Abstract: The present invention establishes a molecular therapy for glycogen storage disease type Ia. The present invention provides an oligonucleotide of 15-30 bases comprising a nucleotide sequence complementary to die cDNA of G6PC gene with c.648G>T mutation, wherein the oligonucleotide comprises a sequence complementary to a region comprising any site between the 82nd to the 92nd nucleotide from the 5? end of exon 5 of the G6PC gene with c.648C>T mutation, a pharmacologically acceptable salt or solvate thereof. Also provided is a pharmaceutical drug comprising the oligonucleotide, a pharmacologically acceptable salt or solvate thereof (e.g., therapeutic drug for glycogen storage disease type Ia).

Abstract: A plasma CVD apparatus is provided. The plasma CVD apparatus includes: a chamber forming a plasma space; and a power introduction terminal arranged in a terminal insertion hole that extends through a wall of the chamber. The power introduction terminal includes an insulator having a through hole and a rod-like electrical conductor inserted in the through hole. One end of the conductor is arranged in the chamber and the other end of the conductor is electrically connected to a power source that supplies power into the chamber. A gap between an inner wall of the insulator and the rod-like electrical conductor is less than 2 mm. A distance from one end of the insulator, which is arranged in the plasma space inside the chamber, to a contact point between the insulator and the conductor is greater than 10 mm.

Abstract: An amorphous carbon film contains carbon as a main component, not more than 30 at. % of hydrogen, not more than 20 at. % of nitrogen and not more than 3 at. % of oxygen (all excluding 0 at. %), and when the total amount of the carbon is taken as 100 at. %, the amount of carbon having an sp2 hybrid orbital is not less than 70 at. % and less than 100 at. %. Nitrogen and oxygen are concentrated on a surface side of the film and when detected from a surface layer by X-ray photoelectron spectroscopy, oxygen content ratio is not less than 4 at. % and not more than 15 at. % and nitrogen content ratio is not less than 10 at. % and not more than 30 at. %.

Abstract: A manufacturing method of a fuel cell separator is provided, whereby the adhesion of a carbon film against a titanium base substrate can be improved and favorable corrosion resistance can be obtained at the same time. A fuel cell separator having such improved adhesion and favorable corrosion resistance is also provided. The method for manufacturing a fuel cell separator according to an embodiment of the invention includes the steps of: forming a TiOx (1<x<2) layer 42 on a titanium base substrate 40; and forming a carbon film 44 on the TiOx layer 42 by plasma CVD so that a binder layer 43 including Ti, O and C is formed between the TiOx layer 42 and the carbon film 44.

Abstract: A manufacturing method of a separator for a fuel cell is a method for forming a carbon coating film on a titanium substrate, which has a titanium oxide layer on a surface of the titanium substrate, by CVD. The method includes a step of making a state in which the titanium substrate, which has the titanium oxide layer on the surface of the titanium substrate, is placed into a vacuum atmosphere, an irradiation step of irradiating a surface of the titanium oxide layer of the titanium substrate with light having a wavelength of equal to or shorter than 390 nm before the carbon coating film is formed or while the carbon coating film is being formed, and a step of forming the carbon coating film on the surface of the titanium oxide layer that is irradiated with light in the irradiation step.

Abstract: A plasma apparatus configured to form a film on or etch a work piece includes: a vacuum chamber including a first casing that has a first recess and a first flat part disposed around the first recess, and a second casing disposed opposite to the first casing; an insulating member that is disposed between the first flat part of the first casing and the second casing, and is configured to contact with the work piece in a state where the work piece faces a space inside the first recess and is separated from the first flat part; and an electricity application unit that is configured to apply electricity to the work piece, wherein a distance between the first flat part and a contact point between the work piece and the insulating member is shorter than a distance between the work piece and a bottom part of the first recess.

Abstract: The present invention provides a plasma CVD apparatus capable of suppressing abnormal electrical discharge even when a high voltage is used.

Abstract: A manufacturing method of a fuel cell separator is provided, whereby the adhesion of a carbon film against a titanium base substrate can be improved and favorable corrosion resistance can be obtained at the same time. A fuel cell separator having such improved adhesion and favorable corrosion resistance is also provided. The method for manufacturing a fuel cell separator according to an embodiment of the invention includes the steps of: forming a TiOx (1<x<2) layer 42 on a titanium base substrate 40; and forming a carbon film 44 on the TiOx layer 42 by plasma CVD so that a binder layer 43 including Ti, O and C is formed between the TiOx layer 42 and the carbon film 44.

Abstract: A fuel cell separator includes an electrically-conductive base substrate and a carbon film formed on the base substrate. The carbon film includes a first layer formed closest to the base substrate, and a second layer formed farthest from the base substrate. A diameter of carbon particles included in the first layer is 19 nm or less, and is smaller than a diameter of carbon particles included in a layer of the carbon film other than the first layer, and a diameter of the carbon particles included in the second layer is 40 nm or less.

Abstract: A manufacturing method of a separator for a fuel cell is a method for forming a carbon coating film on a titanium substrate, which has a titanium oxide layer on a surface of the titanium substrate, by CVD. The method includes a step of making a state in which the titanium substrate, which has the titanium oxide layer on the surface of the titanium substrate, is placed into a vacuum atmosphere, an irradiation step of irradiating a surface of the titanium oxide layer of the titanium substrate with light having a wavelength of equal to or shorter than 390 nm before the carbon coating film is formed or while the carbon coating film is being formed, and a step of forming the carbon coating film on the surface of the titanium oxide layer that is irradiated with light in the irradiation step.

Abstract: A bipolar plate for a fuel cell comprises a substrate formed of stainless steel; an oriented amorphous carbon film formed at least on a surface of the substrate facing an electrode, and containing C as a main component, 3 to 20 at. % of N, and more than 0 at. % and not more than 20 at. % of H, and when the total amount of the C is taken as 100 at. %, the amount of C having an sp2 hybrid orbital (Csp2) being not less than 70 at. % and less than 100 at. %, and (002) planes of graphite being oriented along a thickness direction; a mixed layer generated in an interface between the substrate and the oriented amorphous carbon film and containing at least one kind of constituent atoms of each of the substrate and the oriented amorphous carbon film; and a plurality of projections protruding from the mixed layer into the oriented amorphous carbon film and having a mean length of 10 to 150 nm.

Abstract: An amorphous carbon film contains carbon as a main component, not more than 30 at. % of hydrogen, not more than 20 at. % of nitrogen and not more than 3 at. % of oxygen (all excluding 0 at. %), and when the total amount of the carbon is taken as 100 at. %, the amount of carbon having an sp2 hybrid orbital is not less than 70 at. % and less than 100 at. %. Nitrogen and oxygen are concentrated on a surface side of the film and when detected from a surface layer by X-ray photoelectron spectroscopy, oxygen content ratio is not less than 4 at. % and not more than 15 at. % and nitrogen content ratio is not less than 10 at. % and not more than 30 at. %. The amorphous carbon film attains both electric conductivity and hydrophilicity and exhibits suitable surface characteristics to a fuel cell bipolar plate, etc.

Abstract: This invention adopts plasma-enhanced chemical vapor deposition using the apparatus including a chamber, a pair of rotary electrode reels including a feed-out reel and a take-up reel, a plasma source, a material gas supplier, and an exhaust unit, and includes applying a negative voltage applied to the rotary electrode reels from the plasma source while a conductive substrate is fed-out from the feed-out reel and is wound on the take-up reel so that the entire surface of the substrate portion between reels contacts the material gas, whereby plasma sheath is formed along the surface of the substrate portion between reels, and the material gas is activated in the plasma sheath and thus contacts the surface of the substrate, thus forming the film on the surface of the substrate.

Abstract: A bipolar plate for a fuel cell comprises a substrate formed of stainless steel; an oriented amorphous carbon film formed at least on a surface of the substrate facing an electrode, and containing C as a main component, 3 to 20 at. % of N, and more than 0 at. % and not more than 20 at. % of H, and when the total amount of the C is taken as 100 at. %, the amount of C having an sp2 hybrid orbital (Csp2) being not less than 70 at. % and less than 100 at. %, and (002) planes of graphite being oriented along a thickness direction; a mixed layer generated in an interface between the substrate and the oriented amorphous carbon film and containing at least one kind of constituent atoms of each of the substrate and the oriented amorphous carbon film; and a plurality of projections protruding from the mixed layer into the oriented amorphous carbon film and having a mean length of 10 to 150 nm.

Abstract: This invention adopts plasma-enhanced chemical vapor deposition using the apparatus including a chamber, a pair of rotary electrode reels including a feed-out reel and a take-up reel, a plasma source, a material gas supplier, and an exhaust unit, and includes applying a negative voltage applied to the rotary electrode reels from the plasma source while a conductive substrate is fed-out from the feed-out reel and is wound on the take-up reel so that the entire surface of the substrate portion between reels contacts the material gas, whereby plasma sheath is formed along the surface of the substrate portion between reels, and the material gas is activated in the plasma sheath and thus contacts the surface of the substrate, thus forming the film on the surface of the substrate.