Abstract: A universal silicon interposer system and method to enabling the selective use of multiple proprietary microelectronic devices without the need to substantially alter the end-use application(s). The system may be used in the implementation of three-dimensional (stacked) microelectronics having proprietary contact pin patterns.

Abstract: An improved silicon wafer transport system. More particularly, this invention relates to providing new wafer-transport apparatus having geometries configured to minimize damage to the wafer while assisting in maintaining multi-orientation positioning of the wafer during transport by the tool.

Abstract: Improved semiconductor wafer debonding system, method, and apparatus, including a stress-free means for multi-axis debonding utilizing a specialized tool or fixture having at least one ultrasonic transducer.

Abstract: A universal silicon interposer system and method to enabling the selective use of multiple proprietary microelectronic devices without the need to substantially alter the end-use application(s). The system may be used in the implementation of three-dimensional (stacked) microelectronics having proprietary contact pin patterns.

Abstract: Improved semiconductor wafer debonding system, method, and apparatus, including a stress-free means for multi-axis debonding utilizing a specialized tool or fixture having at least one ultrasonic transducer.

Abstract: An improved silicon wafer transport system. More particularly, this invention relates to providing new wafer-transport apparatus having geometries configured to minimize damage to the wafer while assisting in maintaining multi-orientation positioning of the wafer during transport by the tool.

Abstract: A film adhesion device includes a table carrying a semiconductor wafer, a pressing member (pressing roller) which presses a film (photoresist film) onto a surface side of the semiconductor wafer placed on the table, a bumper member provided on an outer peripheral side of the table and including a contact surface which is contacted by the pressing member when the pressing member presses the film, and an elevating support mechanism which supports the bumper member elevatably and positions the bumper member at a predetermined height level.

Abstract: A film adhesion device includes a table carrying a semiconductor wafer, a pressing member (pressing roller) which presses a film (photoresist film) onto a surface side of the semiconductor wafer placed on the table, a bumper member provided on an outer peripheral side of the table and including a contact surface which is contacted by the pressing member when the pressing member presses the film, and an elevating support mechanism which supports the bumper member elevatably and positions the bumper member at a predetermined height level.

Abstract: A film adhesion device includes a table carrying a semiconductor wafer, a pressing member (pressing roller) which presses a film (photoresist film) onto a surface side of the semiconductor wafer placed on the table, a bumper member provided on an outer peripheral side of the table and including a contact surface which is contacted by the pressing member when the pressing member presses the film, and an elevating support mechanism which supports the bumper member elevatably and positions the bumper member at a predetermined height level.

Abstract: Provided is a protection film bonding method and a protection film bonding apparatus that improves productivity for bonding the protection film onto one surface of a silicon wafer. A carrier film is separated from a three-layer film having a reinforcement film, and is provided on front and rear surfaces of a protection film, to provide a two-layer film. This two-layer film is bonded onto the front surface of the silicon wafer, the reinforcement film is removed from the two-layer film and the protection film is trimmed. An apparatus consists of a supply unit, separation and take-up unit that separates the carrier film from the three-layer film, an assigning and separation unit, a joint unit that joins the two-layer film onto the silicon wafer, and a peel-off unit, that removes the reinforcement film while separating it from the two-layer film.

Abstract: A trimming method and a trimmer capable of ensuring trimming a protection film which protects a silicon wafer and making a cut end of the protection film obtained by trimming neat, are provided. If a laser beam L is applied to the strip protection film 3 bonded onto the silicon wafer 1 to trim the protection film to have a predetermined size and a predetermined shape, an intake flow V such as an air curtain flow is applied to the protection film 3. A trimmer used to execute this method consists of a table 2 on which the silicon wafer 1 is mounted, an assigning and separation unit D for bonding the strip protection film 3 onto the silicon wafer 1, a laser beam unit G provided above the table for forming a cut 28 into the protection film 3 along a peripheral surface 1a of the silicon wafer 1, and an intake unit Av provided below the table for applying an intake flow V to a lower surface of the protection film 3 along the peripheral surface 1a.

Abstract: A trimming method and a trimmer capable of ensuring trimming a protection film which protects a silicon wafer and making a cut end of the protection film obtained by trimming neat, are provided.

Abstract: This invention provides a protection film bonding method and a protection film bonding apparatus, capable of improving productivity for an operation for bonding the protection film onto one surface of a silicon wafer. A carrier film 19 is separated from a three-layer film H3 having a reinforcement film 3 and the carrier film 19 provided on front and rear surfaces of a protection film 2, respectively, to provide a two-layer film H2. This two-layer film H2 is bonded onto the front surface of the silicon wafer 1, the reinforcement film 3 is peeled off from the two-layer film H2 and then the protection film 2 is trimmed.

Abstract: A method of cutting away the unnecessary portions of a masking sheet bonded to a silicon wafer during the IC manufacturing process. The method uses a laser cutting device which includes an optical fiber containing silver halide and a CCD camera to control the position of the laser focal point.

Abstract: In a tape extension device for a semiconductor producing apparatus having a vertical tension device for tensing a tape, which is withdrawn from a tape roller, in a down-web direction above a semiconductor wafer, the tape extension device in the present invention comprises a lateral tension device. The lateral tension device includes clamp means for clamping an edge of a side of the tape in a cross-web direction which tape is extended in the down-web direction by means of the vertical tension device, another clamp means for clamping another edge of the tape, and drive means for opening and closing both of the clamp means in the cross-web direction.

Abstract: A method of supporting a wafer comprising the steps of: dividing a pressure space formed between the table plate and the wafer into a first pressure space and a second pressure space by means of a pressure setting wall, setting a supporting pressure of a compressed air supplied to the first pressure space, by a throttle function of a throttle passage formed between a pressure regulating wall and the wafer, and determining a further supporting pressure of the compressed air supplied from the first pressure space to the second pressure space through the throttle passage, by a throttle function of a throttle opening for connecting the second pressure space with the atmosphere. A wafer supporting apparatus for carrying out the method and a wafer mounter having the apparatus.

Abstract: A method of cutting off a masking film of a silicon wafer comprising the steps of rotating the silicon wafer, feeding a heat wire continuously to the outer periphery of the silicon wafer and cutting off the outer periphery of the masking film along the outer perphery of the silicon wafer.