Abstract: A secondary battery according to an embodiment includes an exterior material including an opening portion and including a bottom, a wound electrode group housed in the exterior material in order for an insertion direction to be perpendicular to a winding axis, and a lid attached to the opening portion of the exterior material and including at least a plate-like member, a positive electrode terminal, and a negative electrode terminal. When a minimum distance between the lid and the wound electrode group is AMIN, 0.5 mm<AMIN<2.0 mm is satisfied.

Abstract: A film deposition method is provided for filling a recessed pattern formed in a surface of a substrate with a film. In the method, an adsorption blocking group is formed by adsorbing chlorine gas activated by plasma on a top surface of the substrate and an upper portion of the recessed pattern. A source gas that contains one of silicon and a metal, and chlorine, is adsorbed on a lower portion of the recessed pattern where the adsorption blocking group is not formed, by supplying the source gas to the surface of the substrate including the recessed pattern. A molecular layer of a nitride film produced by a reaction of the source gas and a nitriding gas is deposited on the lower portion of the trench by supplying the nitriding gas to the surface of the substrate including the recessed pattern.

Abstract: A spoke angle deviation amount measuring system (2) includes a first to fourth support units (21) to (24) configured to support rotatably a first to fourth tires (11) to (14), respectively. Shaft portions (31d) of the support units (21) to (24) are positioned by positioning caps (55) after a vehicle (3) is moved to a measuring position with a steering wheel (4) positioned neutral. With the tires (11) to (14) inclined at a toe angle with respect to a front-and-rear direction, when the vehicle (3) is caused to travel forwards, lateral stress is exerted on the support units (21) to (24), whereby the support units (21) to (24) turn about the corresponding shaft portions (31d). An angle sensor (40) detects turning angles of the support units (21) to (24). A control device (27) calculates a spoke angle deviation amount based on the detected turning angles.

Abstract: A battery includes a casing, a terminal, an electrode assembly, a collector, and a joint. The terminal is supported by the casing. The electrode assembly is housed in the casing and includes an electrode pair of a sheet form having different polarities from each other and a separator located between the electrode pair, the electrode pair and the separator laminated and wound around an axis. The collector is located at an axial end of the electrode assembly, electrically connected to the terminal, and includes a plurality of collector tabs. The collector tabs are part of one of the electrodes and laminated on each other with no other electrode and the separator placed in-between. The joint joins fringes of the laminated collector tabs.

Abstract: A battery includes a casing, a terminal, an electrode assembly, a collector, and a joint. The joint joins laminated fringes of the electrode assembly. The collector includes a cut part including the fringes. The cut part includes the joint. The electrode assembly includes a turnback pair formed by folding back the electrodes from one of an extension pair to the other. The collector includes a connection electrically connected to the terminal, including part of the extension pair, and not including at least one of the turnback pair.

Abstract: A film deposition method for filling a recessed pattern with a SiN film is provided. NH2 groups are caused to adsorb on a surface of a substrate containing a recessed pattern formed in a top surface of the substrate by supplying a first process gas containing NH3 converted to first plasma to the surface of the substrate containing the recessed pattern. The NH2 groups is partially converted to N groups by supplying a second process gas containing N2 converted to second plasma to the surface of the substrate containing the recessed pattern on which the NH2 groups is adsorbed. A silicon-containing gas is caused to adsorb on the NH2 groups by supplying the silicon-containing gas to the surface of the substrate containing the recessed pattern on which the NH2 groups and the N groups are adsorbed. The above steps are cyclically repeated.

Abstract: A protective film forming method is provided. In the method, substantially an entire surface of a silicon-containing underfilm is terminated with fluorine by supplying a fluorine-containing gas to the silicon-containing underfilm formed on a substrate having a surface including a plurality of recesses and a flat surface provided between the adjacent recesses. A surface of the silicon-containing underfilm formed on the flat surface of the substrate is nitrided by supplying a nitriding gas converted to plasma to the silicon-containing underfilm terminated with fluorine such that a silicon adsorption site is formed on the surface of the silicon-containing underfilm formed on the flat surface of the substrate. A silicon-containing gas is adsorbed on the silicon adsorption site by supplying the silicon-containing gas to the silicon-containing underfilm.

Abstract: A method for disassembling/assembling a gas turbine including a seal plate disposed on a first side of a rotor disc in an axial direction of the rotor disc, and a seal plate restraint part for restricting movement of the seal plate relative to the rotor disc in a radial direction of the rotor disc includes a seal-plate-restraint-state switching step of moving the seal plate restraint part along the axial direction to switch between a seal plate non-restraint state where the seal plate restraint part does not restrict movement of the seal plate in the radial direction and a seal plate restraint state where at least a part of the seal plate restraint part protrudes in the axial direction from the seal plate and thereby restricts movement of the seal plate in the radial direction.

Abstract: A method for disassembling/assembling a gas turbine including a seal plate disposed on a first side of a rotor disc in an axial direction of the rotor disc, and a seal plate restraint part for restricting movement of the seal plate in a radial direction of the rotor disc. The method includes a seal-plate-restraint-state switching step of operating the seal plate restraint part from a second side in the axial direction via a clearance between a platform of a blade and a region of an outer peripheral surface of the rotor disc except a blade groove for receiving the blade to switch between a seal plate non-restraint state where the seal plate restraint part does not restrict movement of the seal plate in the radial direction and a seal plate restraint state where at least a part of the seal plate restraint part protrudes in the axial direction.

Abstract: A method for disassembling/assembling a gas turbine including a seal plate disposed on a first side of a rotor disc in an axial direction of the rotor disc, and a seal plate restraint part for restricting movement of the seal plate relative to the rotor disc in a radial direction of the rotor disc includes a seal-plate-restraint-state switching step of operating the seal plate restraint part from a second side in the axial direction to switch between a seal plate non-restraint state where the seal plate restraint part does not restrict movement of the seal plate in the radial direction and a seal plate restraint state where at least a part of the seal plate restraint part protrudes toward the second side in the axial direction from the seal plate and thereby restricts movement of the seal plate in the radial direction.

Abstract: A spoke angle deviation amount measuring system (2) includes a first to fourth support units (21) to (24) configured to support rotatably a first to fourth tires (11) to (14), respectively. Shaft portions (31d) of the support units (21) to (24) are positioned by positioning caps (55) after a vehicle (3) is moved to a measuring position with a steering wheel (4) positioned neutral. With the tires (11) to (14) inclined at a toe angle with respect to a front-and-rear direction, when the vehicle (3) is caused to travel forwards, lateral stress is exerted on the support units (21) to (24), whereby the support units (21) to (24) turn about the corresponding shaft portions (31d). An angle sensor (40) detects turning angles of the support units (21) to (24). A control device (27) calculates a spoke angle deviation amount based on the detected turning angles.

Abstract: A method for processing a substrate is provided. According to the method, a process gas is supplied to a surface of a substrate, and then a separation gas is supplied to the surface of the substrate. Moreover, a first plasma processing gas is supplied to the surface of the substrate in a first state in which a distance between the first plasma generation unit and the turntable is set at a first distance, and a second plasma processing gas is supplied to the surface of the substrate in a second state in which a distance between the second plasma generation unit and the turntable is set at a second distance shorter than the first distance. Furthermore, the separation gas is supplied to the surface of the substrate.

Abstract: A film deposition method is provided for filling a recessed pattern formed in a surface of a substrate with a film. In the method, an adsorption blocking group is formed by adsorbing chlorine gas activated by plasma on a top surface of the substrate and an upper portion of the recessed pattern. A source gas that contains one of silicon and a metal, and chlorine, is adsorbed on a lower portion of the recessed pattern where the adsorption blocking group is not formed, by supplying the source gas to the surface of the substrate including the recessed pattern. A molecular layer of a nitride film produced by a reaction of the source gas and a nitriding gas is deposited on the lower portion of the trench by supplying the nitriding gas to the surface of the substrate including the recessed pattern.

Abstract: A protective film forming method is provided. In the method, substantially an entire surface of a silicon-containing underfilm is terminated with fluorine by supplying a fluorine-containing gas to the silicon-containing underfilm formed on a substrate having a surface including a plurality of recesses and a flat surface provided between the adjacent recesses. A surface of the silicon-containing underfilm formed on the flat surface of the substrate is nitrided by supplying a nitriding gas converted to plasma to the silicon-containing underfilm terminated with fluorine such that a silicon adsorption site is formed on the surface of the silicon-containing underfilm formed on the flat surface of the substrate. A silicon-containing gas is adsorbed on the silicon adsorption site by supplying the silicon-containing gas to the silicon-containing underfilm.

Abstract: A method for depositing a silicon nitride film is provided. A nitrided adsorption site is formed in a recess formed in a surface of a substrate by supplying an ammonia-containing gas to the substrate for nitriding the surface of the substrate including the recess. A non-adsorption site is formed in a predetermined upper area of the recess by adsorbing a chlorine-containing gas on the nitride adsorption site in the predetermined upper area by physical adsorption. The predetermined upper area ranges from an upper end of the recess to a predetermined depth of the recess. A silicon-containing gas is adsorbed on the nitride adsorption site other than the predetermined upper area so as to deposit a silicon nitride film by a chemical reaction between the adsorbed ammonia-containing gas and the adsorbed silicon-containing gas. The nitride adsorption site includes a bottom surface of the recess.