Patents by Inventor Masahiro Horibe
Masahiro Horibe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240012026Abstract: A determination method according to the present application includes: (A) a step for measuring, at a plurality of frequencies, an S-parameter at the current probe location or in the current coaxial connector or waveguide connection state; (B) a step for calculating a coefficient matrix for fitting a prescribed function matrix to the measured S-parameter frequency properties; (C) a step for calculating a first local outlier factor on the basis of the calculated coefficient matrix; and (D) a determination step for determining, on the basis of the relationship between a threshold and the calculated first local outlier factor, whether a first state in which the probe is contacting the prescribed target, or a second state in which there is a connection failure between the coaxial connector or the waveguide and the prescribed target exists.Type: ApplicationFiled: November 11, 2021Publication date: January 11, 2024Applicant: National Institute of Advanced Industrial Science and TechnologyInventors: Ryo Sakamaki, Masahiro Horibe
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Patent number: 11796439Abstract: A uniformity output device for outputting a uniformity of particles in a slurry, in which an insoluble solid matter is mixed in liquid, includes: a pair of electrodes configured to apply AC voltage to the slurry; a measurement unit configured to measure impedance of the slurry on the basis of the response current flowing through the slurry when AC voltage with changing frequency is applied to the slurry; and a processing unit configured to determine the uniformity by executing a particle equivalent circuit analysis with a parallel circuit formed of a resistor and a capacitor as an element on the basis of the impedance measured by the measurement unit in accordance with the frequency.Type: GrantFiled: January 22, 2021Date of Patent: October 24, 2023Assignees: HIOKI E.E. CORPORATION, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGYInventors: Akihiro Shioiri, Naoto Nakayama, Yuki Kawamuro, Masahiro Horibe
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Patent number: 11152678Abstract: The invention provides a connector-attached dielectric waveguide that allows the dielectric waveguide to be easily connectable with an opposite component and is capable of forming a connection structure exhibiting low transmission and return losses of a high frequency signal. The connector-attached dielectric waveguide includes a dielectric waveguide and a connector. The dielectric waveguide includes a dielectric waveguide body and a dielectric waveguide end. The dielectric waveguide end has a smaller cross-sectional area than the dielectric waveguide body.Type: GrantFiled: May 18, 2018Date of Patent: October 19, 2021Assignees: DAIKIN INDUSTRIES, LTD., NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGYInventors: Hiroyuki Yoshimoto, Dai Fukami, Taku Yamanaka, Tomohiro Ikeda, Masahiro Horibe, Yuto Kato
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Patent number: 11131699Abstract: A method that includes changing a probe angle with respect to the conductor surface of a substrate that has a flat conductor surface mounted on the mounting surface of a stage in a high-frequency test system, thereby changing the state of contact of the tip of a signal terminal and tip of a ground terminal with the conductor surface, outputting high-frequency signals from the signal terminal to the conductor surface and receiving reflected signals using the probe to find S-parameters at different probe angles, and determining, based on a plurality of the S-parameters, a reference probe angle at which the reference line formed connecting the tip of the signal terminal and tip of the ground terminal is parallel with the conductor surface.Type: GrantFiled: September 7, 2018Date of Patent: September 28, 2021Assignee: NATIONAL INSTITUTE OF ADVANCED SCIENCE AND TECHNOLOGYInventors: Ryo Sakamaki, Masahiro Horibe
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Publication number: 20210231549Abstract: A uniformity output device for outputting a uniformity of particles in a slurry, in which an insoluble solid matter is mixed in liquid, includes: a pair of electrodes configured to apply AC voltage to the slurry; a measurement unit configured to measure impedance of the slurry on the basis of the response current flowing through the slurry when AC voltage with changing frequency is applied to the slurry; and a processing unit configured to determine the uniformity by executing a particle equivalent circuit analysis with a parallel circuit formed of a resistor and a capacitor as an element on the basis of the impedance measured by the measurement unit in accordance with the frequency.Type: ApplicationFiled: January 22, 2021Publication date: July 29, 2021Inventors: Akihiro SHIOIRI, Naoto NAKAYAMA, Yuki KAWAMURO, Masahiro HORIBE
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Patent number: 10944146Abstract: The invention provides a dielectric waveguide for transmitting millimeter waves or sub-millimeter waves. The dielectric waveguide is easily processed and connected even when having a small diameter, and can provide a connection structure exhibiting low transmission and return losses of high frequency signals. The dielectric waveguide includes a dielectric waveguide body and a dielectric waveguide end having a lower permittivity than the dielectric waveguide body. The dielectric waveguide body and the dielectric waveguide end are seamlessly and monolithically formed from the same material.Type: GrantFiled: September 29, 2017Date of Patent: March 9, 2021Assignees: DAIKIN INDUSTRIES, LTD., NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGYInventors: Hiroyuki Yoshimoto, Dai Fukami, Taku Yamanaka, Masahiro Horibe, Yuto Kato, Ryo Sakamaki
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Publication number: 20200233022Abstract: A method that includes changing a probe angle with respect to the conductor surface of a substrate that has a flat conductor surface mounted on the mounting surface of a stage in a high-frequency test system, thereby changing the state of contact of the tip of a signal terminal and tip of a ground terminal with the conductor surface, outputting high-frequency signals from the signal terminal to the conductor surface and receiving reflected signals using the probe to find S-parameters at different probe angles, and determining, based on a plurality of the S-parameters, a reference probe angle at which the reference line formed connecting the tip of the signal terminal and tip of the ground terminal is parallel with the conductor surface.Type: ApplicationFiled: September 7, 2018Publication date: July 23, 2020Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGYInventors: Ryo SAKAMAKI, Masahiro HORIBE
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Publication number: 20200083578Abstract: The invention provides a connector-attached dielectric waveguide that allows the dielectric waveguide to be easily connectable with an opposite component and is capable of forming a connection structure exhibiting low transmission and return losses of a high frequency signal. The connector-attached dielectric waveguide includes a dielectric waveguide and a connector. The dielectric waveguide includes a dielectric waveguide body and a dielectric waveguide end. The dielectric waveguide end has a smaller cross-sectional area than the dielectric waveguide body.Type: ApplicationFiled: May 18, 2018Publication date: March 12, 2020Applicants: DAIKIN INDUSTRIES, LTD., NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGYInventors: Hiroyuki YOSHIMOTO, Dai FUKAMI, Taku YAMANAKA, Tomohiro IKEDA, Masahiro HORIBE, Yuto KATO
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Publication number: 20200036074Abstract: The invention provides a dielectric waveguide for transmitting millimeter waves or sub-millimeter waves. The dielectric waveguide is easily processed and connected even when having a small diameter, and can provide a connection structure exhibiting low transmission and return losses of high frequency signals. The dielectric waveguide includes a dielectric waveguide body and a dielectric waveguide end having a lower permittivity than the dielectric waveguide body. The dielectric waveguide body and the dielectric waveguide end are seamlessly and monolithically formed from the same material.Type: ApplicationFiled: September 29, 2017Publication date: January 30, 2020Applicants: DAIKIN INDUSTRIES, LTD., NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGYInventors: Hiroyuki YOSHIMOTO, Dai FUKAMI, Taku YAMANAKA, Masahiro HORIBE, Yuto KATO, Ryo SAKAMAKI
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Patent number: 7948081Abstract: A semiconductor device uses a carbon nanotube structure, which reduces an electric resistance and a thermal resistance by increasing a density of the carbon nanotubes. An insulation film covers a first electrically conductive material. A second electrically conductive material is provided on the insulation film. A plurality of carbon nanotubes extend through the insulation film by being filled in an opening part that exposes the first electrically conductive material. The carbon nanotubes electrically connect the first electrically conductive material and the second electrically conductive material to each other. Ends of the carbon nanotubes are fixed to a recessed part provided on a surface of the first electrically conductive material.Type: GrantFiled: January 25, 2005Date of Patent: May 24, 2011Assignee: Fujitsu LimitedInventors: Akio Kawabata, Mizuhisa Nihei, Masahiro Horibe
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Patent number: 7786487Abstract: Disclosed is a semiconductor device including a SiC substrate and a heat conductor formed in a hole in the SiC substrate and made of a linear structure of carbon elements.Type: GrantFiled: March 10, 2004Date of Patent: August 31, 2010Assignee: Fujitsu LimitedInventors: Mizuhisa Nihei, Masahiro Horibe, Yuji Awano, Kazukiyo Joshin
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Patent number: 7417320Abstract: A Ti film is pattern-formed on a desired portion on a silicon substrate, and a Co film is formed on the substrate so as to cover the Ti film. CNTs are formed only on a portion, under which the Ti film is formed, of the surface of the Co film at approximately 600° C. by a thermal CVD method. The length of the CNT can be controlled by adjusting the thickness of the Ti film.Type: GrantFiled: July 14, 2005Date of Patent: August 26, 2008Assignee: Fujitsu LimitedInventors: Akio Kawabata, Mizuhisa Nihei, Masahiro Horibe, Shintaro Sato, Daiyu Kondo, Yuji Awano
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Publication number: 20080105982Abstract: A method of manufacturing a semiconductor device having an interconnection part formed of multiple carbon nanotubes is disclosed. The method includes the steps of (a) forming a growth mode control layer controlling the growth mode of the carbon nanotubes, (b) forming a catalyst layer on the growth mode control layer, and (c) causing the carbon nanotubes to grow by heating the catalyst layer by thermal CVD so that the carbon nanotubes serve as the interconnection part. The growth mode control layer is formed by sputtering or vacuum deposition in an atmospheric gas, using a metal selected from a group of Ti, Mo, V, Nb, and W. The growth mode is controlled in accordance with a predetermined concentration of oxygen gas of the atmospheric gas.Type: ApplicationFiled: July 3, 2006Publication date: May 8, 2008Applicant: FUJITSU LIMITEDInventors: Masahiro Horibe, Akio Kawabata, Mizuhisa Nihei
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Patent number: 7368823Abstract: A method of manufacturing a semiconductor device having an interconnection part formed of multiple carbon nanotubes is disclosed. The method includes the steps of (a) forming a growth mode control layer controlling the growth mode of the carbon nanotubes, (b) forming a catalyst layer on the growth mode control layer, and (c) causing the carbon nanotubes to grow by heating the catalyst layer by thermal CVD so that the carbon nanotubes serve as the interconnection part. The growth mode control layer is formed by sputtering or vacuum deposition in an atmospheric gas, using a metal selected from a group of Ti, Mo, V, Nb, and W. The growth mode is controlled in accordance with a predetermined concentration of oxygen gas of the atmospheric gas.Type: GrantFiled: July 3, 2006Date of Patent: May 6, 2008Assignee: Fujitsu LimitedInventors: Masahiro Horibe, Akio Kawabata, Mizuhisa Nihei
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Patent number: 7323711Abstract: A high-temperature superconductive device is disclosed, including a ramp-edge junction. The ramp-edge junction includes a first electrode layer (5) that defines the size of the ramp-edge junction and a second electrode layer (6). The width of the second electrode layer (6) is greater than the width of the first electrode layer (5). The first electrode layer (5) and the second electrode layer (6) touch in part, and are separated via a first insulation layer (7) in remaining part. Because the ramp-edge junction includes the first electrode layer (5) and the second electrode layer (6), the inductance of the ramp-edge junction can be reduced with the critical current density Jc being kept at a high level.Type: GrantFiled: July 27, 2004Date of Patent: January 29, 2008Assignees: FUJITSU Limited, International Superconductivity Technology Center, the Juridical FoundationInventors: Hideo Suzuki, Masahiro Horibe, Keiichi Tanabe
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Patent number: 7300909Abstract: A first Josephson junction in a Single Flux Quantum circuit (SFQ circuit) and a second Josephson junction in an interface circuit (latch driver circuit) are formed with junction materials different from each other, and the junction materials are selected so that the hysteresis of the first Josephson junction in a current-voltage characteristic is smaller than the hysteresis of the second Josephson junction in a current-voltage characteristic.Type: GrantFiled: March 26, 2004Date of Patent: November 27, 2007Assignee: Fujitsu LimitedInventors: Tsunehiro Hato, Masahiro Horibe, Keiichi Tanabe
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Publication number: 20060290003Abstract: A Ti film is pattern-formed on a desired portion on a silicon substrate, and a Co film is formed on the substrate so as to cover the Ti film. CNTs are formed only on a portion, under which the Ti film is formed, of the surface of the Co film at approximately 600° C. by a thermal CVD method. The length of the CNT can be controlled by adjusting the thickness of the Ti film.Type: ApplicationFiled: July 14, 2005Publication date: December 28, 2006Applicant: FUJITSU LIMITEDInventors: Akio Kawabata, Mizuhisa Nihei, Masahiro Horibe, Shintaro Sato, Daiyu Kondo, Yuji Awano
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Publication number: 20060247131Abstract: At least two ramp-edge-structure Josephson junctions having different critical current densities to one another are provided on a substrate.Type: ApplicationFiled: January 13, 2006Publication date: November 2, 2006Applicants: FUJITSU LIMITED, INTERNATIONAL SUPERCONDUCTIVITY TECHNOLOGY CENTER, THE JURIDICAL FOUNDATIONInventors: Masahiro Horibe, Hideo Suzuki, Yoshihiro Ishimaru, Hironori Wakana, Keiichi Tanabe
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Patent number: 7094692Abstract: A method of manufacturing a semiconductor device having an interconnection part formed of multiple carbon nanotubes is disclosed. The method includes the steps of (a) forming a growth mode control layer controlling the growth mode of the carbon nanotubes, (b) forming a catalyst layer on the growth mode control layer, and (c) causing the carbon nanotubes to grow by heating the catalyst layer by thermal CVD so that the carbon nanotubes serve as the interconnection part. The growth mode control layer is formed by sputtering or vacuum deposition in an atmospheric gas, using a metal selected from a group of Ti, Mo, V, Nb, and W. The growth mode is controlled in accordance with a predetermined concentration of oxygen gas of the atmospheric gas.Type: GrantFiled: October 26, 2004Date of Patent: August 22, 2006Assignee: Fujitsu LimitedInventors: Masahiro Horibe, Akio Kawabata, Mizuhisa Nihei
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Patent number: 7095227Abstract: To obtain a superconducting driver circuit which can obtain an output voltage of several millvolts or above, can use a DC power source as a driving power source, can form no capacitance between it and a ground plane, and has a small occupation area, the superconducting driver circuit is constructed by superconducting flux quantum interference devices (SQUIDs) each constructing a closed loop having as components two superconducting junctions and an inductor. The SQUIDs share the inductors and are connected in series in three or more stages.Type: GrantFiled: August 5, 2003Date of Patent: August 22, 2006Assignee: International Superconductivity Technology Center, the Juridical FoundationInventors: Yoshinobu Tarutani, Masahiro Horibe, Keiichi Tanabe