Patents by Inventor Masaharu Tanabe
Masaharu Tanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240132147Abstract: A vehicle power supply system includes a power source control device that executes a process of switching a connection state of a driving circuit to the main power source and an auxiliary power source including; a process of switching the connection state so as to transition to a backup state as a voltage decrease of the main power source occurs, and a process of switching the connection state so as to transition to a normal state as the voltage decrease of the main power source is resolved. After a voltage decrease of the main power source occurs, a turning-side control device of a steering control unit sets an output-limited state for a turning-side motor. The output-limited state is canceled upon the power source control device completing switching of the connection state so as to transition.Type: ApplicationFiled: October 11, 2023Publication date: April 25, 2024Applicants: JTEKT CORPORATION, TOYOTA JIDOSHA KABUSHIKI KAISHA, DENSO CORPORATIONInventors: Yuuta KAJISAWA, Yuji FUJITA, Yugo NAGASHIMA, Kazuma HASEGAWA, Takashi KOUDAI, Kaishi MONOBE, Kenichi ABE, Masaharu YAMASHITA, Shintaro TAKAYAMA, Kazuaki IIDA, Yasushi HORA, Yosuke YAMASHITA, Hiroki TOMIZAWA, Nobuyori NAKAJIMA, Hayaki TANABE, Toyohiro HAYASHI, Takeshi IWANA
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Patent number: 11961710Abstract: A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, an impedance matching circuit, a first power supply connected to the balun via the impedance matching circuit, and configured to supply a high frequency to the first electrode via the impedance matching circuit and the balun, a low-pass filter, and a second power supply configured to supply a voltage to the first electrode via the low-pass filter.Type: GrantFiled: December 19, 2019Date of Patent: April 16, 2024Assignee: CANON ANELVA CORPORATIONInventors: Tadashi Inoue, Masaharu Tanabe, Kazunari Sekiya, Hiroshi Sasamoto, Tatsunori Sato, Nobuaki Tsuchiya
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Patent number: 11784030Abstract: A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, and a ground electrode arranged in the vacuum container and grounded.Type: GrantFiled: September 15, 2022Date of Patent: October 10, 2023Assignee: CANON ANELVA CORPORATIONInventors: Atsushi Takeda, Takayuki Moriwaki, Tadashi Inoue, Masaharu Tanabe, Kazunari Sekiya, Hiroshi Sasamoto, Tatsunori Sato, Nobuaki Tsuchiya
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Patent number: 11756773Abstract: A plasma processing apparatus includes a balun having a first input terminal, a second input terminal, a first output terminal, and a second output terminal, a vacuum container, a first electrode electrically connected to the first output terminal, a second electrode electrically connected to the second output terminal, and a connection unit configured to electrically connect the vacuum container and ground, the connection unit including an inductor.Type: GrantFiled: October 28, 2021Date of Patent: September 12, 2023Assignee: CANON ANELVA CORPORATIONInventors: Kazunari Sekiya, Masaharu Tanabe, Tadashi Inoue, Hiroshi Sasamoto, Tatsunori Sato, Nobuaki Tsuchiya
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Patent number: 11626270Abstract: A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, and a second electrode electrically connected to the second balanced terminal. When Rp represents a resistance component between the first balanced terminal and the second balanced terminal when viewing a side of the first electrode and the second electrode from a side of the first balanced terminal and the second balanced terminal, and X represents an inductance between the first unbalanced terminal and the first balanced terminal, 1.5?X/Rp?5000 is satisfied.Type: GrantFiled: December 19, 2019Date of Patent: April 11, 2023Assignee: CANON ANELVA CORPORATIONInventors: Tadashi Inoue, Masaharu Tanabe, Kazunari Sekiya, Hiroshi Sasamoto, Tatsunori Sato, Nobuaki Tsuchiya
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Patent number: 11600466Abstract: A plasma processing apparatus includes an impedance matching circuit, a balun having a first unbalanced terminal connected to the impedance matching circuit, a grounded second unbalanced terminal, a first balanced terminal and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, an adjustment reactance configured to affect a relationship between a first voltage applied to the first electrode and a second voltage applied to the second electrode, a high-frequency power supply configured to supply a high frequency between the first unbalanced terminal and the second unbalanced terminal via the impedance matching circuit, and a controller configured to control an impedance of the impedance matching circuit and a reactance of the adjustment reactance.Type: GrantFiled: September 17, 2020Date of Patent: March 7, 2023Assignee: CANON ANELVA CORPORATIONInventors: Masaharu Tanabe, Kazunari Sekiya, Tadashi Inoue, Hiroshi Sasamoto, Tatsunori Sato, Nobuaki Tsuchiya, Atsushi Takeda
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Patent number: 11600469Abstract: A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, and a ground electrode arranged in the vacuum container and grounded.Type: GrantFiled: December 19, 2019Date of Patent: March 7, 2023Assignee: CANON ANELVA CORPORATIONInventors: Atsushi Takeda, Takayuki Moriwaki, Tadashi Inoue, Masaharu Tanabe, Kazunari Sekiya, Hiroshi Sasamoto, Tatsunori Sato, Nobuaki Tsuchiya
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Patent number: 11569070Abstract: A plasma processing apparatus includes a balun having a first input terminal, a second input terminal, a first output terminal, and a second output terminal, a vacuum container, a first electrode electrically connected to the first output terminal, a second electrode electrically connected to the second output terminal, and a connection unit configured to electrically connect the vacuum container and ground, the connection unit including an inductor.Type: GrantFiled: December 19, 2019Date of Patent: January 31, 2023Assignee: CANON ANELVA CORPORATIONInventors: Kazunari Sekiya, Masaharu Tanabe, Tadashi Inoue, Hiroshi Sasamoto, Tatsunori Sato, Nobuaki Tsuchiya
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Publication number: 20230005721Abstract: A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, and a ground electrode arranged in the vacuum container and grounded.Type: ApplicationFiled: September 15, 2022Publication date: January 5, 2023Applicant: Canon Anelva CorporationInventors: Atsushi TAKEDA, Takayuki MORIWAKI, Tadashi INOUE, Masaharu TANABE, Kazunari SEKIYA, Hiroshi SASAMOTO, Tatsunori SATO, Nobuaki TSUCHIYA
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Patent number: 11462392Abstract: A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, and a second electrode electrically connected to the second balanced terminal. When Rp represents a resistance component between the first balanced terminal and the second balanced terminal when viewing a side of the first electrode and the second electrode from a side of the first balanced terminal and the second balanced terminal, and X represents an inductance between the first unbalanced terminal and the first balanced terminal, 1.5?X/Rp?5000 is satisfied.Type: GrantFiled: December 19, 2019Date of Patent: October 4, 2022Assignee: CANON ANELVA CORPORATIONInventors: Tadashi Inoue, Masaharu Tanabe, Kazunari Sekiya, Hiroshi Sasamoto, Tatsunori Sato, Nobuaki Tsuchiya
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Patent number: 11462391Abstract: A plasma processing apparatus includes an impedance matching circuit, a balun having a first unbalanced terminal connected to the impedance matching circuit, a grounded second unbalanced terminal, a first balanced terminal and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, an adjustment reactance configured to affect a relationship between a first voltage applied to the first electrode and a second voltage applied to the second electrode, a high-frequency power supply configured to supply a high frequency between the first unbalanced terminal and the second unbalanced terminal via the impedance matching circuit, and a controller configured to control an impedance of the impedance matching circuit and a reactance of the adjustment reactance.Type: GrantFiled: September 17, 2020Date of Patent: October 4, 2022Assignee: CANON ANELVA CORPORATIONInventors: Masaharu Tanabe, Kazunari Sekiya, Tadashi Inoue, Hiroshi Sasamoto, Tatsunori Sato, Nobuaki Tsuchiya, Atsushi Takeda
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Patent number: 11335544Abstract: A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, and a second electrode electrically connected to the second balanced terminal. When Rp represents a resistance component between the first balanced terminal and the second balanced terminal when viewing a side of the first electrode and the second electrode from a side of the first balanced terminal and the second balanced terminal, and X represents an inductance between the first unbalanced terminal and the first balanced terminal, 1.5?X/Rp?5000 is satisfied.Type: GrantFiled: December 19, 2019Date of Patent: May 17, 2022Assignee: CANON ANELVA CORPORATIONInventors: Tadashi Inoue, Masaharu Tanabe, Kazunari Sekiya, Hiroshi Sasamoto, Tatsunori Sato, Nobuaki Tsuchiya
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Patent number: 11335541Abstract: A plasma processing apparatus includes an impedance matching circuit, a balun having a first unbalanced terminal connected to the impedance matching circuit, a grounded second unbalanced terminal, a first balanced terminal and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, an adjustment reactance configured to affect a relationship between a first voltage applied to the first electrode and a second voltage applied to the second electrode, a high-frequency power supply configured to supply a high frequency between the first unbalanced terminal and the second unbalanced terminal via the impedance matching circuit, and a controller configured to control an impedance of the impedance matching circuit and a reactance of the adjustment reactance.Type: GrantFiled: September 17, 2020Date of Patent: May 17, 2022Assignee: CANON ANELVA CORPORATIONInventors: Masaharu Tanabe, Kazunari Sekiya, Tadashi Inoue, Hiroshi Sasamoto, Tatsunori Sato, Nobuaki Tsuchiya, Atsushi Takeda
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Publication number: 20220051878Abstract: A plasma processing apparatus includes a balun having a first input terminal, a second input terminal, a first output terminal, and a second output terminal, a vacuum container, a first electrode electrically connected to the first output terminal, a second electrode electrically connected to the second output terminal, and a connection unit configured to electrically connect the vacuum container and ground, the connection unit including an inductor.Type: ApplicationFiled: October 28, 2021Publication date: February 17, 2022Applicant: Canon Anelva CorporationInventors: Kazunari SEKIYA, Masaharu TANABE, Tadashi INOUE, Hiroshi SASAMOTO, Tatsunori SATO, Nobuaki TSUCHIYA
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Publication number: 20210005429Abstract: A plasma processing apparatus includes an impedance matching circuit, a balun having a first unbalanced terminal connected to the impedance matching circuit, a grounded second unbalanced terminal, a first balanced terminal and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, an adjustment reactance configured to affect a relationship between a first voltage applied to the first electrode and a second voltage applied to the second electrode, a high-frequency power supply configured to supply a high frequency between the first unbalanced terminal and the second unbalanced terminal via the impedance matching circuit, and a controller configured to control an impedance of the impedance matching circuit and a reactance of the adjustment reactance.Type: ApplicationFiled: September 17, 2020Publication date: January 7, 2021Applicant: Canon Anelva CorporationInventors: Masaharu TANABE, Kazunari SEKIYA, Tadashi INOUE, Hiroshi SASAMOTO, Tatsunori SATO, Nobuaki TSUCHIYA, Atsushi TAKEDA
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Publication number: 20200126766Abstract: A plasma processing apparatus includes a balun having a first input terminal, a second input terminal, a first output terminal, and a second output terminal, a vacuum container, a first electrode electrically connected to the first output terminal, a second electrode electrically connected to the second output terminal, and a connection unit configured to electrically connect the vacuum container and ground, the connection unit including an inductor.Type: ApplicationFiled: December 19, 2019Publication date: April 23, 2020Applicant: Canon Anelva CorporationInventors: Kazunari SEKIYA, Masaharu TANABE, Tadashi INOUE, Hiroshi SASAMOTO, Tatsunori SATO, Nobuaki TSUCHIYA
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Publication number: 20200126763Abstract: A plasma processing apparatus includes a balun having a first input terminal, a second input terminal, a first output terminal, and a second output terminal, a vacuum container, a first electrode insulated from the vacuum container and electrically connected to the first output terminal, and a second electrode insulated from the vacuum container and electrically connected to the second output terminal. The second electrode is arranged to surround an entire circumference of the first electrode.Type: ApplicationFiled: December 19, 2019Publication date: April 23, 2020Applicant: Canon Anelva CorporationInventors: Kazunari SEKIYA, Masaharu TANABE, Tadashi INOUE, Hiroshi SASAMOTO, Tatsunori SATO, Nobuaki TSUCHIYA
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Publication number: 20200126768Abstract: A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, and a second electrode electrically connected to the second balanced terminal. When Rp represents a resistance component between the first balanced terminal and the second balanced terminal when viewing a side of the first electrode and the second electrode from a side of the first balanced terminal and the second balanced terminal, and X represents an inductance between the first unbalanced terminal and the first balanced terminal, 1.5?X/Rp?5000 is satisfied.Type: ApplicationFiled: December 19, 2019Publication date: April 23, 2020Applicant: Canon Anelva CorporationInventors: Tadashi INOUE, Masaharu TANABE, Kazunari SEKIYA, Hiroshi SASAMOTO, Tatsunori SATO, Nobuaki TSUCHIYA
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Publication number: 20200126767Abstract: A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, and a ground electrode arranged in the vacuum container and grounded.Type: ApplicationFiled: December 19, 2019Publication date: April 23, 2020Applicant: Canon Anelva CorporationInventors: Atsushi TAKEDA, Takayuki MORIWAKI, Tadashi INOUE, Masaharu TANABE, Kazunari SEKIYA, Hiroshi SASAMOTO, Tatsunori SATO, Nobuaki TSUCHIYA
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Publication number: 20200126764Abstract: A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, an impedance matching circuit, a first power supply connected to the balun via the impedance matching circuit, and configured to supply a high frequency to the first electrode via the impedance matching circuit and the balun, a low-pass filter, and a second power supply configured to supply a voltage to the first electrode via the low-pass filter.Type: ApplicationFiled: December 19, 2019Publication date: April 23, 2020Applicant: Canon Anelva CorporationInventors: Tadashi INOUE, Masaharu TANABE, Kazunari SEKIYA, Hiroshi SASAMOTO, Tatsunori SATO, Nobuaki TSUCHIYA