Patents by Inventor Masafumi Kitano
Masafumi Kitano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20090139397Abstract: Method for producing at low cost bellows which show high durability even when used in a quite reactive atmosphere. A method for manufacturing bellows includes the steps of: I: forming an untreated bellows from a flat base plate, the base plate including 15 to 30 wt % of Cr, 5 to 40 wt % of Ni, 0.9 to 6 wt % of Al, less than 1 wt % of Mo, less than 0.1 wt % of Mn, less than 0.1 wt % of C, less than 0.1 wt % of S, less than 0.1 wt % of P and a balance of Fe and an unavoidable impurity (relative to 100 wt % of the base plate); and II: heating the untreated bellows at a temperature of 750 to 895° C. in an atmosphere which contains water and hydrogen and in which the volume ratio of hydrogen to water (H2/H2O) is in the range of 2×103 to 1×1012, thereby forming an Al2O3 passivation film on a surface of the untreated bellows.Type: ApplicationFiled: December 3, 2008Publication date: June 4, 2009Applicants: NIPPON VALQUA INDUSTRIES, LTD., TOHOKU UNIVERSITYInventors: Tsutomu Yoshida, Tadahiro Ohmi, Yasuyuki Shirai, Masafumi Kitano
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Publication number: 20090142588Abstract: Multifunction production equipment enabling a plurality of processes in which deposition of reaction products on the inner wall of the processing chamber of equipment for producing a semiconductor or a flat-plate display, metal contamination due to corrosion of the inner wall, or the like, and fluctuation of the process due to discharged gas are suppressed, and a protective film structure for use therein. On the surface of a metal material, a first coating layer having an oxide coating of 1? thick or less formed as an underlying layer by direct oxidation of a parent material, and a second coating layer of about 200 ?m thick are formed. With such an arrangement, corrosion resistance against irradiation with ions or radicals can be imparted to a second layer protective film, and the effect of a protective layer for preventing corrosion of the surface of parent metal caused by diffusing molecules or ions into the second layer protective film can be imparted to the first layer oxide film.Type: ApplicationFiled: June 16, 2006Publication date: June 4, 2009Applicants: TOHOKU UNIVERSITY, MITSUBISHI CHEMICAL CORPORATION, NIHON CERATEC CO., LTD.Inventors: Tadahiro Ohmi, Yasuyuki Shirai, Hitoshi Morinaga, Yasuhiro Kawase, Masafumi Kitano, Fumikazu Mizutani, Makoto Ishikawa, Yukio Kishi
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Publication number: 20090101070Abstract: A member for a plasma processing apparatus, which is excellent in film-formability, durability, and reliability, is provided. On a substrate, a ceramic film having a purity not less than 98% is provided. In the ceramic film, grains constituting the film have a grain diameter not greater than 50 nm and the amount of moisture released from the film is not more than 1019 molecules/cm2.Type: ApplicationFiled: February 20, 2007Publication date: April 23, 2009Inventors: Tadahiro Ohmi, Masafumi Kitano, Yoshihumi Tsutai, Keisuke Satou, Mabito Iguchi
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Publication number: 20090038946Abstract: A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cm2 or less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.Type: ApplicationFiled: May 9, 2006Publication date: February 12, 2009Applicants: Tohoku University, Mitsubishi Chemical CorporationInventors: Tadahiro Ohmi, Yasuyuki Shirai, Hitoshi Morinaga, Yasuhiro Kawase, Masafumi Kitano, Fumikazu Mizutani, Makoto Ishikawa
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Publication number: 20090020721Abstract: The invention provides a valve and a method of operating the valve that makes it possible to reduce the diameter of the vacuum exhaustion pipings to make the facility for the vacuum exhaustion system small, which results in lower costs and shortens vacuum exhaustion time, and also which can prevent corrosion, cloggings, and seal leakages inside the piping system caused by the accumulation of substances produced by the decomposition of gas flowing through the pipings. In particular, in accordance with the present invention, an aluminum passivation is applied on the piping parts, i.e. the valve and others, that are used in the vacuum exhaustion system so as to inhibit gas decomposition caused by temperature rise at the time of baking so that components for reduction in the diameter size in the vacuum exhaustion system are provided. Thus, corrosion, cloggings and seat leakages caused by gas decomposition are prevented.Type: ApplicationFiled: September 11, 2008Publication date: January 22, 2009Applicants: Fujikin IncorporatedInventors: Tadahiro Ohmi, Nobukazu Ikeda, Michio Yamaji, Masafumi Kitano, Akihiro Morimoto
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Patent number: 7472887Abstract: The present invention provides a valve which makes it possible to reduce the diameter of the vacuum exhaustion pipings for making the facility for the vacuum exhaustion system small, as a result lowering the costs, and making the vacuum exhaustion time short, and also which can prevent the corrosions, cloggings, and seal leakages inside the piping system caused by the accumulation of substances produced by the decomposition of the gas. Specifically, the aluminum passivation is applied on the piping parts, i.e. the valve and others, used in the vacuum exhaustion system to inhibit the gas decomposition caused by the temperature rise at the time of the baking so that components for the reduction in the diameter size in the vacuum exhaustion system are provided. The corrosions, cloggings and seat leakages caused by the gas decomposition are prevented.Type: GrantFiled: February 9, 2004Date of Patent: January 6, 2009Assignee: Fujikin IncorporatedInventors: Tadahiro Ohmi, Nobukazu Ikeda, Michio Yamaji, Masafumi Kitano, Akihiro Morimoto
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Patent number: 7416165Abstract: A diaphragm valve 1 is provided with a body 2 having a flow-in passage 6, a flow-out passage 7, and a valve seat 8 formed between the passages; a diaphragm 3 installed in the body 2 and permitted to rest on and move away from the valve seat 8; and a driving means 4 installed on the body 2 to allow the diaphragm 3 to rest on and move away from the valve seat 8, wherein synthetic resin films 5 of predetermined thickness are coated on fluid-contacting parts 25 of the afore-mentioned body 2 and diaphragm 3. A diaphragm valve in accordance with the present invention prevents corrosion of the valve members caused by accumulation and adherence of substances produced by thermal decomposition, and prevents clogging caused by substances produced, and prevents seat leakage when applied in the vacuum exhaust system of a semiconductor manufacturing facility.Type: GrantFiled: February 9, 2004Date of Patent: August 26, 2008Assignees: Fujikin IncorporatedInventors: Tadahiro Ohmi, Nobukazu Ikeda, Michio Yamaji, Masafumi Kitano, Akihiro Morimoto
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Patent number: 7334769Abstract: A member for a resin molding machine wherein it has a face contacting with a molten resin, and at least a part of the face is covered with a film of an oxide of a base material of the face or a component contained in the base material. The use of the member in the molding of a resin allows the prevention of the incorporation of a contaminant associated with the deterioration of a melt of the resin into a molded article from the resin.Type: GrantFiled: February 26, 2004Date of Patent: February 26, 2008Inventors: Tadahiro Ohmi, Masafumi Kitano, Naoki Tanahashi
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Patent number: 7199147Abstract: A compound represented by the formula (1): wherein R1—X— indicates that 1 to 4 R1—X— groups are present which may be the same or different, the ring A is a saturated or unsaturated 5-membered heterocyclic ring, X is a single bond, a group represented by the formula: —N(R3)—, —O— or —S—, or the like. R1 is a hydrogen atom, a halogen atom, a nitro group, a carboxyl group, a substituted or unsubstituted alkyl group, or the like, R2 is a hydrogen atom, a halogen atom, a nitro group, a carboxyl group, a substituted or unsubstituted alkyl group, or the like, and R3 is a hydrogen atom, a substituted or unsubstituted alkyl group, or the like; a prodrug of said compound, or a pharmaceutically acceptable salt of said compound or prodrug is a useful compound as a therapeutic agent for diseases for which Rho kinase is responsible.Type: GrantFiled: June 6, 2002Date of Patent: April 3, 2007Assignee: Dainippon Sumitomo Pharma Co., Ltd.Inventors: Naonori Imazaki, Masafumi Kitano, Naohito Ohashi, Kazuki Matsui
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Publication number: 20060228571Abstract: According to the present invention, gas in which oxygen gas and krypton are mixed is introduced into a process vessel from a process gas supply source while a processing target made of an aluminum alloy in the process chamber is kept at a predetermined temperature, and plasma is generated in the process vessel by a microwave. Radical oxidation processing by an oxygen radical generated thereby is applied to a surface of the processing target, so that a dense oxide coating film with improved corrosion resistance is formed on the surface of the processing target.Type: ApplicationFiled: January 14, 2004Publication date: October 12, 2006Inventors: Tadahiro Ohmi, Yasayuki Shirai, Masafumi Kitano
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Publication number: 20060193940Abstract: A member for a resin molding machine wherein it has a face contacting with a molten resin, and at least a part of the face is covered with a film of an oxide of a base material of the face or a component contained in the base material. The use of the member in the molding of a resin allows the prevention of the incorporation of a contaminant associated with the deterioration of a melt of the resin into a molded article from the resin.Type: ApplicationFiled: February 26, 2004Publication date: August 31, 2006Inventors: Tadahiro Ohmi, Masafumi Kitano, Naoki Tanahashi
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Publication number: 20060175573Abstract: A diaphragm valve 1 is provided with a body 2 having a flow-in passage 6, a flow-out passage 7, and a valve seat 8 formed between the passages; a diaphragm 3 installed in the body 2 and permitted to rest on and move away from the valve seat 8; and a driving means 4 installed on the body 2 to allow the diaphragm 3 to rest on and move away from the valve seat 8, wherein synthetic resin films 5 of predetermined thickness are coated on fluid-contacting parts 25 of the afore-mentioned body 2 and diaphragm 3. A diaphragm valve in accordance with the present invention prevents corrosion of the valve members caused by accumulation and adherence of substances produced by thermal decomposition, and prevents clogging caused by substances produced, and prevents seat leakage when applied in the vacuum exhaust system of a semiconductor manufacturing facility.Type: ApplicationFiled: February 9, 2004Publication date: August 10, 2006Applicants: Tadahiro OHMI, Fujikin Inc.Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Michio Yamajl, Masafumi Kitano, Akihiro Morimoto
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Publication number: 20060127245Abstract: A vacuum pump having a high corrosion resistance is disclosed. A member constituting the vacuum pump is composed of aluminum or an aluminum alloy, and the surface of the member is subjected to a plasma oxidation treatment such as an oxidation treatment using oxygen radicals, so that a dense and smooth aluminum oxide coating film is formed thereon.Type: ApplicationFiled: March 5, 2004Publication date: June 15, 2006Inventors: Tadahiro Ohmi, Yasuyuki Shirai, Masafumi Kitano
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Publication number: 20060071192Abstract: The present invention provides a valve which makes it possible to reduce the diameter of the vacuum exhaustion pipings for making the facility for the vacuum exhaustion system small, as a result lowering the costs, and making the vacuum exhaustion time short, and also which can prevent the corrosions, cloggings, and seal leakages inside the piping system caused by the accumulation of substances produced by the decomposition of the gas. Specifically, the aluminum passivation is applied on the piping parts, i.e. the valve and others, used in the vacuum exhaustion system to inhibit the gas decomposition caused by the temperature rise at the time of the baking so that components for the reduction in the diameter size in the vacuum exhaustion system are provided. The corrosions, cloggings and seat leakages caused by the gas decomposition are prevented.Type: ApplicationFiled: February 9, 2004Publication date: April 6, 2006Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Michio Yamaji, Masafumi Kitano, Akhiro Morimoto
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Publication number: 20050182040Abstract: A compound represented by formula (1): wherein X is a single bond or a substituted or unsubstituted lower alkylene group; Z is a saturated or unsaturated monocyclic hydrocarbon ring group or the like; and each of R1, R2, R3 and R4, which may be the same or different, is a hydrogen atom, a halogen atom, a nitro group, a cyano group, a carboxyl group, a substituted or unsubstituted alkyl group, or the like, a prodrug of said compound, or a pharmaceutically acceptable salt of said compound or prodrug has inhibitory effect on Rho kinase and hence is useful for treating diseases which are such that morbidity due to them is expected to be improved by inhibition of Rho kinase and secondary effects such as inhibition of the Na+/H+ exchange transport system caused by the Rho kinase inhibition, for example, hypertension.Type: ApplicationFiled: March 28, 2003Publication date: August 18, 2005Inventors: Naonori Imazaki, Masafumi Kitano, Tatsuya Fujibayashi, Shigehiro Asano
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Publication number: 20050157834Abstract: A barrier film which has uniform thickness and excellent adhesiveness to the base material and superbly functions to protect a platinum film can be formed on the inner wall surface of a moisture-generating reactor at ease and at a low cost. The moisture-generating reactor in which hydrogen and oxygen are reacted to generate moisture without high temperature combustion is made of an alloy containing aluminum. A principally aluminum oxide (Al2O3)-composed barrier film is formed by applying an aluminum selective oxidation treatment on the inner wall surface of the moisture-generating reactor, and thereafter a platinum film is stacked on and stuck to the barrier film so that a platinum coating catalyst layer is formed.Type: ApplicationFiled: October 14, 2003Publication date: July 21, 2005Applicant: Fujikin IncorporatedInventors: Tadahiro Ohmi, Nobukazu Ikeda, Akihiro Morimoto, Masafumi Kitano, Yukio Minami, Koji Kawada
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Publication number: 20040138286Abstract: A compound represented by the formula (1): 1Type: ApplicationFiled: December 12, 2003Publication date: July 15, 2004Inventors: Naonori Imazaki, Masafumi Kitano, Naohito Ohashi, Kazuki Matsui