Abstract: Disclosed is a process for producing porous materials by replacing a first solvent in a wet material containing the first solvent with a second solvent in a high pressure condition and drying the resulting wet material which process comprises a mixed solvent feeding step for feeding a mixed solvent composed of a solvent identical to or of the same kind as the first solvent and the second solvent to the wet material.

Abstract: The present invention relates to a method for decomposing and recovering an isocyanate compound, which comprises: continuously mixing and dispersing into water at high pressure and high temperature an isocyanate compound having at least one isocyanate group or group derived from an isocyanate group in a molten state or solution state, supplying a liquid mixture containing the isocyanate compound and the water at high pressure and high temperature continuously to a reactor, followed by subjecting the isocyanate compound to a decomposition reaction in the reactor, and recovering a raw material for the isocyanate compound or a derivative thereof; and an apparatus for decomposing and recovering an isocyanate compound, which comprises: a reactor which brings water at high pressure and high temperature into contact with an isocyanate compound having at least one isocyanate group or group derived from an isocyanate group to cause a decomposition reaction, a water supply line which continuously supplies the water at

Abstract: The objective is to provide a high-pressure treatment apparatus with which the pressure or temperature in a treatment chamber can be efficiently adjusted in a short period of time without an overall significant increase in the size or complication of the apparatus. The high-pressure treatment apparatus has a pressure-resistant container having pressure-resistant walls surrounding a treatment chamber, a lid member that closes an open end of the pressure-resistant container, a supply means that supplies a process fluid into the treatment chamber, a partition wall that is thinner than the pressure-resistant wall and is provided along the inside surface of said pressure-resistant container to form a partitioned chamber with said inside surface, and a heat transfer control means.

Abstract: The present invention relates to a method for decomposing and recovering an isocyanate compound, which comprises: continuously mixing and dispersing into water at high pressure and high temperature an isocyanate compound having at least one isocyanate group or group derived from an isocyanate group in a molten state or solution state, supplying a liquid mixture containing the isocyanate compound and the water at high pressure and high temperature continuously to a reactor, followed by subjecting the isocyanate compound to a decomposition reaction in the reactor, and recovering a raw material for the isocyanate compound or a derivative thereof; and an apparatus for decomposing and recovering an isocyanate compound, which comprises: a reactor which brings water at high pressure and high temperature into contact with an isocyanate compound having at least one isocyanate group or group derived from an isocyanate group to cause a decomposition reaction, a water supply line which continuously supplies the water at

Abstract: The present invention relates to a method for decomposing and recovering an isocyanate compound, which comprises: continuously mixing and dispersing into water at high pressure and high temperature an isocyanate compound having at least one isocyanate group or group derived from an isocyanate group in a molten state or solution state, supplying a liquid mixture containing the isocyanate compound and the water at high pressure and high temperature continuously to a reactor, followed by subjecting the isocyanate compound to a decomposition reaction in the reactor, and recovering a raw material for the isocyanate compound or a derivative thereof; and an apparatus for decomposing and recovering an isocyanate compound, which comprises: a reactor which brings water at high pressure and high temperature into contact with an isocyanate compound having at least one isocyanate group or group derived from an isocyanate group to cause a decomposition reaction, a water supply line which continuously supplies the water at

Abstract: The objective is to provide a high-pressure treatment apparatus with which the pressure or temperature in a treatment chamber can be efficiently adjusted in a short period of time without an overall significant increase in the size or complication of the apparatus. The high-pressure treatment apparatus has a pressure-resistant container having pressure-resistant walls surrounding a treatment chamber, a lid member that closes an open end of the pressure-resistant container, a supply means that supplies a process fluid into the treatment chamber, a partition wall that is thinner than the pressure-resistant wall and is provided along the inside surface of said pressure-resistant container to form a partitioned chamber with said inside surface, and a heat transfer control means.

Abstract: The present invention relates to a method for decomposing and recovering an isocyanate compound, which comprises: continuously mixing and dispersing into water at high pressure and high temperature an isocyanate compound having at least one isocyanate group or group derived from an isocyanate group in a molten state or solution state, supplying a liquid mixture containing the isocyanate compound and the water at high pressure and high temperature continuously to a reactor, followed by subjecting the isocyanate compound to a decomposition reaction in the reactor, and recovering a raw material for the isocyanate compound or a derivative thereof; and an apparatus for decomposing and recovering an isocyanate compound, which comprises: a reactor which brings water at high pressure and high temperature into contact with an isocyanate compound having at least one isocyanate group or group derived from an isocyanate group to cause a decomposition reaction, a water supply line which continuously supplies the water at

Abstract: A mixing valve assembly 42 is communicated with a dedicated tank 51D, storing therein a compatibilizer D, via an inlet valve 43 and is also communicated with dedicated tanks 51A-51C via three injection valves, the tanks storing therein auxiliaries A-C respectively. A chemical formulation is prepared by selectively injecting any one(s) of four chemical agents into the mixing valve assembly 42 by way of on-off control of the inlet valve 43 and the injection valves and blending together the injected chemical agents. Then, the chemical formulation is pumped into SCF by a high-pressure pump 45 such that the SCF and the chemical formulation are mixed together to form a process fluid. Thus, the number of components of a high-pressure portion can be reduced to achieve a cost reduction of an apparatus. Furthermore, a pipe line for pumping the chemical agents is simplified.

Abstract: An object is subjected to high-pressure processing by bringing at least a high-pressure fluid into contact with the object under pressure in a high-pressure processing chamber, and then the high-pressure processing chamber is depressurized while the temperature in the chamber is controlled to be maintained above a temperature achieved by an adiabatic expansion, the adiabatic expansion starting from the pressure and temperature at the end of the high-pressure processing step. To control in such a way, the temperature in the high-pressure processing chamber is controlled so as to suppress or recover a temperature descent caused by an adiabatic expansion during the depressurizing step. This solves a problem in which the temperature is decreased to the vapor-liquid phase coexistence region or a region in which a solid is deposited.

Abstract: The present invention relates to a method for processing a waste high-pressure fluid, which is yielded by bringing a high-pressure fluid into contact with a processing object in a high-pressure processing vessel to make unnecessary materials on the processing object accompany it. In accordance with the present invention, a novel processing method is provided which includes the steps of draining liquid ingredients, which is obtained from a preliminarily refined waste medium-pressure fluid, having been decompressed from the waste high-pressure fluid and provided to a separating means filled with packing materials, out of a system with unnecessary materials, and refining gas ingredients, which is also obtained from the preliminarily refined waste medium-pressure fluid, in an adsorbing means including adsorbents.

Abstract: Mixing baths 6A and 6B which temporarily hold chemical agents A and B respectively are disposed. The mixing baths 6A and 6B are each connected with a high-pressure fluid supplying unit 2. For surface treatment using a mixture of the chemical agent A and SCF (processing fluid), SCF is fed under pressure from the high-pressure fluid supplying unit 2 to the mixing bath 6A which already holds the chemical agent A, whereby the chemical agent A dissolves in SCF flowing into the mixing bath 6A and the mixture of the chemical agent A and SCF (processing fluid) is created. As a high-pressure valve (processing fluid introducing valve) 39 is opened, the processing fluid is sent into a pressure vessel 1. This achieves a predetermined surface treatment of a substrate which has been set inside the pressure vessel 1, using the processing fluid.

Abstract: Disclosed is a process for producing porous materials by replacing a first solvent in a wet material containing the first solvent with a second solvent in a high pressure condition and drying the resulting wet material which process comprises a mixed solvent feeding step for feeding a mixed solvent composed of a solvent identical to or of the same kind as the first solvent and the second solvent to the wet material.

Abstract: When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and a valve is opened, supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber 5 so that the CO2 expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, super critical CO2 is used to wash the substrate and clean the circulation line. The flow of supercritical CO2 is sent to the substrate washing chamber 5. After flowing through the circulation line, including a circulation channel 11, it passes through a bypass channel 12 to a decompressor 7. Any chemicals or organic substances left in the circulation line are continuously sent to a separation/recover bath 8 together with the flow.

Abstract: When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and one valve is opened, to supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber 5 so that the CO2 expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, supercritical CO2 is used to wash the substrate and clean the circulation line. The flow of supercritical CO2 is sent to the substrate washing chamber 5. After flowing through the circulation line, including a circulation channel 11, it passes through a bypass channel 12 to a decompressor 7. Any chemicals or organic substances left in the circulation line are continuously sent to separation/recovery bath 8 together with the flow.

Abstract: Mixing baths 6A and 6B which temporarily hold chemical agents A and B respectively are disposed. The mixing baths 6A and 6B are each connected with a high-pressure fluid supplying unit 2. For surface treatment using a mixture of the chemical agent A and SCF (processing fluid), SCF is fed under pressure from the high-pressure fluid supplying unit 2 to the mixing bath 6A which already holds the chemical agent A, whereby the chemical agent A dissolves in SCF flowing into the mixing bath 6A and the mixture of the chemical agent A and SCF (processing fluid) is created. As a high-pressure valve (processing fluid introducing valve) 39 is opened, the processing fluid is sent into a pressure vessel 1. This achieves a predetermined surface treatment of a substrate which has been set inside the pressure vessel 1, using the processing fluid.

Abstract: A high-pressure processing apparatus for removing unnecessary matters on objects to be processed by bringing a high-pressure fluid and a chemical liquid other than the high-pressure fluid into contact with the objects to be processed in a pressurized state is provided with a plurality of high-pressure processing chambers, a common high-pressure fluid supply unit for supplying the high-pressure fluid to each one of the high-pressure processing chambers, a common chemical liquid supply unit for supplying the chemical liquid to the each high-pressure processing chambers, and a separating unit for separating gaseous components from a mixture of the high-pressure fluid and the chemical liquid discharged from the high-pressure processing chambers after the objects are processed. Thus, a high-pressure processing apparatus which has such a compact construction as to be partly installable in a clean room and can stably perform a high-pressure processing can be provided.

Abstract: An object is subjected to high-pressure processing by bringing at least a high-pressure fluid into contact with the object under pressure in a high-pressure processing chamber, and then the high-pressure processing chamber is depressurized while the temperature in the chamber is controlled to be maintained above a temperature achieved by an adiabatic expansion, the adiabatic expansion starting from the pressure and temperature at the end of the high-pressure processing step. To control in such a way, the temperature in the high-pressure processing chamber is controlled so as to suppress or recover a temperature descent caused by an adiabatic expansion during the depressurizing step. This solves a problem in which the temperature is decreased to the vapor-liquid phase coexistence region or a region in which a solid is deposited.

Abstract: Provided is a cleaning apparatus for cleaning an object to be treated by contacting the object to be treated with a high pressure fluid of a cleaning composition containing a cleaning component as an essential ingredient. The cleaning apparatus includes high pressure fluid supplying means for supplying the high pressure fluid of the cleaning composition, a high pressure washing vessel for removing unnecessary materials deposited on the object to be treated by contacting the object to be treated with the high pressure fluid of the cleaning composition therein, a storing vessel for storing a waste high pressure fluid of the cleaning composition carrying the unnecessary materials therein, and a sealed structure for sealably housing the high pressure fluid supplying means, the high pressure washing vessel, and the storing vessel therein. The sealed structure has first exhaust means for exhausting the gas remaining in the sealed structure therefrom.

Abstract: A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member.

Abstract: When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and a valve is opened, supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber so that the CO2 expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, super critical CO2 is used to wash the substrate and clean the circulation line. The flow of supercritical CO2 is sent to the substrate washing chamber 5. After flowing through the circulation line, including a circulation channel 11, it passes through a bypass channel 12 to a decompressor 7. Any chemicals or organic substances left in the circulation line are continuously sent to a separation/recover bath 8 together with the flow.