Abstract: An object of the present invention is to provide a charged particle beam device that suppresses the influence of an external electromagnetic wave, even when a shielding member, such as a vacuum valve, is in the open state. To achieve the above object, a charged particle beam device including a vacuum chamber (111) having an opening (104) that surrounds a sample delivery path is proposed. The charged particle beam device includes a conductive material (118) surrounding the opening (104) for conduction between the vacuum chamber (111) and a conductive member (106) disposed on the atmosphere side. According to an embodiment of the present invention, it is possible to restrict an electromagnetic wave (117) from reaching the sample chamber via the delivery path.

Abstract: An object of the present invention is to provide a charged particle beam device that suppresses the influence of an external electromagnetic wave, even when a shielding member, such as a vacuum valve, is in the open state. To achieve the above object, a charged particle beam device including a vacuum chamber (111) having an opening (104) that surrounds a sample delivery path is proposed. The charged particle beam device includes a conductive material (118) surrounding the opening (104) for conduction between the vacuum chamber (111) and a conductive member (106) disposed on the atmosphere side. According to an embodiment of the present invention, it is possible to restrict an electromagnetic wave (117) from reaching the sample chamber via the delivery path.

Abstract: A sample conveying mechanism minimizes a risk of damage to a sample typified particularly by a photomask, and the sample conveying mechanism provides the sample retention mechanism for holding the sample so as to be suspended and is configured such that a portion close to a pattern surface of the sample is separated from a projection section of a flange for suspending the sample, thereby inhibiting a contact between the pattern surface and members configuring the conveying mechanism.

Abstract: A charged particle beam system for measuring a sample such as a photomask is provided. The system is capable of adjusting its condition with high accuracy to measure the sample even when a back surface of the sample is charged. The charged particle beam system measures an electric potential distribution on the back surface of the sample during a process for transporting the sample. The system controls the degree of charge neutralization of the sample based on the result of the measurement, or estimates or calculates an electric potential distribution appearing on a front surface of the sample and obtained when the sample is placed on the sample holder or the like. The system is capable of measuring or inspecting the sample such as a photomask at high speed and with high accuracy even when the sample has a large amount of charges accumulated on its surface different from its pattern surface.

Abstract: An object of the invention is to provide a charged corpuscular beam apparatus which is equipped with a static elimination mechanism suitable for eliminating electric charges deposited on front and back surfaces of a specimen. To achieve the foregoing object, there is proposed a static elimination mechanism which includes a first ionizer for eliminating electric charges from the front surface of the specimen, and a second ionizer for eliminating electric charges from the back surface of the specimen. The first and second ionizers are disposed in a mini-environment, and are arranged along a downflow in the mini-environment. A specimen carrying mechanism is disposed so that the specimen can pass between the two ionizers.

Abstract: A sample conveying mechanism minimizes a risk of damage to a sample typified particularly by a photomask, and the sample conveying mechanism provides the sample retention mechanism for holding the sample so as to be suspended and is configured such that a portion close to a pattern surface of the sample is separated from a projection section of a flange for suspending the sample, thereby inhibiting a contact between the pattern surface and members configuring the conveying mechanism.

Abstract: A charged particle beam system for measuring a sample such as a photomask is provided. The system is capable of adjusting its condition with high accuracy to measure the sample even when a back surface of the sample is charged. The charged particle beam system measures an electric potential distribution on the back surface of the sample during a process for transporting the sample. The system controls the degree of charge neutralization of the sample based on the result of the measurement, or estimates or calculates an electric potential distribution appearing on a front surface of the sample and obtained when the sample is placed on the sample holder or the like. The system is capable of measuring or inspecting the sample such as a photomask at high speed and with high accuracy even when the sample has a large amount of charges accumulated on its surface different from its pattern surface.

Abstract: A power supplying structure 1 includes a support 6a which has a rectangular wave-shaped cross section and to which a communication device is mounted and a power source bus 3 stored in the support 6a for supplying power from a power supplying device 2 to a communication device 5 in such a configuration the power supplying device 2 is mounted in such a manner that a power source output terminal 22 thereon may be positioned on a front face side and also that a cable duct 4 is provided between a side face of the communication device 5 and the support 6a, for storing a power supplying cable 12 which interconnects the power source bus 3 and the communication device 5.

Abstract: A random access memory, having multi-bit memory cells, includes a successive approximation analog-to-digital (SAAD) converter and a comparator for reading data from the memory cells. In reading data from a cell, the SAAD generates a first reference voltage. This first reference voltage is compared, by the comparator, to the voltage stored in the cell to derive a first comparison result. Based on this first comparison result, a first bit of data is determined. Thereafter, the SAAD generates a second reference voltage based on the first reference voltage and the first comparison result. This second reference voltage is compared, by the comparator, to the voltage stored in the cell to derive a second comparison result. Based on this second comparison result, a second bit of data is determined.

Abstract: A random access memory, having multi-bit memory cells, includes a successive approximation analog-to-digital (SAAD) converter and a comparator for reading data from the memory cells. In reading data from a cell, the SAAD generates a first reference voltage. This first reference voltage is compared, by the comparator, to the voltage stored in the cell to derive a first comparison result. Based on this first comparison result, a first bit of data is determined. Thereafter, the SAAD generates a second reference voltage based on the first reference voltage and the first comparison result. This second reference voltage is compared, by the comparator, to the voltage stored in the cell to derive a second comparison result. Based on this second comparison result, a second bit of data is determined.

Abstract: An apparatus for positioning a sample comprises a fine adjustment stage and a coarse adjustment stage. The fine adjustment stage is held by three Z axis fine adjustment driving structures above the first base. The fine adjustment stage has a number of through holes. The fine adjustment stage is provided X and Y axes fine adjustment driving structures other than the Z axis fine adjustment driving structures. The coarse adjustment stage comprises the second base which is provided above the first base and a number of protrusions which are provided dispersively on the second base. The coarse adjustment stage is connected to X and Y axes coarse adjustment driving structures through flexible and elastic members. The sectional areas of the protrusions are selected to a size which is movable freely within the through holes, respectively. By adjusting the Z axis fine adjustment driving structures, a sample hold base is held either the coarse adjustment stage or the fine adjustment stage.