Abstract: An electrophotographic photosensitive member having a photosensitive layer formed on a supporting member and a protective layer formed on the photosensitive layer if necessary. At least one of the photosensitive layer and the protective layer is formed of a material containing a cured resin obtained by end-reactive curing of a polycarbonate having glycidyl end groups.

Abstract: Novel polysilphenylenesiloxanes having a three-dimensional mesh structure of silphenylenesiloxane core surrounded by triorganosilyl groups, which have a good sensitivity to ionizing radiations such as deep ultraviolet rays, electron beams and X-rays, a high softening point of 400.degree. C. or more, and a good resistance to O.sub.2 -plasma etching, and exhibit a high contrast and low swelling. These polysiphenylenesiloxanes are useful as a resist material, especially a top layer resist of the bi-level resist system and an interlevel dielectric or heat-resisting protective layer. The resist material has a high resolution because of a high contrast, low swelling and high thermal resistance thereof.

Abstract: An electrophotographic apparatus is disclosed which has an electrophotographic photosensitive member and a transfer device. The photosensitive member has a conductive support and a photosensitive layer, and further has a surface layer formed of a binder resin, fluorine atom- or silicon atom-containing compound particles incompatible with the binder resin, and a fluorine atom- or silicon atom-containing compound compatible with the binder resin. In the surface layer, the proportion of fluorine atoms and silicon atoms to carbon atoms, (F+Si)/C, as measured by X-ray photoelectron spectroscopy is 0.01 to 1.0. Additionally, the transfer device is a multiple-transfer device.

Abstract: An electrophotographic photosensitive member includes an electroconductive substrate, a photosensitive layer disposed on the electroconductive substrate, and a protective layer disposed on the photosensitive layer, the protective layer containing a resin formed by polymerization of compounds each having two or more ion polymerizable functional groups, and electroconductive particles.

Abstract: An electrophotographic apparatus is disclosed which has an electrophotographic photosensitive member and a transfer member. The photosensitive member has a conductive support and a photosensitive layer, and further has a surface layer formed of a binder resin, fluorine atom- or silicon atom-containing compound particles incompatible with the binder resin, and a fluorine atom- or silicon atom-containing compound compatible with the binder resin. In the surface layer, the proportion of fluorine atoms and silicon atoms to carbon atoms, (F+Si)/C, as measured by X-ray photoelectron spectroscopy is 0.01 to 1.0. Additionally, the transfer member is a multiple-transfer member.

Abstract: Novel polysilphenylenesiloxanes having a three-dimensional mesh structure of silphenylenesiloxane core surrounded by triorganosilyl groups, which have a good sensitivity to ionizing radiations such as deep ultraviolet rays, electron beams and X-rays, a high softening point of 400.degree. C. or more, and a good resistance to O.sub.2 -plasma etching, and exhibit a high contrast and low swelling. These polysiphenylenesiloxanes are useful as a resist material, especially a top layer resist of the bi-level resist system and an interlevel dielectric or heat-resisting protective layer. The resist material has a high resolution because of a high contrast, low swelling and high thermal resistance thereof.