Patents by Inventor Masahiro Horibe

Masahiro Horibe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240012026
    Abstract: A determination method according to the present application includes: (A) a step for measuring, at a plurality of frequencies, an S-parameter at the current probe location or in the current coaxial connector or waveguide connection state; (B) a step for calculating a coefficient matrix for fitting a prescribed function matrix to the measured S-parameter frequency properties; (C) a step for calculating a first local outlier factor on the basis of the calculated coefficient matrix; and (D) a determination step for determining, on the basis of the relationship between a threshold and the calculated first local outlier factor, whether a first state in which the probe is contacting the prescribed target, or a second state in which there is a connection failure between the coaxial connector or the waveguide and the prescribed target exists.
    Type: Application
    Filed: November 11, 2021
    Publication date: January 11, 2024
    Applicant: National Institute of Advanced Industrial Science and Technology
    Inventors: Ryo Sakamaki, Masahiro Horibe
  • Patent number: 11796439
    Abstract: A uniformity output device for outputting a uniformity of particles in a slurry, in which an insoluble solid matter is mixed in liquid, includes: a pair of electrodes configured to apply AC voltage to the slurry; a measurement unit configured to measure impedance of the slurry on the basis of the response current flowing through the slurry when AC voltage with changing frequency is applied to the slurry; and a processing unit configured to determine the uniformity by executing a particle equivalent circuit analysis with a parallel circuit formed of a resistor and a capacitor as an element on the basis of the impedance measured by the measurement unit in accordance with the frequency.
    Type: Grant
    Filed: January 22, 2021
    Date of Patent: October 24, 2023
    Assignees: HIOKI E.E. CORPORATION, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Akihiro Shioiri, Naoto Nakayama, Yuki Kawamuro, Masahiro Horibe
  • Patent number: 11152678
    Abstract: The invention provides a connector-attached dielectric waveguide that allows the dielectric waveguide to be easily connectable with an opposite component and is capable of forming a connection structure exhibiting low transmission and return losses of a high frequency signal. The connector-attached dielectric waveguide includes a dielectric waveguide and a connector. The dielectric waveguide includes a dielectric waveguide body and a dielectric waveguide end. The dielectric waveguide end has a smaller cross-sectional area than the dielectric waveguide body.
    Type: Grant
    Filed: May 18, 2018
    Date of Patent: October 19, 2021
    Assignees: DAIKIN INDUSTRIES, LTD., NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Hiroyuki Yoshimoto, Dai Fukami, Taku Yamanaka, Tomohiro Ikeda, Masahiro Horibe, Yuto Kato
  • Patent number: 11131699
    Abstract: A method that includes changing a probe angle with respect to the conductor surface of a substrate that has a flat conductor surface mounted on the mounting surface of a stage in a high-frequency test system, thereby changing the state of contact of the tip of a signal terminal and tip of a ground terminal with the conductor surface, outputting high-frequency signals from the signal terminal to the conductor surface and receiving reflected signals using the probe to find S-parameters at different probe angles, and determining, based on a plurality of the S-parameters, a reference probe angle at which the reference line formed connecting the tip of the signal terminal and tip of the ground terminal is parallel with the conductor surface.
    Type: Grant
    Filed: September 7, 2018
    Date of Patent: September 28, 2021
    Assignee: NATIONAL INSTITUTE OF ADVANCED SCIENCE AND TECHNOLOGY
    Inventors: Ryo Sakamaki, Masahiro Horibe
  • Publication number: 20210231549
    Abstract: A uniformity output device for outputting a uniformity of particles in a slurry, in which an insoluble solid matter is mixed in liquid, includes: a pair of electrodes configured to apply AC voltage to the slurry; a measurement unit configured to measure impedance of the slurry on the basis of the response current flowing through the slurry when AC voltage with changing frequency is applied to the slurry; and a processing unit configured to determine the uniformity by executing a particle equivalent circuit analysis with a parallel circuit formed of a resistor and a capacitor as an element on the basis of the impedance measured by the measurement unit in accordance with the frequency.
    Type: Application
    Filed: January 22, 2021
    Publication date: July 29, 2021
    Inventors: Akihiro SHIOIRI, Naoto NAKAYAMA, Yuki KAWAMURO, Masahiro HORIBE
  • Patent number: 10944146
    Abstract: The invention provides a dielectric waveguide for transmitting millimeter waves or sub-millimeter waves. The dielectric waveguide is easily processed and connected even when having a small diameter, and can provide a connection structure exhibiting low transmission and return losses of high frequency signals. The dielectric waveguide includes a dielectric waveguide body and a dielectric waveguide end having a lower permittivity than the dielectric waveguide body. The dielectric waveguide body and the dielectric waveguide end are seamlessly and monolithically formed from the same material.
    Type: Grant
    Filed: September 29, 2017
    Date of Patent: March 9, 2021
    Assignees: DAIKIN INDUSTRIES, LTD., NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Hiroyuki Yoshimoto, Dai Fukami, Taku Yamanaka, Masahiro Horibe, Yuto Kato, Ryo Sakamaki
  • Publication number: 20200233022
    Abstract: A method that includes changing a probe angle with respect to the conductor surface of a substrate that has a flat conductor surface mounted on the mounting surface of a stage in a high-frequency test system, thereby changing the state of contact of the tip of a signal terminal and tip of a ground terminal with the conductor surface, outputting high-frequency signals from the signal terminal to the conductor surface and receiving reflected signals using the probe to find S-parameters at different probe angles, and determining, based on a plurality of the S-parameters, a reference probe angle at which the reference line formed connecting the tip of the signal terminal and tip of the ground terminal is parallel with the conductor surface.
    Type: Application
    Filed: September 7, 2018
    Publication date: July 23, 2020
    Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Ryo SAKAMAKI, Masahiro HORIBE
  • Publication number: 20200083578
    Abstract: The invention provides a connector-attached dielectric waveguide that allows the dielectric waveguide to be easily connectable with an opposite component and is capable of forming a connection structure exhibiting low transmission and return losses of a high frequency signal. The connector-attached dielectric waveguide includes a dielectric waveguide and a connector. The dielectric waveguide includes a dielectric waveguide body and a dielectric waveguide end. The dielectric waveguide end has a smaller cross-sectional area than the dielectric waveguide body.
    Type: Application
    Filed: May 18, 2018
    Publication date: March 12, 2020
    Applicants: DAIKIN INDUSTRIES, LTD., NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Hiroyuki YOSHIMOTO, Dai FUKAMI, Taku YAMANAKA, Tomohiro IKEDA, Masahiro HORIBE, Yuto KATO
  • Publication number: 20200036074
    Abstract: The invention provides a dielectric waveguide for transmitting millimeter waves or sub-millimeter waves. The dielectric waveguide is easily processed and connected even when having a small diameter, and can provide a connection structure exhibiting low transmission and return losses of high frequency signals. The dielectric waveguide includes a dielectric waveguide body and a dielectric waveguide end having a lower permittivity than the dielectric waveguide body. The dielectric waveguide body and the dielectric waveguide end are seamlessly and monolithically formed from the same material.
    Type: Application
    Filed: September 29, 2017
    Publication date: January 30, 2020
    Applicants: DAIKIN INDUSTRIES, LTD., NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Hiroyuki YOSHIMOTO, Dai FUKAMI, Taku YAMANAKA, Masahiro HORIBE, Yuto KATO, Ryo SAKAMAKI
  • Patent number: 7948081
    Abstract: A semiconductor device uses a carbon nanotube structure, which reduces an electric resistance and a thermal resistance by increasing a density of the carbon nanotubes. An insulation film covers a first electrically conductive material. A second electrically conductive material is provided on the insulation film. A plurality of carbon nanotubes extend through the insulation film by being filled in an opening part that exposes the first electrically conductive material. The carbon nanotubes electrically connect the first electrically conductive material and the second electrically conductive material to each other. Ends of the carbon nanotubes are fixed to a recessed part provided on a surface of the first electrically conductive material.
    Type: Grant
    Filed: January 25, 2005
    Date of Patent: May 24, 2011
    Assignee: Fujitsu Limited
    Inventors: Akio Kawabata, Mizuhisa Nihei, Masahiro Horibe
  • Patent number: 7786487
    Abstract: Disclosed is a semiconductor device including a SiC substrate and a heat conductor formed in a hole in the SiC substrate and made of a linear structure of carbon elements.
    Type: Grant
    Filed: March 10, 2004
    Date of Patent: August 31, 2010
    Assignee: Fujitsu Limited
    Inventors: Mizuhisa Nihei, Masahiro Horibe, Yuji Awano, Kazukiyo Joshin
  • Patent number: 7417320
    Abstract: A Ti film is pattern-formed on a desired portion on a silicon substrate, and a Co film is formed on the substrate so as to cover the Ti film. CNTs are formed only on a portion, under which the Ti film is formed, of the surface of the Co film at approximately 600° C. by a thermal CVD method. The length of the CNT can be controlled by adjusting the thickness of the Ti film.
    Type: Grant
    Filed: July 14, 2005
    Date of Patent: August 26, 2008
    Assignee: Fujitsu Limited
    Inventors: Akio Kawabata, Mizuhisa Nihei, Masahiro Horibe, Shintaro Sato, Daiyu Kondo, Yuji Awano
  • Publication number: 20080105982
    Abstract: A method of manufacturing a semiconductor device having an interconnection part formed of multiple carbon nanotubes is disclosed. The method includes the steps of (a) forming a growth mode control layer controlling the growth mode of the carbon nanotubes, (b) forming a catalyst layer on the growth mode control layer, and (c) causing the carbon nanotubes to grow by heating the catalyst layer by thermal CVD so that the carbon nanotubes serve as the interconnection part. The growth mode control layer is formed by sputtering or vacuum deposition in an atmospheric gas, using a metal selected from a group of Ti, Mo, V, Nb, and W. The growth mode is controlled in accordance with a predetermined concentration of oxygen gas of the atmospheric gas.
    Type: Application
    Filed: July 3, 2006
    Publication date: May 8, 2008
    Applicant: FUJITSU LIMITED
    Inventors: Masahiro Horibe, Akio Kawabata, Mizuhisa Nihei
  • Patent number: 7368823
    Abstract: A method of manufacturing a semiconductor device having an interconnection part formed of multiple carbon nanotubes is disclosed. The method includes the steps of (a) forming a growth mode control layer controlling the growth mode of the carbon nanotubes, (b) forming a catalyst layer on the growth mode control layer, and (c) causing the carbon nanotubes to grow by heating the catalyst layer by thermal CVD so that the carbon nanotubes serve as the interconnection part. The growth mode control layer is formed by sputtering or vacuum deposition in an atmospheric gas, using a metal selected from a group of Ti, Mo, V, Nb, and W. The growth mode is controlled in accordance with a predetermined concentration of oxygen gas of the atmospheric gas.
    Type: Grant
    Filed: July 3, 2006
    Date of Patent: May 6, 2008
    Assignee: Fujitsu Limited
    Inventors: Masahiro Horibe, Akio Kawabata, Mizuhisa Nihei
  • Patent number: 7323711
    Abstract: A high-temperature superconductive device is disclosed, including a ramp-edge junction. The ramp-edge junction includes a first electrode layer (5) that defines the size of the ramp-edge junction and a second electrode layer (6). The width of the second electrode layer (6) is greater than the width of the first electrode layer (5). The first electrode layer (5) and the second electrode layer (6) touch in part, and are separated via a first insulation layer (7) in remaining part. Because the ramp-edge junction includes the first electrode layer (5) and the second electrode layer (6), the inductance of the ramp-edge junction can be reduced with the critical current density Jc being kept at a high level.
    Type: Grant
    Filed: July 27, 2004
    Date of Patent: January 29, 2008
    Assignees: FUJITSU Limited, International Superconductivity Technology Center, the Juridical Foundation
    Inventors: Hideo Suzuki, Masahiro Horibe, Keiichi Tanabe
  • Patent number: 7300909
    Abstract: A first Josephson junction in a Single Flux Quantum circuit (SFQ circuit) and a second Josephson junction in an interface circuit (latch driver circuit) are formed with junction materials different from each other, and the junction materials are selected so that the hysteresis of the first Josephson junction in a current-voltage characteristic is smaller than the hysteresis of the second Josephson junction in a current-voltage characteristic.
    Type: Grant
    Filed: March 26, 2004
    Date of Patent: November 27, 2007
    Assignee: Fujitsu Limited
    Inventors: Tsunehiro Hato, Masahiro Horibe, Keiichi Tanabe
  • Publication number: 20060290003
    Abstract: A Ti film is pattern-formed on a desired portion on a silicon substrate, and a Co film is formed on the substrate so as to cover the Ti film. CNTs are formed only on a portion, under which the Ti film is formed, of the surface of the Co film at approximately 600° C. by a thermal CVD method. The length of the CNT can be controlled by adjusting the thickness of the Ti film.
    Type: Application
    Filed: July 14, 2005
    Publication date: December 28, 2006
    Applicant: FUJITSU LIMITED
    Inventors: Akio Kawabata, Mizuhisa Nihei, Masahiro Horibe, Shintaro Sato, Daiyu Kondo, Yuji Awano
  • Publication number: 20060247131
    Abstract: At least two ramp-edge-structure Josephson junctions having different critical current densities to one another are provided on a substrate.
    Type: Application
    Filed: January 13, 2006
    Publication date: November 2, 2006
    Applicants: FUJITSU LIMITED, INTERNATIONAL SUPERCONDUCTIVITY TECHNOLOGY CENTER, THE JURIDICAL FOUNDATION
    Inventors: Masahiro Horibe, Hideo Suzuki, Yoshihiro Ishimaru, Hironori Wakana, Keiichi Tanabe
  • Patent number: 7094692
    Abstract: A method of manufacturing a semiconductor device having an interconnection part formed of multiple carbon nanotubes is disclosed. The method includes the steps of (a) forming a growth mode control layer controlling the growth mode of the carbon nanotubes, (b) forming a catalyst layer on the growth mode control layer, and (c) causing the carbon nanotubes to grow by heating the catalyst layer by thermal CVD so that the carbon nanotubes serve as the interconnection part. The growth mode control layer is formed by sputtering or vacuum deposition in an atmospheric gas, using a metal selected from a group of Ti, Mo, V, Nb, and W. The growth mode is controlled in accordance with a predetermined concentration of oxygen gas of the atmospheric gas.
    Type: Grant
    Filed: October 26, 2004
    Date of Patent: August 22, 2006
    Assignee: Fujitsu Limited
    Inventors: Masahiro Horibe, Akio Kawabata, Mizuhisa Nihei
  • Patent number: 7095227
    Abstract: To obtain a superconducting driver circuit which can obtain an output voltage of several millvolts or above, can use a DC power source as a driving power source, can form no capacitance between it and a ground plane, and has a small occupation area, the superconducting driver circuit is constructed by superconducting flux quantum interference devices (SQUIDs) each constructing a closed loop having as components two superconducting junctions and an inductor. The SQUIDs share the inductors and are connected in series in three or more stages.
    Type: Grant
    Filed: August 5, 2003
    Date of Patent: August 22, 2006
    Assignee: International Superconductivity Technology Center, the Juridical Foundation
    Inventors: Yoshinobu Tarutani, Masahiro Horibe, Keiichi Tanabe