Abstract: A projection exposure apparatus includes a projection optical system for projecting an image of a pattern of a first object to a second object, and an adjusting system for adjusting projection magnification and distortion of the projected image of the pattern, the adjusting system being operable to displace the first object and a lens element of the projection optical system in a direction of an optical axis of the projection optical system.

Abstract: An illuminating apparatus is provided with an illuminating unit for forming a plurality of secondary light sources, the illuminating unit having a light source, a light converging device for converging photoenergy emitted from the light source, and a first multi-beam forming optical element for forming multiple light beams. A second multi-beam forming optical element produces a uniform luminance distribution and forms multiple light beams. A first converging optical system converges the photoenergy emitted from the first multi-beam forming optical element on the second multi-beam forming optical element, and a second converging optical system converges the photoenergy emitted from the second multi-beam forming optical element on a photomask.