Patents by Inventor Masahito Uchida

Masahito Uchida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230212110
    Abstract: A method for producing a carbamic acid salt, including contacting a carbon dioxide-containing mixed gas having a partial pressure of carbon dioxide of 0.001 atm or more and less than 1 atm with an amino group-containing organic compound in the presence of a base in at least one organic solvent selected from the group consisting of an organic solvent having 2 or more and 8 or less carbon atoms, and a method for producing a carbamic acid ester or a urea derivative using the carbamic acid salt.
    Type: Application
    Filed: June 3, 2021
    Publication date: July 6, 2023
    Applicants: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, TOSOH CORPORATION
    Inventors: Katsuhiko TAKEUCHI, Kazuhiro MATSUMOTO, Norihisa FUKAYA, Hiroki KOIZUMI, Jun-Chul CHOI, Masahito UCHIDA, Seiji MATSUMOTO, Satoshi HAMURA
  • Patent number: 8211817
    Abstract: Fused silica glass having an internal transmittance of UV with 245 nm wavelength, being at least 95% at 10 mm thickness, a OH content of not larger than 5 ppm, and a content of Li, Na, K, Mg, Ca and Cu each being smaller than 0.1 ppm. Preferably the glass has a viscosity coefficient at 1215° C. of at least 1011.5 Pa·s; and a Cu ion diffusion coefficient of not larger than 1×10?10 cm2/sec in a depth range of greater than 20 ?m up to 100 ?m, from the surface, when leaving to stand at 1050° C. in air for 24 hours. The glass is made by cristobalitizing powdery silica raw material; then, fusing the cristobalitized silica material in a non-reducing atmosphere. The glass exhibits a high transmittance of ultraviolet, visible and infrared rays, has high purity and heat resistance, and exhibits a reduced diffusion rate of metal impurities, therefore, it is suitable for various optical goods, semiconductor-production apparatus members, and liquid crystal display production apparatus members.
    Type: Grant
    Filed: September 11, 2007
    Date of Patent: July 3, 2012
    Assignees: Tosoh Corporation, Tosoh SGM Corporation
    Inventors: Kazuyoshi Arai, Tsutomu Takahata, Shinkichi Hasimoto, Masahito Uchida, Nobusuke Yamada, Yoshinori Harada, Hideharu Horikoshi
  • Publication number: 20100041538
    Abstract: Fused silica glass having an internal transmittance of UV with 245 nm wavelength, being at least 95% at 10 mm thickness, a OH content of not larger than 5 ppm, and a content of Li, Na, K, Mg, Ca and Cu each being smaller than 0.1 ppm. Preferably the glass has a viscosity coefficient at 1215° C. of at least 1011.5 Pa·s; and a Cu ion diffusion coefficient of not larger than 1×10?10 cm2/sec in a depth range of greater than 20 ?m up to 100 ?m, from the surface, when leaving to stand at 1050° C. in air for 24 hours. The glass is made by crystobalitizing powdery silica raw material; then, fusing the crystobalitized silica material in a non-reducing atmosphere. The glass exhibits a high transmittance of ultraviolet, visible and infrared rays, has high purity and heat resistance, and exhibits a reduced diffusion rate of metal impurities, therefore, it is suitable for various optical goods, semiconductor-production apparatus members, and liquid crystal display production apparatus members.
    Type: Application
    Filed: September 11, 2007
    Publication date: February 18, 2010
    Inventors: Kazuyoshi Arai, Tsutomu Takahata, Shinkichi Hasimoto, Masahito Uchida, Nobusuke Yamada, Yoshinori Harada, Hideharu Horikoshi