
    Type: Application
    Filed: September 28, 2020
    Publication date: April 1, 2021
    Applicant: NICHIA CORPORATION
    Inventors: Kazuki YAMAGUCHI, Naoto INOUE, Masaaki SHUTO